Harry Sewell

Person

Ridgefield, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus, a dryer and a method of removing liquid fro...
- Patent number 10,649,349
- Issue date May 12, 2020
- ASML Holding N.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, a dryer and a method of removing liquid fro...
- Patent number 10,185,231
- Issue date Jan 22, 2019
- ASML Holding N.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, a dryer and a method of removing liquid fro...
- Patent number 9,632,425
- Issue date Apr 25, 2017
- ASML Holding N.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, fluid combining unit and device manufacturi...
- Patent number 9,330,912
- Issue date May 3, 2016
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask inspection system
- Patent number 9,046,754
- Issue date Jun 2, 2015
- ASML Holding N.V.
- Harry Sewell
- G01 - MEASURING TESTING
Information Patent Grant
Mask inspection with fourier filtering and image compare
- Patent number 9,041,903
- Issue date May 26, 2015
- ASML Holding N.V.
- Michael L. Nelson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment target contrast in a lithographic double patterning process
- Patent number 8,980,724
- Issue date Mar 17, 2015
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for insitu lens cleaning using ozone in immersi...
- Patent number 8,817,226
- Issue date Aug 26, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for thermally-induced aberration correction in...
- Patent number 8,736,807
- Issue date May 27, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tunable wavelength illumination system
- Patent number 8,730,476
- Issue date May 20, 2014
- ASML Holding N.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Improving alignment target contrast in a lithographic double patter...
- Patent number 8,709,908
- Issue date Apr 29, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for insitu lens cleaning in immersion lithography
- Patent number 8,654,305
- Issue date Feb 18, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,654,311
- Issue date Feb 18, 2014
- ASML Netherlands B.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion lithographic apparatus with immersion fluid re-circulatin...
- Patent number 8,629,970
- Issue date Jan 14, 2014
- ASML Netherlands B.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning EUV interference imaging for extremely high resolution pat...
- Patent number 8,623,588
- Issue date Jan 7, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for increasing alignment target contrast
- Patent number 8,625,096
- Issue date Jan 7, 2014
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tunable wavelength illumination system
- Patent number 8,508,736
- Issue date Aug 13, 2013
- ASML Holding N.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
System and method to increase surface tension and contact angle in...
- Patent number 8,456,611
- Issue date Jun 4, 2013
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Re-flow and buffer system for immersion lithography
- Patent number 8,451,422
- Issue date May 28, 2013
- ASML Netherlands B.V.
- Harry Sewell
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic method and apparatus
- Patent number 8,339,571
- Issue date Dec 25, 2012
- ASML Netherlands B.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for providing resist alignment marks in a doub...
- Patent number 8,329,366
- Issue date Dec 11, 2012
- ASML Netherlands B.V.
- Maya Angelova Doytcheva
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Liquid immersion lithography system comprising a tilted showerhead...
- Patent number 8,203,693
- Issue date Jun 19, 2012
- ASML Netherlands B.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,089,609
- Issue date Jan 3, 2012
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhancing the image contrast of a high resolution exposure tool
- Patent number 8,054,449
- Issue date Nov 8, 2011
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus with a fluid combining unit and related devi...
- Patent number 8,045,135
- Issue date Oct 25, 2011
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for thermally-induced aberration correction in...
- Patent number 7,995,185
- Issue date Aug 9, 2011
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion photolithography system and method using inverted wafer-p...
- Patent number 7,898,643
- Issue date Mar 1, 2011
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method and computer program product
- Patent number 7,897,058
- Issue date Mar 1, 2011
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for patterning both sides of a substrate utilizin...
- Patent number 7,882,780
- Issue date Feb 8, 2011
- ASML Holding N.V.
- Harry Sewell
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System and method to increase surface tension and contact angle in...
- Patent number 7,773,195
- Issue date Aug 10, 2010
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS, A DRYER AND A METHOD OF REMOVING LIQUID FRO...
- Publication number 20190121247
- Publication date Apr 25, 2019
- ASML NETHERLANDS B.V.
- Martinus Hendrikus Antonius LEENDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, A DRYER AND A METHOD OF REMOVING LIQUID FRO...
- Publication number 20170227856
- Publication date Aug 10, 2017
- ASML NETHERLANDS B.V.
- Martinus Hendrikus Antonius LEENDERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TUNABLE WAVELENGTH ILLUMINATION SYSTEM
- Publication number 20140253891
- Publication date Sep 11, 2014
- ASML Holding N.V.
- Arie Jeffrey DEN BOEF
- G02 - OPTICS
Information Patent Application
Alignment Target Contrast in a Lithographic Double Patterning Process
- Publication number 20140192333
- Publication date Jul 10, 2014
- ASML NETHERLANDS B.V.
- Harry SEWELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tunable Wavelength Illumination System
- Publication number 20130258316
- Publication date Oct 3, 2013
- ASML Holding N.V.
- Arie Jeffrey DEN BOEF
- G02 - OPTICS
Information Patent Application
Apparatus and Method for Providing Resist Alignment Marks in a Doub...
- Publication number 20130017378
- Publication date Jan 17, 2013
- ASML NETHERLANDS B.V.
- Maya Angelova Doytcheva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask Inspection with Fourier Filtering and Image Compare
- Publication number 20120075606
- Publication date Mar 29, 2012
- Michael L. Nelson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, FLUID COMBINING UNIT AND DEVICE MANUFACTURI...
- Publication number 20120013866
- Publication date Jan 19, 2012
- ASML Holding N.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR THERMALLY-INDUCED ABERRATION CORRECTION IN...
- Publication number 20110261335
- Publication date Oct 27, 2011
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING INVERTED WAFER-P...
- Publication number 20110122380
- Publication date May 26, 2011
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Tunable Wavelength Illumination System
- Publication number 20110085726
- Publication date Apr 14, 2011
- ASML Holding N.V.
- Arie Jeffrey Den Boef
- G02 - OPTICS
Information Patent Application
Method and System for Increasing Alignment Target Contrast
- Publication number 20110075238
- Publication date Mar 31, 2011
- ASML NETHERLANDS B.V.
- Harry SEWELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and Method for Providing Resist Alignment Marks in a Doub...
- Publication number 20100323171
- Publication date Dec 23, 2010
- ASML Holding N.V.
- Maya Angelova DOYTCHEVA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Target Contrast in a Lithographic Double Patterning Process
- Publication number 20100301458
- Publication date Dec 2, 2010
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Scanning EUV Interference Imaging for Extremely High Resolution Pat...
- Publication number 20100284015
- Publication date Nov 11, 2010
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD TO INCREASE SURFACE TENSION AND CONTACT ANGLE IN...
- Publication number 20100271604
- Publication date Oct 28, 2010
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DE...
- Publication number 20100214544
- Publication date Aug 26, 2010
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Mask Inspection
- Publication number 20100165310
- Publication date Jul 1, 2010
- ASML Holding N.V.
- Harry SEWELL
- G01 - MEASURING TESTING
Information Patent Application
EUV Mask Inspection System
- Publication number 20100149505
- Publication date Jun 17, 2010
- ASML Holding N.V.
- Harry SEWELL
- G01 - MEASURING TESTING
Information Patent Application
Liquid Immersion Lithography System Comprising a Tilted Showerhead...
- Publication number 20100053574
- Publication date Mar 4, 2010
- ASML Holding N.V.
- Aleksandr Khmelichek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Full Wafer Width Scanning Using Steps and Scan System
- Publication number 20100033698
- Publication date Feb 11, 2010
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20090257044
- Publication date Oct 15, 2009
- ASML NETHERLANDS B.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RE-FLOW AND BUFFER SYSTEM FOR IMMERSION LITHOGRAPHY
- Publication number 20090213343
- Publication date Aug 27, 2009
- ASML NETHERLANDS B.V.
- Harry Sewell
- G01 - MEASURING TESTING
Information Patent Application
IMMERSION LITHOGRAPHY APPARATUS
- Publication number 20090190106
- Publication date Jul 30, 2009
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LITHOGRAPHIC APPARATUS WITH IMMERSION FLUID RE-CIRCULATIN...
- Publication number 20090185149
- Publication date Jul 23, 2009
- ASML Holding N.V.
- Harry SEWELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic method and apparatus
- Publication number 20090153826
- Publication date Jun 18, 2009
- ASML NETHERLANDS B.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and Methods for Insitu Lens Cleaning Using Ozone in Immersi...
- Publication number 20090109411
- Publication date Apr 30, 2009
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20090109412
- Publication date Apr 30, 2009
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Forming Nanodisks Used in Imprint Lithography...
- Publication number 20080285428
- Publication date Nov 20, 2008
- ASML Holding N.V.
- Harry Sewell
- G11 - INFORMATION STORAGE
Information Patent Application
Systems and methods for insitu lens cleaning in immersion lithography
- Publication number 20080198343
- Publication date Aug 21, 2008
- ASML Holding N.V.
- Harry Sewell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Harry Sewell

Person

Patents Grantslast 30 patents

Lithographic apparatus, a dryer and a method of removing liquid fro...

Lithographic apparatus, a dryer and a method of removing liquid fro...

Lithographic apparatus, a dryer and a method of removing liquid fro...

Lithographic apparatus, fluid combining unit and device manufacturi...

EUV mask inspection system

Mask inspection with fourier filtering and image compare

Alignment target contrast in a lithographic double patterning process

Systems and methods for insitu lens cleaning using ozone in immersi...

Systems and methods for thermally-induced aberration correction in...

Tunable wavelength illumination system

Improving alignment target contrast in a lithographic double patter...

Systems and methods for insitu lens cleaning in immersion lithography

Lithographic apparatus and device manufacturing method

Immersion lithographic apparatus with immersion fluid re-circulatin...

Scanning EUV interference imaging for extremely high resolution pat...

Method and system for increasing alignment target contrast

Tunable wavelength illumination system

System and method to increase surface tension and contact angle in...

Re-flow and buffer system for immersion lithography

Lithographic method and apparatus

Apparatus and method for providing resist alignment marks in a doub...

Liquid immersion lithography system comprising a tilted showerhead...

Lithographic apparatus and device manufacturing method

Enhancing the image contrast of a high resolution exposure tool

Lithographic apparatus with a fluid combining unit and related devi...

Systems and methods for thermally-induced aberration correction in...

Immersion photolithography system and method using inverted wafer-p...

Device manufacturing method and computer program product

System and method for patterning both sides of a substrate utilizin...

System and method to increase surface tension and contact angle in...

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS, A DRYER AND A METHOD OF REMOVING LIQUID FRO...

LITHOGRAPHIC APPARATUS, A DRYER AND A METHOD OF REMOVING LIQUID FRO...

TUNABLE WAVELENGTH ILLUMINATION SYSTEM

Alignment Target Contrast in a Lithographic Double Patterning Process

Tunable Wavelength Illumination System

Apparatus and Method for Providing Resist Alignment Marks in a Doub...

Mask Inspection with Fourier Filtering and Image Compare

LITHOGRAPHIC APPARATUS, FLUID COMBINING UNIT AND DEVICE MANUFACTURI...

SYSTEMS AND METHODS FOR THERMALLY-INDUCED ABERRATION CORRECTION IN...

IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING INVERTED WAFER-P...

Tunable Wavelength Illumination System

Method and System for Increasing Alignment Target Contrast

Apparatus and Method for Providing Resist Alignment Marks in a Doub...

Alignment Target Contrast in a Lithographic Double Patterning Process

Scanning EUV Interference Imaging for Extremely High Resolution Pat...

SYSTEM AND METHOD TO INCREASE SURFACE TENSION AND CONTACT ANGLE IN...

FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DE...

EUV Mask Inspection

EUV Mask Inspection System

Liquid Immersion Lithography System Comprising a Tilted Showerhead...

Full Wafer Width Scanning Using Steps and Scan System

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

RE-FLOW AND BUFFER SYSTEM FOR IMMERSION LITHOGRAPHY

IMMERSION LITHOGRAPHY APPARATUS

IMMERSION LITHOGRAPHIC APPARATUS WITH IMMERSION FLUID RE-CIRCULATIN...

Lithographic method and apparatus

Systems and Methods for Insitu Lens Cleaning Using Ozone in Immersi...

Lithographic apparatus and device manufacturing method

System and Method for Forming Nanodisks Used in Imprint Lithography...

Systems and methods for insitu lens cleaning in immersion lithography