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Harry WHITESELL

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  • Sunnyvale, CA, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    Highly etch selective amorphous carbon film
    • Patent number 12,112,949
    • Issue date Oct 8, 2024
    • Applied Materials, Inc.
    • Rajesh Prasad
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Highly etch selective amorphous carbon film
    • Patent number 12,014,927
    • Issue date Jun 18, 2024
    • Applied Materials, Inc.
    • Rajesh Prasad
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    3D NAND etch
    • Patent number 11,515,170
    • Issue date Nov 29, 2022
    • Applied Materials, Inc.
    • Shishi Jiang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Highly etch selective amorphous carbon film
    • Patent number 11,469,107
    • Issue date Oct 11, 2022
    • Applied Materials, Inc.
    • Rajesh Prasad
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    3D NAND etch
    • Patent number 10,886,140
    • Issue date Jan 5, 2021
    • Applied Materials, Inc.
    • Shishi Jiang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Highly etch selective amorphous carbon film
    • Patent number 10,727,059
    • Issue date Jul 28, 2020
    • Applied Materials, Inc.
    • Sarah Bobek
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Techniques for improved removal of sacrificial mask
    • Patent number 10,354,875
    • Issue date Jul 16, 2019
    • Varian Semiconductor Equipment Associates, Inc.
    • Rajesh Prasad
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    FORMING A DOPED HARDMASK
    • Publication number 20240021433
    • Publication date Jan 18, 2024
    • Applied Materials, Inc.
    • Scott FALK
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM
    • Publication number 20230041963
    • Publication date Feb 9, 2023
    • Applied Materials, Inc.
    • Rajesh PRASAD
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM
    • Publication number 20230029929
    • Publication date Feb 2, 2023
    • Applied Materials, Inc.
    • Rajesh PRASAD
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    3D NAND Etch
    • Publication number 20210118691
    • Publication date Apr 22, 2021
    • Applied Materials, Inc.
    • Shishi Jiang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM
    • Publication number 20200357640
    • Publication date Nov 12, 2020
    • Applied Materials, Inc.
    • Rajesh PRASAD
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    3D NAND Etch
    • Publication number 20200035505
    • Publication date Jan 30, 2020
    • Applied Materials, Inc.
    • Shishi Jiang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    TECHNIQUES FOR IMPROVED REMOVAL OF SACRIFICIAL MASK
    • Publication number 20190214255
    • Publication date Jul 11, 2019
    • Varian Semiconductor Equipment Associates, Inc.
    • Rajesh Prasad
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM
    • Publication number 20190172714
    • Publication date Jun 6, 2019
    • Applied Materials, Inc.
    • Sarah BOBEK
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...