Haruhiko Furuya

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,165,846
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Eiki Kamata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and film deposition apparatus
- Patent number 9,136,156
- Issue date Sep 15, 2015
- Tokyo Electron Limited
- Tadashi Enomoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Raw material supplying device and film forming apparatus
- Patent number 9,080,238
- Issue date Jul 14, 2015
- Tokyo Electron Limited
- Yu Wamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method of forming thin film including adsorption step...
- Patent number 8,778,812
- Issue date Jul 15, 2014
- Tokyo Electron Limited
- Haruhiko Furuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation method for forming hafnium oxide film
- Patent number 8,586,140
- Issue date Nov 19, 2013
- Tokyo Electron Limited
- Haruhiko Furuya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus and method of using the same
- Patent number 7,368,384
- Issue date May 6, 2008
- Tokyo Electron Limited
- Atsushi Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method for depositing a plurality of high-k dielectric...
- Patent number 7,041,546
- Issue date May 9, 2006
- Tokyo Electron Limited
- Yuichiro Morozumi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, MODEL DATA GENERATION APPARATUS, SU...
- Publication number 20240194507
- Publication date Jun 13, 2024
- TOKYO ELECTRON LIMITED
- Tsuyoshi MORIYA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230203651
- Publication date Jun 29, 2023
- TOKYO ELECTRON LIMITED
- Kiyoshi MORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230207376
- Publication date Jun 29, 2023
- TOKYO ELECTRON LIMITED
- Kiyoshi MORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF TRANSPORTING WORKPIECE AND PROCESSING APPARATUS
- Publication number 20230128473
- Publication date Apr 27, 2023
- Kiyoshi MORI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230106303
- Publication date Apr 6, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230080956
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Makoto WADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND LID MEMBER
- Publication number 20230058928
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Hiroshi KONDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220068606
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY METHOD AND THERMAL TREATMENT METHOD
- Publication number 20150221529
- Publication date Aug 6, 2015
- TOKYO ELECTRON LIMITED
- Haruhiko FURUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION METHOD
- Publication number 20130164945
- Publication date Jun 27, 2013
- TOKYO ELECTRON LIMITED
- Haruhiko FURUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND FILM DEPOSITION APPARATUS
- Publication number 20130061804
- Publication date Mar 14, 2013
- TOKYO ELECTRON LIMITED
- Tadashi ENOMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY APPARATUS, THERMAL TREATMENT APPARATUS, GAS SUPPLY METHO...
- Publication number 20120288625
- Publication date Nov 15, 2012
- TOKYO ELECTRON LIMITED
- Haruhiko FURUYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RAW MATERIAL SUPPLYING DEVICE AND FILM FORMING APPARATUS
- Publication number 20120160172
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Yu WAMURA
- B08 - CLEANING
Information Patent Application
FILM FORMATION METHOD FOR FORMING HAFNIUM OXIDE FILM
- Publication number 20110268872
- Publication date Nov 3, 2011
- TOKYO ELECTRON LIMITED
- Haruhiko FURUYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT PROCESSING APPARATUS AND COMPONENT FOR SAME, FOR FORM...
- Publication number 20100186667
- Publication date Jul 29, 2010
- TOKYO ELECTRON LIMITED
- Katsutoshi ISHII
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Formation of metal oxide film
- Publication number 20080226820
- Publication date Sep 18, 2008
- Haruhiko Furuya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor processing method for processing substrate to be proc...
- Publication number 20050272271
- Publication date Dec 8, 2005
- TOKYO ELECTRON LIMITED
- Haruhiko Furuya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation apparatus and method of using the same
- Publication number 20050245099
- Publication date Nov 3, 2005
- Atsushi Endo
- B08 - CLEANING
Information Patent Application
Capacitor structure and film forming method and apparatus
- Publication number 20040195653
- Publication date Oct 7, 2004
- Yuichiro Morozumi
- H01 - BASIC ELECTRIC ELEMENTS

Haruhiko Furuya

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Substrate processing apparatus and film deposition apparatus

Raw material supplying device and film forming apparatus

Apparatus and method of forming thin film including adsorption step...

Film formation method for forming hafnium oxide film

Film formation apparatus and method of using the same

Film forming method for depositing a plurality of high-k dielectric...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, MODEL DATA GENERATION APPARATUS, SU...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD OF TRANSPORTING WORKPIECE AND PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND LID MEMBER

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

GAS SUPPLY METHOD AND THERMAL TREATMENT METHOD

FILM DEPOSITION METHOD

SUBSTRATE PROCESSING APPARATUS AND FILM DEPOSITION APPARATUS

GAS SUPPLY APPARATUS, THERMAL TREATMENT APPARATUS, GAS SUPPLY METHO...

RAW MATERIAL SUPPLYING DEVICE AND FILM FORMING APPARATUS

FILM FORMATION METHOD FOR FORMING HAFNIUM OXIDE FILM

VERTICAL HEAT PROCESSING APPARATUS AND COMPONENT FOR SAME, FOR FORM...

Formation of metal oxide film

Semiconductor processing method for processing substrate to be proc...

Film formation apparatus and method of using the same

Capacitor structure and film forming method and apparatus