Haruhiko Kikkawa

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Magnetic disk apparatus and head-supporting mechanism for the same
- Patent number 7,035,055
- Issue date Apr 25, 2006
- Hitachi Global Storage Technologies Japan, Ltd.
- Haruhiko Kikkawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Magnetic disk apparatus and head-supporting mechanism for the same
- Patent number 6,636,387
- Issue date Oct 21, 2003
- Hitachi, Ltd.
- Haruhiko Kikkawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Photosensitive polyimide precursor and its use for pattern formation
- Patent number 6,319,656
- Issue date Nov 20, 2001
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyimide precursor, polyimide and their use
- Patent number 6,309,791
- Issue date Oct 30, 2001
- Hitachi Chemical Co.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Surface-protecting film and resin-sealed semiconductor device havin...
- Patent number 6,200,831
- Issue date Mar 13, 2001
- Hitachi, Ltd.
- Jun Tanaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyimide precursor, polyimide and their use
- Patent number 6,143,475
- Issue date Nov 7, 2000
- Hitachi Chemical Co.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Surface-protecting film and resin-sealed semiconductor device havin...
- Patent number 6,087,006
- Issue date Jul 11, 2000
- Hitachi, Ltd.
- Jun Tanaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition containing a photosensitive polyam...
- Patent number 6,071,667
- Issue date Jun 6, 2000
- Hitachi Chemical Co., Ltd.
- Hideo Hagiwara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitve polymide precursor and its use for pattern formation
- Patent number 6,025,113
- Issue date Feb 15, 2000
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Magnetic disk apparatus and head-supporting mechanism for the same
- Publication number 20040070885
- Publication date Apr 15, 2004
- Haruhiko Kikkawa
- G11 - INFORMATION STORAGE
Information Patent Application
Photosensitive polyimide precursor and its use for pattern formation
- Publication number 20020048726
- Publication date Apr 25, 2002
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Magnetic disk apparatus and head-supporting mechanism for the same
- Publication number 20020030943
- Publication date Mar 14, 2002
- Haruhiko Kikkawa
- G11 - INFORMATION STORAGE

Haruhiko Kikkawa

Person

Patents Grantslast 30 patents

Magnetic disk apparatus and head-supporting mechanism for the same

Magnetic disk apparatus and head-supporting mechanism for the same

Photosensitive polyimide precursor and its use for pattern formation

Polyimide precursor, polyimide and their use

Surface-protecting film and resin-sealed semiconductor device havin...

Polyimide precursor, polyimide and their use

Surface-protecting film and resin-sealed semiconductor device havin...

Photosensitive resin composition containing a photosensitive polyam...

Photosensitve polymide precursor and its use for pattern formation

Patents Applicationslast 30 patents

Magnetic disk apparatus and head-supporting mechanism for the same

Photosensitive polyimide precursor and its use for pattern formation

Magnetic disk apparatus and head-supporting mechanism for the same