Haruki Inabe

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Color filter, solid-state imaging element, and image display device
- Patent number 12,111,487
- Issue date Oct 8, 2024
- FUJIFILM Corporation
- Haruki Inabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coloring composition, film, color filter, solid-state imaging eleme...
- Patent number 11,746,239
- Issue date Sep 5, 2023
- FUJIFILM Corporation
- Shoichi Nakamura
- G02 - OPTICS
Information Patent Grant
Positive resist composition and method of pattern formation with th...
- Patent number 9,835,945
- Issue date Dec 5, 2017
- FUJIFILM Corporation
- Hiromi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,798,235
- Issue date Oct 24, 2017
- FUJIFILM Corporation
- Hiromi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,703,196
- Issue date Jul 11, 2017
- FUJIFILM Corporation
- Hiromi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of pattern formation with th...
- Patent number 9,541,831
- Issue date Jan 10, 2017
- FUJIFILM Corporation
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,465,292
- Issue date Oct 11, 2016
- FUJIFILM Corporation
- Hiromi Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 9,316,912
- Issue date Apr 19, 2016
- FUJIFILM Corporation
- Hiromi Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of pattern formation with th...
- Patent number 9,057,952
- Issue date Jun 16, 2015
- FUJIFILM Corporation
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 9,023,576
- Issue date May 5, 2015
- FUJIFILM Corporation
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of pattern formation with th...
- Patent number 8,871,421
- Issue date Oct 28, 2014
- FUJIFILM Corporation
- Hiromi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 8,828,643
- Issue date Sep 9, 2014
- FUJIFILM Corporation
- Hiromi Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Colored curable composition, resist liquid, ink for inkjet printing...
- Patent number 8,815,478
- Issue date Aug 26, 2014
- FUJIFILM Corporation
- Junichi Ito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 8,808,975
- Issue date Aug 19, 2014
- FUJIFILM Corporation
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Colorant multimer, colored curable composition, color filter and me...
- Patent number 8,778,235
- Issue date Jul 15, 2014
- FUJIFILM Corporation
- Junichi Ito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 8,426,109
- Issue date Apr 23, 2013
- FUJIFILM Corporation
- Hiromi Kanda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method
- Patent number 8,389,200
- Issue date Mar 5, 2013
- FUJIFILM Corporation
- Shinichi Kanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 8,039,197
- Issue date Oct 18, 2011
- FUJIFILM Corporation
- Hiromi Kanda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 7,906,268
- Issue date Mar 15, 2011
- FUJIFILM Corporation
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method
- Patent number 7,892,722
- Issue date Feb 22, 2011
- FUJIFILM Corporation
- Haruki Inabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method
- Patent number 7,842,452
- Issue date Nov 30, 2010
- FUJIFILM Corporation
- Shinichi Kanna
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Insulating film forming composition and electronic device
- Patent number 7,820,748
- Issue date Oct 26, 2010
- FUJIFILM Corporation
- Haruki Inabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition for immersion exposure and pattern-form...
- Patent number 7,803,511
- Issue date Sep 28, 2010
- FUJIFILM Corporation
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Insulating film-forming composition
- Patent number 7,772,344
- Issue date Aug 10, 2010
- FUJIFILM Corporation
- Haruki Inabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method
- Patent number 7,700,260
- Issue date Apr 20, 2010
- FUJIFILM Corporation
- Shinichi Kanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition for immersion exposure and pattern form...
- Patent number 7,645,557
- Issue date Jan 12, 2010
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern-forming method using the same
- Patent number 7,611,820
- Issue date Nov 3, 2009
- FUJIFILM Corporation
- Hiromi Kanda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive type resist composition for use in liquid immersion exposu...
- Patent number 7,531,287
- Issue date May 12, 2009
- FUJIFILM Corporation
- Hiromi Kanda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method
- Patent number 7,482,112
- Issue date Jan 27, 2009
- FUJIFILM Corporation
- Shinichi Kanna
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number 7,157,206
- Issue date Jan 2, 2007
- Fuji Photo Film Co., Ltd.
- Haruki Inabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
COLORING COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELE...
- Publication number 20230043201
- Publication date Feb 9, 2023
- FUJIFILM CORPORATION
- Haruki INABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
- Publication number 20220107450
- Publication date Apr 7, 2022
- FUJIFILM CORPORATION
- Haruki INABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COLORING COMPOSITION, CURED FILM, METHOD FOR FORMING PATTERN, COLOR...
- Publication number 20210155803
- Publication date May 27, 2021
- FUJIFILM CORPORATION
- Hiromu KOIZUMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COLORING COMPOSITION, METHOD FOR PRODUCING FILM, METHOD FOR PRODUCI...
- Publication number 20200263037
- Publication date Aug 20, 2020
- FUJIFILM CORPORATION
- Hirotaka TAKISHITA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COLORING COMPOSITION, FILM, COLOR FILTER, SOLID-STATE IMAGING ELEME...
- Publication number 20200207990
- Publication date Jul 2, 2020
- FUJIFILM CORPORATION
- Shoichi NAKAMURA
- G02 - OPTICS
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20170255098
- Publication date Sep 7, 2017
- FUJIFILM CORPORATION
- Hiromi KOBAYASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...
- Publication number 20170123318
- Publication date May 4, 2017
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20160370701
- Publication date Dec 22, 2016
- FUJIFILM CORPORATION
- Hiromi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20160187780
- Publication date Jun 30, 2016
- FUJIFILM CORPORATION
- Hiromi KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20150205205
- Publication date Jul 23, 2015
- FUJIFILM CORPORATION
- Hiromi KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...
- Publication number 20150185609
- Publication date Jul 2, 2015
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20130177850
- Publication date Jul 11, 2013
- FUJIFILM CORPORATION
- Hiromi KANDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COLORED CURABLE COMPOSITION, RESIST LIQUID, INK FOR INKJET PRINTING...
- Publication number 20120264039
- Publication date Oct 18, 2012
- FUJIFILM Corporation
- Junichi Ito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COLORANT MULTIMER, COLORED CURABLE COMPOSITION, COLOR FILTER AND ME...
- Publication number 20120187351
- Publication date Jul 26, 2012
- FUJIFILM Corporation
- Junichi Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...
- Publication number 20120115085
- Publication date May 10, 2012
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20120015293
- Publication date Jan 19, 2012
- FUJIFILM CORPORATION
- Hiromi KANDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORM...
- Publication number 20110076622
- Publication date Mar 31, 2011
- FUJIFILM CORPORATION
- Haruki Inabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORM...
- Publication number 20100310991
- Publication date Dec 9, 2010
- FUJIFILM CORPORATION
- Haruki INABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20100068661
- Publication date Mar 18, 2010
- FUJIFILM Corporation
- Shinichi Kanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING AN INSULATING FILM
- Publication number 20090247701
- Publication date Oct 1, 2009
- FUJIFILM CORPORATION
- Haruki INABE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING A FILM, INSULATING FILM OBTAINED FROM THE C...
- Publication number 20090227736
- Publication date Sep 10, 2009
- FUJIFILM CORPORATION
- Keiji YAMAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING COMPOSITION, INSULATING FILM, AND ELECTRONIC DEVICE
- Publication number 20090221779
- Publication date Sep 3, 2009
- FUJIFILM CORPORATION
- Youhei Kubo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...
- Publication number 20090181323
- Publication date Jul 16, 2009
- FUJIFILM CORPORATION
- Hiromi Kanda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20090123880
- Publication date May 14, 2009
- FUJIFILM Corporation
- Shinichi Kanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSULATING FILM-FORMING COMPOSITION
- Publication number 20090118458
- Publication date May 7, 2009
- FUJIFILM CORPORATION
- Haruki Inabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
INSULATING FILM FORMING COMPOSITION AND ELECTRONIC DEVICE
- Publication number 20090076204
- Publication date Mar 19, 2009
- FUJIFILM CORPORATION
- Haruki Inabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING COMPOSITION, FILM, AND ELECTRONIC DEVICE
- Publication number 20090048421
- Publication date Feb 19, 2009
- FUJIFILM CORPORATION
- Youhei Kubo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...
- Publication number 20080305433
- Publication date Dec 11, 2008
- FUJIFILM CORPORATION
- Hiromi KANDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRODUCTION METHOD OF INSULATING FILM FORMING COMPOSITION, INSULATIN...
- Publication number 20080161521
- Publication date Jul 3, 2008
- FUJIFILM CORPORATION
- Haruki INABE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION, FILM AND FORMATION PROCESS THEREOF
- Publication number 20080081121
- Publication date Apr 3, 2008
- FUJIFILM CORPORATION
- Kensuke MORITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Haruki Inabe

Person

Patents Grantslast 30 patents

Color filter, solid-state imaging element, and image display device

Coloring composition, film, color filter, solid-state imaging eleme...

Positive resist composition and method of pattern formation with th...

Positive type resist composition for use in liquid immersion exposu...

Positive type resist composition for use in liquid immersion exposu...

Positive resist composition and method of pattern formation with th...

Positive type resist composition for use in liquid immersion exposu...

Positive type resist composition for use in liquid immersion exposu...

Positive resist composition and method of pattern formation with th...

Positive resist composition for immersion exposure and pattern-form...

Positive resist composition and method of pattern formation with th...

Positive type resist composition for use in liquid immersion exposu...

Colored curable composition, resist liquid, ink for inkjet printing...

Positive resist composition for immersion exposure and pattern-form...

Colorant multimer, colored curable composition, color filter and me...

Positive type resist composition for use in liquid immersion exposu...

Pattern forming method

Positive type resist composition for use in liquid immersion exposu...

Positive resist composition for immersion exposure and pattern-form...

Pattern forming method

Pattern forming method

Insulating film forming composition and electronic device

Positive resist composition for immersion exposure and pattern-form...

Insulating film-forming composition

Pattern forming method

Positive resist composition for immersion exposure and pattern form...

Positive resist composition and pattern-forming method using the same

Positive type resist composition for use in liquid immersion exposu...

Pattern forming method

Positive resist composition

Patents Applicationslast 30 patents

COLORING COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELE...

COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE

COLORING COMPOSITION, CURED FILM, METHOD FOR FORMING PATTERN, COLOR...

COLORING COMPOSITION, METHOD FOR PRODUCING FILM, METHOD FOR PRODUCI...

COLORING COMPOSITION, FILM, COLOR FILTER, SOLID-STATE IMAGING ELEME...

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

COLORED CURABLE COMPOSITION, RESIST LIQUID, INK FOR INKJET PRINTING...

COLORANT MULTIMER, COLORED CURABLE COMPOSITION, COLOR FILTER AND ME...

POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORM...

POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORM...

PATTERN FORMING METHOD

COMPOSITION FOR FORMING AN INSULATING FILM

COMPOSITION FOR FORMING A FILM, INSULATING FILM OBTAINED FROM THE C...

FILM FORMING COMPOSITION, INSULATING FILM, AND ELECTRONIC DEVICE

POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSU...

PATTERN FORMING METHOD

INSULATING FILM-FORMING COMPOSITION

INSULATING FILM FORMING COMPOSITION AND ELECTRONIC DEVICE

FILM FORMING COMPOSITION, FILM, AND ELECTRONIC DEVICE

POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH TH...

PRODUCTION METHOD OF INSULATING FILM FORMING COMPOSITION, INSULATIN...

COMPOSITION, FILM AND FORMATION PROCESS THEREOF