-
-
Reticle
-
Patent number 5,837,405
-
Issue date Nov 17, 1998
-
Kabushiki Kaisha Toshiba
-
Yoko Tomofuji
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
Mask defect repair system and method
-
Patent number 5,799,104
-
Issue date Aug 25, 1998
-
Kabushiki Kaisha Toshiba
-
Hiroko Nakamura
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
Focused ion beam deposition using TMCTS
-
Patent number 5,639,699
-
Issue date Jun 17, 1997
-
Kabushiki Kaisha Toshiba
-
Hiroko Nakamura
-
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
-
-
Charged beam apparatus
-
Patent number 5,591,970
-
Issue date Jan 7, 1997
-
Kabushiki Kaisha Toshiba
-
Haruki Komano
-
H01 - BASIC ELECTRIC ELEMENTS
-
Method of fabricating a reticle
-
Patent number 5,589,305
-
Issue date Dec 31, 1996
-
Kabushiki Kaisha Toshiba
-
Yoko Tomofuji
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
Method of repairing defect of structure
-
Patent number 5,429,730
-
Issue date Jul 4, 1995
-
Kabushiki Kaisha Toshiba
-
Hiroko Nakamura
-
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
-