Haruo Iwasawa

Person

Asahimachi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for forming silicon-cobalt film, silicon-cobalt film an...
- Patent number 7,718,228
- Issue date May 18, 2010
- JSR Corporation
- Yasuo Matsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition for forming silicon film and method for forming silicon...
- Patent number 7,473,443
- Issue date Jan 6, 2009
- JSR Corporation
- Yasuo Matsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,288,359
- Issue date Oct 30, 2007
- JSR Corporation
- Haruo Iwasawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method and bilayer film
- Patent number 7,244,549
- Issue date Jul 17, 2007
- JSR Corporation
- Haruo Iwasawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
High order silane composition, and method of forming silicon film u...
- Patent number 7,223,802
- Issue date May 29, 2007
- Seiko Epson Corporation
- Takashi Aoki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polysiloxane, process for production thereof and radiation-sensitiv...
- Patent number 7,108,955
- Issue date Sep 19, 2006
- JSR Corporation
- Haruo Iwasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...
- Patent number 6,908,722
- Issue date Jun 21, 2005
- JSR Corporation
- Satoshi Ebata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polysiloxane, method of manufacturing same, silicon-containing alic...
- Patent number 6,846,895
- Issue date Jan 25, 2005
- JSR Corporation
- Haruo Iwasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polysiloxane, method of manufacturing same, silicon-containing alic...
- Patent number 6,531,260
- Issue date Mar 11, 2003
- JSR Corporation
- Haruo Iwasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive resin composition
- Patent number 6,403,280
- Issue date Jun 11, 2002
- JSR Corporation
- Noboru Yamahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 6,322,949
- Issue date Nov 27, 2001
- Japan Synthetic Rubber Co., Ltd.
- Mitsuhito Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 6,187,504
- Issue date Feb 13, 2001
- JSR Corporation
- Mitsuhito Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive resin composition
- Patent number 6,180,316
- Issue date Jan 30, 2001
- JSR Corporation
- Toru Kajita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SILICONE RESIN COMPOSITION AND METHOD OF FORMING A TRENCH ISOLATION
- Publication number 20100029057
- Publication date Feb 4, 2010
- JSR CORPORATION
- Haruo Iwasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILANE POLYMER AND METHOD FOR FORMING SILICON FILM
- Publication number 20090215920
- Publication date Aug 27, 2009
- JSR Corporation
- Haruo Iwasawa
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Pattern forming method and bilayer film
- Publication number 20070248911
- Publication date Oct 25, 2007
- Haruo Iwasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High order silane composition, and method of forming silicon film u...
- Publication number 20070190265
- Publication date Aug 16, 2007
- Takashi Aoki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming silicon-cobalt film, silicon-cobalt film an...
- Publication number 20070077742
- Publication date Apr 5, 2007
- JSR Corporation
- Yasuo Matsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silane polymer and method for forming silicon film
- Publication number 20060159859
- Publication date Jul 20, 2006
- JSR Corporation
- Haruo Iwasawa
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Composition for forming silicon film and method for forming silicon...
- Publication number 20050145163
- Publication date Jul 7, 2005
- jsr corp.
- Yasuo Matsuki
- C30 - CRYSTAL GROWTH
Information Patent Application
Polysiloxane, process for production thereof and radiation-sensitiv...
- Publication number 20040143082
- Publication date Jul 22, 2004
- Haruo Iwasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
High order silane composition, and method of forming silicon film u...
- Publication number 20030229190
- Publication date Dec 11, 2003
- Takashi Aoki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polysiloxane, method of manufacturing same, silicon-containing alic...
- Publication number 20030191268
- Publication date Oct 9, 2003
- Haruo Iwasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20030170561
- Publication date Sep 11, 2003
- Haruo Iwasawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...
- Publication number 20030113658
- Publication date Jun 19, 2003
- Satoshi Ebata
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Pattern forming method and bilayer film
- Publication number 20030073040
- Publication date Apr 17, 2003
- Haruo Iwasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polysiloxane, method of manufacturing same, silicon-containingalicy...
- Publication number 20010041769
- Publication date Nov 15, 2001
- Haruo Iwasawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Radiation sensitive resin composition
- Publication number 20010014427
- Publication date Aug 16, 2001
- Japan Synthetic Rubber Co., Ltd.
- Mitsuhito Suwa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Haruo Iwasawa

Person

Patents Grantslast 30 patents

Composition for forming silicon-cobalt film, silicon-cobalt film an...

Composition for forming silicon film and method for forming silicon...

Radiation-sensitive resin composition

Pattern forming method and bilayer film

High order silane composition, and method of forming silicon film u...

Polysiloxane, process for production thereof and radiation-sensitiv...

Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...

Polysiloxane, method of manufacturing same, silicon-containing alic...

Polysiloxane, method of manufacturing same, silicon-containing alic...

Radiation sensitive resin composition

Radiation sensitive resin composition

Radiation sensitive resin composition

Radiation sensitive resin composition

Patents Applicationslast 30 patents

SILICONE RESIN COMPOSITION AND METHOD OF FORMING A TRENCH ISOLATION

SILANE POLYMER AND METHOD FOR FORMING SILICON FILM

Pattern forming method and bilayer film

High order silane composition, and method of forming silicon film u...

Composition for forming silicon-cobalt film, silicon-cobalt film an...

Silane polymer and method for forming silicon film

Composition for forming silicon film and method for forming silicon...

Polysiloxane, process for production thereof and radiation-sensitiv...

High order silane composition, and method of forming silicon film u...

Polysiloxane, method of manufacturing same, silicon-containing alic...

Radiation-sensitive resin composition

Acid generator, sulfonic acid, sulfonic acid derivatives and radiat...

Pattern forming method and bilayer film

Polysiloxane, method of manufacturing same, silicon-containingalicy...

Radiation sensitive resin composition