Haruo IWATSU

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and template
- Patent number 10,428,438
- Issue date Oct 1, 2019
- Tokyo Electron Limited
- Haruo Iwatsu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electric field treatment method and electric field treatment device
- Patent number 10,294,575
- Issue date May 21, 2019
- Tokyo Electron Limited
- Haruo Iwatsu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrolytic treatment method and electrolytic treatment apparatus
- Patent number 10,036,095
- Issue date Jul 31, 2018
- Tokyo Electron Limited
- Haruo Iwatsu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method for manufacturing semiconductor device, semiconductor device...
- Patent number 9,087,771
- Issue date Jul 21, 2015
- Tokyo Electron Limited
- Haruo Iwatsu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,664,106
- Issue date Mar 4, 2014
- Tokyo Electron Limited
- Haruo Iwatsu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Accommodating apparatus and substrate processing system
- Patent number 6,268,900
- Issue date Jul 31, 2001
- Tokyo Electron Limited
- Haruo Iwatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating apparatus
- Patent number 5,312,487
- Issue date May 17, 1994
- Tokyo Electron Kabushiki Kaisha
- Masami Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid coating device
- Patent number 5,127,362
- Issue date Jul 7, 1992
- Tokyo Electron Limited
- Haruo Iwatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

Patents Applicationslast 30 patents

Information Patent Application
ELECTRIC FIELD TREATMENT METHOD AND ELECTRIC FIELD TREATMENT DEVICE
- Publication number 20160326663
- Publication date Nov 10, 2016
- TOKYO ELECTRON LIMITED
- Haruo IWATSU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SUBSTRATE PROCESSING METHOD AND TEMPLATE
- Publication number 20160108538
- Publication date Apr 21, 2016
- TOKYO ELECTRON LIMITED
- Haruo IWATSU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROLYTIC TREATMENT METHOD AND ELECTROLYTIC TREATMENT APPARATUS
- Publication number 20160083856
- Publication date Mar 24, 2016
- TOKYO ELECTRON LIMITED
- Haruo IWATSU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20150303105
- Publication date Oct 22, 2015
- Tokyo Electron Limited
- Haruo IWATSU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
LIQUID PROCESSING JIG AND LIQUID PROCESSING METHOD
- Publication number 20150108001
- Publication date Apr 23, 2015
- TOKYO ELECTRON LIMITED
- Kazuo SAKAMOTO
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SUBSTRATE PROCESSING METHOD AND TEMPLATE
- Publication number 20140311530
- Publication date Oct 23, 2014
- TOKYO ELECTRON LIMITED
- Haruo Iwatsu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE...
- Publication number 20140151901
- Publication date Jun 5, 2014
- TOKYO ELECTRON LIMITED
- Haruo IWATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION APPARATUS, INSPECTION SYSTEM AND INSPECTION METHOD
- Publication number 20140043051
- Publication date Feb 13, 2014
- TOKYO ELECTRON LIMITED
- Haruo IWATSU
- G01 - MEASURING TESTING
Information Patent Application
TEMPLATE AND SUBSTRATE PROCESSING METHOD
- Publication number 20130224951
- Publication date Aug 29, 2013
- TOKYO ELECTRON LIMITED
- Haruo IWATSU
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND APPARATUS FOR MA...
- Publication number 20130098769
- Publication date Apr 25, 2013
- TOKYO ELECTRON LIMITED
- Haruo IWATSU
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SUBSTRATE ETCHING METHOD AND SUBSTRATE ETCHING APPARATUS
- Publication number 20130078747
- Publication date Mar 28, 2013
- TOKYO ELECTRON LIMITED
- Haruo IWATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE INSPECTING APPARATUS AND ALIGNING METHOD IN SUBSTRATE INS...
- Publication number 20120169365
- Publication date Jul 5, 2012
- TOKYO ELECTRON LIMITED
- Haruo Iwatsu
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120171858
- Publication date Jul 5, 2012
- TOKYO ELECTRON LIMITED
- Haruo Iwatsu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Haruo IWATSU

Person

Patents Grantslast 30 patents

Substrate processing method and template

Electric field treatment method and electric field treatment device

Electrolytic treatment method and electrolytic treatment apparatus

Method for manufacturing semiconductor device, semiconductor device...

Method of manufacturing semiconductor device

Accommodating apparatus and substrate processing system

Coating apparatus

Liquid coating device

Patents Applicationslast 30 patents

ELECTRIC FIELD TREATMENT METHOD AND ELECTRIC FIELD TREATMENT DEVICE

SUBSTRATE PROCESSING METHOD AND TEMPLATE

ELECTROLYTIC TREATMENT METHOD AND ELECTROLYTIC TREATMENT APPARATUS

METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

LIQUID PROCESSING JIG AND LIQUID PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND TEMPLATE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE...

INSPECTION APPARATUS, INSPECTION SYSTEM AND INSPECTION METHOD

TEMPLATE AND SUBSTRATE PROCESSING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND APPARATUS FOR MA...

SUBSTRATE ETCHING METHOD AND SUBSTRATE ETCHING APPARATUS

SUBSTRATE INSPECTING APPARATUS AND ALIGNING METHOD IN SUBSTRATE INS...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE