Hatsuyuki Tanaka

Person

Kakegawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Development defect preventing process and material
- Patent number 7,195,863
- Issue date Mar 27, 2007
- AZ Electronic Materials USA Corp.
- Yusuke Takano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and composition for forming etching protective layer
- Patent number 7,141,177
- Issue date Nov 28, 2006
- AZ Electronic Materials USA Corp.
- Hatsuyuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming pattern and treating agent for use therein
- Patent number 7,018,785
- Issue date Mar 28, 2006
- AZ Electronic Materials USA Corp.
- Kazuyo Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blocked isocyanate compound-containing composition for forming a ra...
- Patent number 6,939,661
- Issue date Sep 6, 2005
- Clariant Finance (BVI) Limited
- Wen-Bing Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for anti-reflective coating or radiation absorbing coat...
- Patent number 6,803,168
- Issue date Oct 12, 2004
- Clariant Finance (BVI) Limited
- Munirathna Padmanaban
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation absorbing polymer, composition for radiation absorbing co...
- Patent number 6,737,492
- Issue date May 18, 2004
- Clariant Finance (BVI) Limited
- Wen-Bing Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for antireflection coating
- Patent number 6,692,892
- Issue date Feb 17, 2004
- Clariant Finance (BVI) Limited
- Yusuke Takano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Water-soluble resin composition
- Patent number 6,555,607
- Issue date Apr 29, 2003
- Clariant Finance (BVI) Limited
- Takashi Kanda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation absorbing polymer, composition for radiation absorbing co...
- Patent number 6,468,718
- Issue date Oct 22, 2002
- Clariant Finance (BVI) Limited
- Wen-Bing Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for light absorption film formation containing blocked...
- Patent number 6,465,148
- Issue date Oct 15, 2002
- Clariant Finance (BVI) Limited
- Wen-Bing Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for forming resist pattern
- Patent number 6,465,161
- Issue date Oct 15, 2002
- Clariant Finance (BVI) Limited
- Wen-Bing Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflection or light-absorbing coating composition and polymer t...
- Patent number 6,329,117
- Issue date Dec 11, 2001
- Clariant International, Ltd.
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for reflection reducing coating
- Patent number 6,309,789
- Issue date Oct 30, 2001
- Clariant Finance (BVI) Limited
- Yusuke Takano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for bottom reflection preventive film and novel polymer...
- Patent number 6,277,750
- Issue date Aug 21, 2001
- Clariant Finance (BVI) Limited
- Georg Pawlowski
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Light-absorbing polymers and application thereof to anti-reflection...
- Patent number 6,255,405
- Issue date Jul 3, 2001
- Clariant International, Ltd.
- Wen-Bing Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation absorbing polymer and synthesis thereof
- Patent number 6,184,305
- Issue date Feb 6, 2001
- Clariant Finance (BVI) Limited
- Wen-Bing Kan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resist composition with high heat resistance
- Patent number 6,080,522
- Issue date Jun 27, 2000
- Clariant Internaitonal, Ltd.
- Hiromi Ito
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for anti-reflection coating
- Patent number 5,853,471
- Issue date Dec 29, 1998
- Hoechst Japan Limited
- Takeo Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Etching method and composition for forming etching protective layer
- Publication number 20040238486
- Publication date Dec 2, 2004
- Hatsuyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming pattern and treating agent for use therein
- Publication number 20040053170
- Publication date Mar 18, 2004
- Kazuyo Ijima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Development deffect preventing process and material
- Publication number 20030180667
- Publication date Sep 25, 2003
- Yusuke Takano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation absorbing polymer, composition for radiation absorbing co...
- Publication number 20030065119
- Publication date Apr 3, 2003
- CLARIANT FINANCE (BVI) LIMITED
- Wen-Bing Kang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Blocked isocyanate compound-containing composition for forming a ra...
- Publication number 20030027078
- Publication date Feb 6, 2003
- Wen-Bing Kang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Hatsuyuki Tanaka

Person

Patents Grantslast 30 patents

Development defect preventing process and material

Etching method and composition for forming etching protective layer

Method for forming pattern and treating agent for use therein

Blocked isocyanate compound-containing composition for forming a ra...

Composition for anti-reflective coating or radiation absorbing coat...

Radiation absorbing polymer, composition for radiation absorbing co...

Composition for antireflection coating

Water-soluble resin composition

Radiation absorbing polymer, composition for radiation absorbing co...

Composition for light absorption film formation containing blocked...

Method for forming resist pattern

Antireflection or light-absorbing coating composition and polymer t...

Composition for reflection reducing coating

Composition for bottom reflection preventive film and novel polymer...

Light-absorbing polymers and application thereof to anti-reflection...

Radiation absorbing polymer and synthesis thereof

Radiation-sensitive resist composition with high heat resistance

Composition for anti-reflection coating

Patents Applicationslast 30 patents

Etching method and composition for forming etching protective layer

Method for forming pattern and treating agent for use therein

Development deffect preventing process and material

Radiation absorbing polymer, composition for radiation absorbing co...

Blocked isocyanate compound-containing composition for forming a ra...