Hayato HATTORI

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon-containing resist underlayer film-forming composition inclu...
- Patent number 12,248,251
- Issue date Mar 11, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device production method employing silicon-containing...
- Patent number 11,966,164
- Issue date Apr 23, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20250085634
- Publication date Mar 13, 2025
- NISSAN CHEMICAL CORPORATION
- Masahisa ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYCYCLIC AROMATIC HYDROCARBON PHOTOCURABLE RESIN COMPOSITION
- Publication number 20250011507
- Publication date Jan 9, 2025
- NISSAN CHEMICAL CORPORATION
- Takahiro KISHIOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MA...
- Publication number 20250014901
- Publication date Jan 9, 2025
- NISSAN CHEMICAL CORPORATION
- Hayato HATTORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20240201592
- Publication date Jun 20, 2024
- NISSAN CHEMICAL CORPORATION
- Hayato HATTORI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM FORMATION COMPOSITION
- Publication number 20240103369
- Publication date Mar 28, 2024
- NISSAN CHEMICAL CORPORATION
- Masahisa ENDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STEP SUBSTRATE COATING COMPOSITION
- Publication number 20230350299
- Publication date Nov 2, 2023
- NISSAN CHEMICAL CORPORATION
- Yuki MITSUTAKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLU...
- Publication number 20220373888
- Publication date Nov 24, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20220342306
- Publication date Oct 27, 2022
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20220283501
- Publication date Sep 8, 2022
- NISSAN CHEMICAL CORPORATION
- Hiroto OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR COATING SUBSTRATE WITH LEVEL DIFFERENCE, SAID COMPO...
- Publication number 20220269176
- Publication date Aug 25, 2022
- NISSAN CHEMICAL CORPORATION
- Hayato HATTORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE PRODUCTION METHOD EMPLOYING SILICON-CONTAINING...
- Publication number 20210181635
- Publication date Jun 17, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION FOR INSULATING FILM
- Publication number 20200347226
- Publication date Nov 5, 2020
- NISSAN CHEMICAL CORPORATION
- Takuya OHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hayato HATTORI

Person

Patents Grantslast 30 patents

Silicon-containing resist underlayer film-forming composition inclu...

Semiconductor device production method employing silicon-containing...

Patents Applicationslast 30 patents

RESIST UNDERLAYER FILM-FORMING COMPOSITION

POLYCYCLIC AROMATIC HYDROCARBON PHOTOCURABLE RESIN COMPOSITION

WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MA...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

RESIST UNDERLAYER FILM FORMATION COMPOSITION

STEP SUBSTRATE COATING COMPOSITION

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLU...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION

COMPOSITION FOR COATING SUBSTRATE WITH LEVEL DIFFERENCE, SAID COMPO...

SEMICONDUCTOR DEVICE PRODUCTION METHOD EMPLOYING SILICON-CONTAINING...

RESIN COMPOSITION FOR INSULATING FILM