Hayato HISHINUMA

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Miyagi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 10,438,774
- Issue date Oct 8, 2019
- Tokyo Electron Limited
- Hayato Hishinuma
- C30 - CRYSTAL GROWTH
Information Patent Grant
Etching method
- Patent number 9,779,961
- Issue date Oct 3, 2017
- Tokyo Electron Limited
- Yusuke Saitoh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200294773
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Hayato Hishinuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180158654
- Publication date Jun 7, 2018
- TOKYO ELECTRON LIMITED
- Hayato HISHINUMA
- C30 - CRYSTAL GROWTH
Information Patent Application
ETCHING METHOD
- Publication number 20160064245
- Publication date Mar 3, 2016
- TOKYO ELECTRON LIMITED
- Yusuke SAITOH
- H01 - BASIC ELECTRIC ELEMENTS