Hayato NAMAI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 11,966,161
- Issue date Apr 23, 2024
- JSR Corporation
- Takuhiro Taniguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,320,739
- Issue date May 3, 2022
- JSR Corporation
- Goji Wakamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition and resist pattern-forming me...
- Patent number 10,824,073
- Issue date Nov 3, 2020
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition, resist pattern-forming method and polymer
- Patent number 10,331,031
- Issue date Jun 25, 2019
- JSR Corporation
- Hayato Namai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Acid diffusion control agent, radiation-sensitive resin composition...
- Patent number 10,088,750
- Issue date Oct 2, 2018
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and resist pattern-forming me...
- Patent number 9,874,816
- Issue date Jan 23, 2018
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and resist pattern-forming me...
- Patent number 9,760,004
- Issue date Sep 12, 2017
- JSR Corporation
- Hiromu Miyata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, compound, and production method thereof
- Patent number 9,720,322
- Issue date Aug 1, 2017
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
- Patent number 9,703,195
- Issue date Jul 11, 2017
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method and photoresist composition
- Patent number 9,594,303
- Issue date Mar 14, 2017
- JSR Corporation
- Hitoshi Osaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid diffusion control agent, radiation-sensitive resin composition...
- Patent number 9,588,423
- Issue date Mar 7, 2017
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, resist pattern-forming method, acid diffus...
- Patent number 9,557,641
- Issue date Jan 31, 2017
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
- Patent number 9,529,259
- Issue date Dec 27, 2016
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, compound, and production method thereof
- Patent number 9,477,149
- Issue date Oct 25, 2016
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, polymer, compound, and metho...
- Patent number 9,465,291
- Issue date Oct 11, 2016
- JSR Corporation
- Hayato Namai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for film formation, resist underlayer film, and forming...
- Patent number 9,412,593
- Issue date Aug 9, 2016
- JSR Corporation
- Hayato Namai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Photoresist composition, resist pattern-forming method, compound, a...
- Patent number 9,323,146
- Issue date Apr 26, 2016
- JSR Corporation
- Hayato Namai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Insulation pattern-forming method and insulation pattern-forming ma...
- Patent number 9,126,231
- Issue date Sep 8, 2015
- JSR Corporation
- Satoshi Dei
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Pattern-forming method
- Patent number 8,968,586
- Issue date Mar 3, 2015
- JSR Corporation
- Hayato Namai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for forming pattern
- Patent number 8,883,023
- Issue date Nov 11, 2014
- JSR Corporation
- Goji Wakamatsu
- B44 - DECORATIVE ARTS
Information Patent Grant
Pattern-forming method
- Patent number 8,703,395
- Issue date Apr 22, 2014
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20230244143
- Publication date Aug 3, 2023
- JSR Corporation
- Takuhiro TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20220334481
- Publication date Oct 20, 2022
- JSR Corporation
- Takuhiro TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20180348633
- Publication date Dec 6, 2018
- JSR Corporation
- Goji Wakamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20180329298
- Publication date Nov 15, 2018
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20170363961
- Publication date Dec 21, 2017
- JSR Corporation
- Hayato NAMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION...
- Publication number 20170131632
- Publication date May 11, 2017
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER
- Publication number 20170115570
- Publication date Apr 27, 2017
- JSR Corporation
- Hayato NAMAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF
- Publication number 20160370700
- Publication date Dec 22, 2016
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20160363859
- Publication date Dec 15, 2016
- JSR Corporation
- Hayato NAMAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20160202608
- Publication date Jul 14, 2016
- JSR Corporation
- Hayato NAMAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER
- Publication number 20160185999
- Publication date Jun 30, 2016
- JSR Corporation
- Hayato NAMAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20150355539
- Publication date Dec 10, 2015
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20150323866
- Publication date Nov 12, 2015
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUS...
- Publication number 20150309406
- Publication date Oct 29, 2015
- JSR Corporation
- Hayato NAMAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM, AND FORMING...
- Publication number 20150267046
- Publication date Sep 24, 2015
- JSR Corporation
- Hayato NAMAI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20150093703
- Publication date Apr 2, 2015
- JSR Corporation
- Hiromu MIYATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION...
- Publication number 20150079520
- Publication date Mar 19, 2015
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION
- Publication number 20150010866
- Publication date Jan 8, 2015
- JSR Corporation
- Hitoshi Osaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF
- Publication number 20150004545
- Publication date Jan 1, 2015
- JSR Corporation
- Hayato NAMAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUS...
- Publication number 20150004544
- Publication date Jan 1, 2015
- JSR Corporation
- Hayato NAMAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, A...
- Publication number 20140363769
- Publication date Dec 11, 2014
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHO...
- Publication number 20140186771
- Publication date Jul 3, 2014
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20130206727
- Publication date Aug 15, 2013
- JSR Corporation
- Hayato NAMAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20130107235
- Publication date May 2, 2013
- JSR Corporation
- Hayato NAMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING PATTERN
- Publication number 20130098870
- Publication date Apr 25, 2013
- JSR Corporation
- Goji WAKAMATSU
- B44 - DECORATIVE ARTS
Information Patent Application
INSULATION PATTERN-FORMING METHOD AND INSULATION PATTERN-FORMING MA...
- Publication number 20130084394
- Publication date Apr 4, 2013
- JSR Corporation
- Satoshi Dei
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMIN...
- Publication number 20100167024
- Publication date Jul 1, 2010
- JSR Corporation
- Norihiro Natsume
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hayato NAMAI

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition, method of forming resist pat...

Composition for resist underlayer film formation, resist underlayer...

Radiation-sensitive resin composition and resist pattern-forming me...

Resin composition, resist pattern-forming method and polymer

Acid diffusion control agent, radiation-sensitive resin composition...

Radiation-sensitive resin composition and resist pattern-forming me...

Radiation-sensitive resin composition and resist pattern-forming me...

Photoresist composition, compound, and production method thereof

Radiation-sensitive resin composition, resist pattern-forming metho...

Resist pattern-forming method and photoresist composition

Acid diffusion control agent, radiation-sensitive resin composition...

Photoresist composition, resist pattern-forming method, acid diffus...

Radiation-sensitive resin composition, resist pattern-forming metho...

Photoresist composition, compound, and production method thereof

Radiation-sensitive resin composition, polymer, compound, and metho...

Composition for film formation, resist underlayer film, and forming...

Photoresist composition, resist pattern-forming method, compound, a...

Insulation pattern-forming method and insulation pattern-forming ma...

Pattern-forming method

Method for forming pattern

Pattern-forming method

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION...

RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER

PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUS...

COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM, AND FORMING...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION...

RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF

PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUS...

PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, A...

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHO...

PATTERN-FORMING METHOD

PATTERN-FORMING METHOD

METHOD FOR FORMING PATTERN

INSULATION PATTERN-FORMING METHOD AND INSULATION PATTERN-FORMING MA...

NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMIN...