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Hayato Ohno
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Ebina, JP
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last 30 patents
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Patent Grant
Positive photoresist compositions and a process for producing the same
Patent number
6,083,657
Issue date
Jul 4, 2000
Tokyo Ohka Kogyo Co., Ltd.
Shinichi Kono
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive photoresist coating solution comprising a mixed solvent of...
Patent number
5,702,862
Issue date
Dec 30, 1997
Tokyo Ohka Kogyo Co., Ltd.
Hayato Ohno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-working photoresist composition comprising a novolac resin...
Patent number
5,604,077
Issue date
Feb 18, 1997
Tokyo Ohka Kogyo Co., Ltd.
Shinichi Kono
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive-working quinone diazide composition containing N,N',N"-sub...
Patent number
5,332,647
Issue date
Jul 26, 1994
Tokyo Ohka Kogyo Co., Ltd.
Hayato Ohno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY