Hayato WATANABE

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,532,484
- Issue date Dec 20, 2022
- HITACHI HIGH-TECH CORPORATION
- Taku Iwase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,373,875
- Issue date Jun 28, 2022
- HITACHI HIGH-TECH CORPORATION
- Yusuke Nagamitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 10,056,236
- Issue date Aug 21, 2018
- Hitachi High-Technologies Corporation
- Hayato Watanabe
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20210066087
- Publication date Mar 4, 2021
- Hitachi High-Tech Corporation
- Yusuke Nagamitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200227270
- Publication date Jul 16, 2020
- Hitachi High-Technologies Corporation
- Taku IWASE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20180082825
- Publication date Mar 22, 2018
- Hitachi High-Technologies Corporation
- Hayato WATANABE
- B08 - CLEANING