Heebom Kim

Person

Suwon-Si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Reticle in an apparatus for extreme ultraviolet exposure
- Patent number 11,409,193
- Issue date Aug 9, 2022
- Samsung Electronics Co., Ltd.
- Mankyu Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, method of fabricating the same, and method of manufactur...
- Patent number 11,086,210
- Issue date Aug 10, 2021
- Samsung Electronics Co., Ltd.
- Yigwon Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and reticle including the same
- Patent number 10,866,507
- Issue date Dec 15, 2020
- Samsung Electronics Co., Ltd.
- Yongseung Moon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods, systems and computer program products configured to adjust...
- Patent number 10,224,178
- Issue date Mar 5, 2019
- Samsung Electronics Co., Ltd.
- Yongseok Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, method of making a photomask and photolithography method...
- Patent number 7,629,087
- Issue date Dec 8, 2009
- Samsung Electronics Co., Ltd.
- Sungmin Huh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF...
- Publication number 20240027890
- Publication date Jan 25, 2024
- Samsung Electronics Co., Ltd.
- Hyungjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE IN AN APPARATUS FOR EXTREME ULTRAVIOLET EXPOSURE
- Publication number 20210302825
- Publication date Sep 30, 2021
- Samsung Electronics Co., Ltd.
- Mankyu KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK, METHOD OF FABRICATING THE SAME, AND METHOD OF MANUFACTUR...
- Publication number 20200225572
- Publication date Jul 16, 2020
- Samsung Electronics Co., Ltd.
- Yigwon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE AND RETICLE INCLUDING THE SAME
- Publication number 20190243234
- Publication date Aug 8, 2019
- Samsung Electronics Co., Ltd.
- Yongseung MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods, Systems, and Computer Program Products Configured to Adjus...
- Publication number 20180082820
- Publication date Mar 22, 2018
- Yongseok JUNG
- G01 - MEASURING TESTING
Information Patent Application
Photomask, method of making a photomask and photolithography method...
- Publication number 20060286460
- Publication date Dec 21, 2006
- SAMSUNG ELECTRONICS CO., LTD.
- Sungmin Huh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Reticle in an apparatus for extreme ultraviolet exposure

Photomask, method of fabricating the same, and method of manufactur...

Pellicle and reticle including the same

Methods, systems and computer program products configured to adjust...

Photomask, method of making a photomask and photolithography method...

Patents Applicationslast 30 patents

REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF...

RETICLE IN AN APPARATUS FOR EXTREME ULTRAVIOLET EXPOSURE

PHOTOMASK, METHOD OF FABRICATING THE SAME, AND METHOD OF MANUFACTUR...

PELLICLE AND RETICLE INCLUDING THE SAME

Methods, Systems, and Computer Program Products Configured to Adjus...

Photomask, method of making a photomask and photolithography method...