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Heeyeop Chae
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San Jose, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Apparatus for controlling gas flow in a semiconductor substrate pro...
Patent number
8,236,105
Issue date
Aug 7, 2012
Applied Materials, Inc.
Kallol Bera
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Capacitively coupled plasma reactor with magnetic plasma control
Patent number
7,955,986
Issue date
Jun 7, 2011
Applied Materials, Inc.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Selective etching of carbon-doped low-k dielectrics
Patent number
7,256,134
Issue date
Aug 14, 2007
Applied Materials, Inc.
Yunsang Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Capacitively coupled plasma reactor with magnetic plasma control
Patent number
6,853,141
Issue date
Feb 8, 2005
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
CAPACITIVELY COUPLED PLASMA REACTOR WITH MAGNETIC PLASMA CONTROL
Publication number
20110201134
Publication date
Aug 18, 2011
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Capacitively coupled plasma reactor with magnetic plasma control
Publication number
20080023143
Publication date
Jan 31, 2008
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Capacitively coupled plasma reactor with magnetic plasma control
Publication number
20060157201
Publication date
Jul 20, 2006
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Apparatus for controlling gas flow in a semiconductor substrate pro...
Publication number
20050224180
Publication date
Oct 13, 2005
APPLIED MATERIALS, INC.
Kallol Bera
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Selective etching of carbon-doped low-k dielectrics
Publication number
20050026430
Publication date
Feb 3, 2005
APPLIED MATERIALS, INC.
Yunsang Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Capacitively coupled plasma reactor with magnetic plasma control
Publication number
20050001556
Publication date
Jan 6, 2005
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Cathode pedestal for a plasma etch reactor
Publication number
20040040664
Publication date
Mar 4, 2004
Jang Gyoo Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Dielectric etching with reduced striation
Publication number
20030228768
Publication date
Dec 11, 2003
APPLIED MATERIALS, INC.
Heeyeop Chae
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Capacitively coupled plasma reactor with magnetic plasma control
Publication number
20030218427
Publication date
Nov 27, 2003
APPLIED MATERIALS, INC.
Daniel J. Hoffman
H01 - BASIC ELECTRIC ELEMENTS