Heike Scholtz

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Method and system for excursion monitoring in optical lithography p...
- Patent number 8,660,681
- Issue date Feb 25, 2014
- GLOBALFOUNDRIES Inc.
- Andre Poock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method and System for Excursion Monitoring in Optical Lithography P...
- Publication number 20120004758
- Publication date Jan 5, 2012
- GLOBALFOUNDRIES INC.
- Andre Poock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY