Heiko Assmann

Follow

Person

Dresden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device power metallization layer with stress-relievin...
- Patent number 11,276,624
- Issue date Mar 15, 2022
- Infineon Technologies Austria AG
- Michael Nelhiebel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing a self-aligning masking layer
- Patent number 10,468,248
- Issue date Nov 5, 2019
- Infineon Technologies AG
- Heiko Aßmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure mask, exposure apparatus and method for calibrating an exp...
- Patent number 10,331,036
- Issue date Jun 25, 2019
- Infineon Technologies AG
- Heiko Assmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
IDENTIFICATION CODES ON SEMICONDUCTOR CHIPS
- Publication number 20230350309
- Publication date Nov 2, 2023
- INFINEON TECHNOLOGIES AG
- Detlef Hofmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Device Power Metallization Layer with Stress-Relievin...
- Publication number 20210183732
- Publication date Jun 17, 2021
- Michael Nelhiebel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE MASK, EXPOSURE APPARATUS AND METHOD FOR CALIBRATING AN EXP...
- Publication number 20170336718
- Publication date Nov 23, 2017
- INFINEON TECHNOLOGIES AG
- Heiko Assmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A SELF-ALIGNING MASKING LAYER
- Publication number 20170294299
- Publication date Oct 12, 2017
- INFINEON TECHNOLOGIES AG
- Heiko Assmann
- H01 - BASIC ELECTRIC ELEMENTS