Heiko Hommen

Person

Dresden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Arrangement for transferring information/structures to wafers
- Patent number 7,401,549
- Issue date Jul 22, 2008
- Infineon Technologies AG
- Jens Staecker
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for carrying out a double or multiple exposure
- Patent number 7,310,129
- Issue date Dec 18, 2007
- Infineon Technologies, AG
- Jens Stäcker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark for coarse alignment and fine alignment of a semicon...
- Patent number 7,245,351
- Issue date Jul 17, 2007
- Infineon Technologies, AG
- Diana Mattiza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining the relative positional accuracy of two stru...
- Patent number 7,186,484
- Issue date Mar 6, 2007
- Infineon Technologies AG
- Heiko Hommen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for exposing at least one or at least two semiconductor wafers
- Patent number 6,979,522
- Issue date Dec 27, 2005
- Infineon Technologies AG
- Heiko Hommen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of exposing a semiconductor wafer in an exposer
- Patent number 6,896,999
- Issue date May 24, 2005
- Infineon Technologies AG
- Jens Stäcker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a processing device for a sequential process...
- Patent number 6,684,124
- Issue date Jan 27, 2004
- Infineon Technologies AG
- Thorsten Schedel
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Wafer exposure device and method
- Publication number 20080079920
- Publication date Apr 3, 2008
- Heiko Hommen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining the relative positional accuracy of two stru...
- Publication number 20050260510
- Publication date Nov 24, 2005
- Heiko Hommen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for carrying out a double or multiple exposure
- Publication number 20050105073
- Publication date May 19, 2005
- Jens Stacker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment mark for coarse alignment and fine alignment of a semicon...
- Publication number 20050068508
- Publication date Mar 31, 2005
- Diana Mattiza
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Arrangement for transferring information/structures to wafers
- Publication number 20040219803
- Publication date Nov 4, 2004
- Jens Staecker
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Method for exposing at least one or at least two semiconductor wafers
- Publication number 20040029025
- Publication date Feb 12, 2004
- Heiko Hommen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of exposing a semiconductor wafer in an exposer
- Publication number 20040023138
- Publication date Feb 5, 2004
- Jens Stacker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for controlling a process appliance for the sequential proce...
- Publication number 20020183879
- Publication date Dec 5, 2002
- Thorsten Schedel
- H01 - BASIC ELECTRIC ELEMENTS

Heiko Hommen

Person

Patents Grantslast 30 patents

Arrangement for transferring information/structures to wafers

Method for carrying out a double or multiple exposure

Alignment mark for coarse alignment and fine alignment of a semicon...

Method for determining the relative positional accuracy of two stru...

Method for exposing at least one or at least two semiconductor wafers

Method of exposing a semiconductor wafer in an exposer

Method for controlling a processing device for a sequential process...

Patents Applicationslast 30 patents

Wafer exposure device and method

Method for determining the relative positional accuracy of two stru...

Method for carrying out a double or multiple exposure

Alignment mark for coarse alignment and fine alignment of a semicon...

Arrangement for transferring information/structures to wafers

Method for exposing at least one or at least two semiconductor wafers

Method of exposing a semiconductor wafer in an exposer

Method for controlling a process appliance for the sequential proce...