Heiko Siekmann

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing a substrate for an optical element
- Patent number 12,196,986
- Issue date Jan 14, 2025
- Carl Zeiss SMT GmbH
- Andreas Schmehl
- C30 - CRYSTAL GROWTH
Information Patent Grant
Illumination system for a microlithographic projection exposure app...
- Patent number 9,575,414
- Issue date Feb 21, 2017
- Carl Zeiss SMT GmbH
- Johannes Wangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a reflective optical component for an EUV proj...
- Patent number 9,541,685
- Issue date Jan 10, 2017
- Carl Zeiss SMT GmbH
- Holger Kierey
- B24 - GRINDING POLISHING
Information Patent Grant
Illumination system for a microlithographic projection exposure app...
- Patent number 9,217,930
- Issue date Dec 22, 2015
- Carl Zeiss SMT GmbH
- Johannes Wangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate for mirrors for EUV lithography
- Patent number 8,976,927
- Issue date Mar 10, 2015
- Carl Zeiss SMT GmbH
- Claudia Ekstein
- G02 - OPTICS
Information Patent Grant
Optical integrator for an illumination system of a microlithographi...
- Patent number 8,520,307
- Issue date Aug 27, 2013
- Carl Zeiss SMT GmbH
- Oliver Wolf
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Illumination system for a microlithographic projection exposure app...
- Patent number 8,395,756
- Issue date Mar 12, 2013
- Carl Zeiss SMT GmbH
- Johannes Wangler
- G02 - OPTICS
Information Patent Grant
Optical integrator for an illumination system of a microlithographi...
- Patent number 7,880,969
- Issue date Feb 1, 2011
- Carl Zeiss SMT AG
- Oliver Wolf
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING A SUBSTRATE FOR AN OPTICAL ELEMENT, AND REFLEC...
- Publication number 20250093557
- Publication date Mar 20, 2025
- Carl Zeiss SMT GMBH
- Andreas SCHMEHL
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD FOR PRODUCING A SUBSTRATE FOR AN OPTICAL ELEMENT, AND REFLEC...
- Publication number 20210072435
- Publication date Mar 11, 2021
- Carl Zeiss SMT GMBH
- Andreas SCHMEHL
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20160077446
- Publication date Mar 17, 2016
- Carl Zeiss SMT GMBH
- Johannes Wangler
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A REFLECTIVE OPTICAL COMPONENT FOR AN EUV PROJ...
- Publication number 20130335816
- Publication date Dec 19, 2013
- Holger Kierey
- G02 - OPTICS
Information Patent Application
SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY
- Publication number 20130170056
- Publication date Jul 4, 2013
- Carl Zeiss SMT GMBH
- Claudia EKSTEIN
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20130148092
- Publication date Jun 13, 2013
- Carl Zeiss SMT GMBH
- Johannes Wangler
- G02 - OPTICS
Information Patent Application
OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...
- Publication number 20110083542
- Publication date Apr 14, 2011
- Carl Zeiss SMT GMBH
- Oliver Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...
- Publication number 20090021839
- Publication date Jan 22, 2009
- Carl Zeiss SMT AG
- Oliver Wolf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20090021716
- Publication date Jan 22, 2009
- Carl Zeiss SMT AG
- Johannes Wangler
- G02 - OPTICS

Heiko Siekmann

Person

Patents Grantslast 30 patents

Method for producing a substrate for an optical element

Illumination system for a microlithographic projection exposure app...

Method for producing a reflective optical component for an EUV proj...

Illumination system for a microlithographic projection exposure app...

Substrate for mirrors for EUV lithography

Optical integrator for an illumination system of a microlithographi...

Illumination system for a microlithographic projection exposure app...

Optical integrator for an illumination system of a microlithographi...

Patents Applicationslast 30 patents

METHOD FOR PRODUCING A SUBSTRATE FOR AN OPTICAL ELEMENT, AND REFLEC...

METHOD FOR PRODUCING A SUBSTRATE FOR AN OPTICAL ELEMENT, AND REFLEC...

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

METHOD FOR PRODUCING A REFLECTIVE OPTICAL COMPONENT FOR AN EUV PROJ...

SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...

OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHI...

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...