Helin HUANG

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Silica-based slurry for selective polishing of carbon-based films
- Patent number 11,802,220
- Issue date Oct 31, 2023
- CMC Materials, Inc.
- Brian Reiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase barrier film removal rate in bulk tungsten slurry
- Patent number 11,597,854
- Issue date Mar 7, 2023
- CMC Materials, Inc.
- William J. Ward
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface treated abrasive particles for tungsten buff applications
- Patent number 11,043,151
- Issue date Jun 22, 2021
- CMC Materials, Inc.
- Ji Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and method for removing residue from chemical-mechanica...
- Patent number 10,522,341
- Issue date Dec 31, 2019
- Cabot Microelectronics Corporation
- Helin Huang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Tungsten processing slurry with catalyst
- Patent number 10,066,126
- Issue date Sep 4, 2018
- Cabot Microelectronics Corporation
- Kevin P. Dockery
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tungsten-processing slurry with cationic surfactant and cyclodextrin
- Patent number 9,771,496
- Issue date Sep 26, 2017
- Cabot Microelectronics Corporation
- Kevin Dockery
- B24 - GRINDING POLISHING
Information Patent Grant
Tungsten-processing slurry with cationic surfactant
- Patent number 9,631,122
- Issue date Apr 25, 2017
- Cabot Microelectronics Corporation
- Kevin Dockery
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
TITANIUM OXIDE-BASED CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR...
- Publication number 20250075104
- Publication date Mar 6, 2025
- Entegris, Inc.
- Alex Villani-Gale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVELY CHARGED ABRASIVE WITH NEGATIVELY CHARGED IONIC OXIDIZER...
- Publication number 20240150614
- Publication date May 9, 2024
- Entegris, Inc.
- Tsuyoshi MASUDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP...
- Publication number 20230242790
- Publication date Aug 3, 2023
- CMC Materials, Inc.
- Brian Reiss
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP...
- Publication number 20230242791
- Publication date Aug 3, 2023
- CMC Materials, Inc.
- Brian Reiss
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICA-BASED SLURRY FOR SELECTIVE POLISHING OF CARBON-BASED FILMS
- Publication number 20220089908
- Publication date Mar 24, 2022
- CMC Materials, Inc.
- Brian REISS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO INCREASE BARRIER FILM REMOVAL RATE IN BULK TUNGSTEN SLURRY
- Publication number 20210017421
- Publication date Jan 21, 2021
- Cabot Microelectronics Corporation
- William J. WARD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS
- Publication number 20200332150
- Publication date Oct 22, 2020
- Cabot Microelectronics Corporation
- Chih-Hsien CHIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS
- Publication number 20190100677
- Publication date Apr 4, 2019
- Cabot Microelectronics Corporation
- Ji CUI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION AND METHOD FOR REMOVING RESIDUE FROM CHEMICAL-MECHANICA...
- Publication number 20180166273
- Publication date Jun 14, 2018
- Cabot Microelectronics Corporation
- Helin HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNGSTEN PROCESSING SLURRY WITH CATALYST
- Publication number 20170190936
- Publication date Jul 6, 2017
- Cabot Microelectronics Corporation
- Kevin P. Dockery
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT AND CYCLODEXTRIN
- Publication number 20170121560
- Publication date May 4, 2017
- Cabot Microelectronics Corporation
- Kevin DOCKERY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT
- Publication number 20170121561
- Publication date May 4, 2017
- Cabot Microelectronics Corporation
- Kevin DOCKERY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Helin HUANG

Person

Patents Grantslast 30 patents

Silica-based slurry for selective polishing of carbon-based films

Method to increase barrier film removal rate in bulk tungsten slurry

Surface treated abrasive particles for tungsten buff applications

Composition and method for removing residue from chemical-mechanica...

Tungsten processing slurry with catalyst

Tungsten-processing slurry with cationic surfactant and cyclodextrin

Tungsten-processing slurry with cationic surfactant

Patents Applicationslast 30 patents

TITANIUM OXIDE-BASED CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR...

POSITIVELY CHARGED ABRASIVE WITH NEGATIVELY CHARGED IONIC OXIDIZER...

CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP...

CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP...

SILICA-BASED SLURRY FOR SELECTIVE POLISHING OF CARBON-BASED FILMS

METHOD TO INCREASE BARRIER FILM REMOVAL RATE IN BULK TUNGSTEN SLURRY

SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS

SURFACE TREATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS

COMPOSITION AND METHOD FOR REMOVING RESIDUE FROM CHEMICAL-MECHANICA...

TUNGSTEN PROCESSING SLURRY WITH CATALYST

TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT AND CYCLODEXTRIN

TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT