Helmut Beierl

Person

Heindenheim, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Projection lens system of a microlithographic projection exposure i...
- Patent number 9,164,396
- Issue date Oct 20, 2015
- Carl Zeiss SMT GmbH
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure system and projection exposure method
- Patent number 9,146,475
- Issue date Sep 29, 2015
- Carl Zeiss SMT GmbH
- Paul Gräupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,982,325
- Issue date Mar 17, 2015
- Carl Zeiss SMT GmbH
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for microlithography
- Patent number 8,436,982
- Issue date May 7, 2013
- Carl Zeiss SMT GmbH
- Helmut Beierl
- G02 - OPTICS
Information Patent Grant
Projection lens system of a microlithographic projection exposure i...
- Patent number 8,319,944
- Issue date Nov 27, 2012
- Carl Zeiss SMT GmbH
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,107,054
- Issue date Jan 31, 2012
- Carl Zeiss SMT GmbH
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens system of a microlithographic projection exposure i...
- Patent number 7,782,440
- Issue date Aug 24, 2010
- Carl Zeiss SMT AG
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Catadioptric projection objective with geometric beam splitting
- Patent number 7,426,082
- Issue date Sep 16, 2008
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Refractive projection objective for immersion lithography
- Patent number 7,408,716
- Issue date Aug 5, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Refractive projection objective for immersion lithography
- Patent number 7,187,503
- Issue date Mar 6, 2007
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Grant
Projection objective having adjacently mounted aspheric lens surfaces
- Patent number 7,154,678
- Issue date Dec 26, 2006
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Catadioptric reduction lens
- Patent number 7,136,220
- Issue date Nov 14, 2006
- Carl Zeiss SMT AG
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Grant
Catadioptric reduction lens
- Patent number 7,006,304
- Issue date Feb 28, 2006
- Carl Zeiss SMT AG
- Alexander Epple
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective with geometric beam splitting
- Patent number 6,995,930
- Issue date Feb 7, 2006
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Catadioptric optical system and exposure apparatus having the same
- Patent number 6,985,286
- Issue date Jan 10, 2006
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Projection objective having adjacently mounted aspheric lens surfaces
- Patent number 6,903,802
- Issue date Jun 7, 2005
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Projection exposure system
- Patent number 6,806,942
- Issue date Oct 19, 2004
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Catadioptric optical system and exposure apparatus having the same
- Patent number 6,717,722
- Issue date Apr 6, 2004
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Catadioptric reduction lens
- Patent number 6,717,746
- Issue date Apr 6, 2004
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Alexander Epple
- G02 - OPTICS
Information Patent Grant
Projection exposure lens with aspheric elements
- Patent number 6,665,126
- Issue date Dec 16, 2003
- Carl-Zeiss-Stiftung
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Projection objective having adjacently mounted aspheric lens surfaces
- Patent number 6,646,718
- Issue date Nov 11, 2003
- Carl Zeiss Semiconductor Manufacturing Technologies AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Grant
Catadioptric optical system and exposure apparatus having the same
- Patent number 6,496,306
- Issue date Dec 17, 2002
- Carl-Zeiss-Stiftung
- David R. Shafer
- G02 - OPTICS
Information Patent Grant
Catadioptric objective with physical beam splitter
- Patent number 6,424,471
- Issue date Jul 23, 2002
- Carl-Zeiss-Stiftung
- Willi Ulrich
- G02 - OPTICS
Information Patent Grant
Microlithographic reduction objective, projection exposure equipmen...
- Patent number 6,349,005
- Issue date Feb 19, 2002
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Projection Exposure System and Projection Exposure Method
- Publication number 20130182234
- Publication date Jul 18, 2013
- Carl Zeiss SMT GMBH
- Paul Graupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...
- Publication number 20130070224
- Publication date Mar 21, 2013
- Carl Zeiss SMT GMBH
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20120092637
- Publication date Apr 19, 2012
- Carl Zeiss SMT GMBH
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...
- Publication number 20100265478
- Publication date Oct 21, 2010
- Carl Zeiss SMT AG
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
- Publication number 20100201959
- Publication date Aug 12, 2010
- Carl Zeiss SMT AG
- Helmut Beierl
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20090073398
- Publication date Mar 19, 2009
- Carl Zeiss SMT AG
- Michael Totzeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE WITH GEOMETRIC BEAM SPLITTING
- Publication number 20080316456
- Publication date Dec 25, 2008
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Application
Projection Lens System of a Microlithographic Projection Exposure I...
- Publication number 20080106711
- Publication date May 8, 2008
- Carl Zeiss SMT AG
- Helmut Beierl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Refractive projection objective for immersion lithography
- Publication number 20070109659
- Publication date May 17, 2007
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Application
Catadioptric projection objective with geometric beam splitting
- Publication number 20060077366
- Publication date Apr 13, 2006
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Application
Refractive projection objective for immersion lithography
- Publication number 20050190455
- Publication date Sep 1, 2005
- Carl Zeiss SMT AG
- Hans-Juergen Rostalski
- G02 - OPTICS
Information Patent Application
Catadioptric projection objective with geometric beam splitting
- Publication number 20050185269
- Publication date Aug 25, 2005
- Carl Zeiss SMT AG
- Alexander Epple
- G02 - OPTICS
Information Patent Application
Projection objective having adjacently mounted aspheric lens surfaces
- Publication number 20050157400
- Publication date Jul 21, 2005
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Catadioptric projection objective with geometric beam splitting
- Publication number 20050117224
- Publication date Jun 2, 2005
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS
Information Patent Application
Catadioptric reduction lens
- Publication number 20040263955
- Publication date Dec 30, 2004
- Carl Zeiss SMT AG
- Wilhelm Ulrich
- G02 - OPTICS
Information Patent Application
Projection objective having adjacently mounted aspheric lens surfaces
- Publication number 20040233409
- Publication date Nov 25, 2004
- Carl-Zeiss-Stiftung
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Catadioptric optical system and exposure apparatus having the same
- Publication number 20040169914
- Publication date Sep 2, 2004
- David R. Shafer
- G02 - OPTICS
Information Patent Application
Catadioptric reduction lens
- Publication number 20040160677
- Publication date Aug 19, 2004
- Carl Zeiss SMT AG
- Alexander Epple
- G02 - OPTICS
Information Patent Application
Projection exposure system
- Publication number 20040017554
- Publication date Jan 29, 2004
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Projection objective having adjacently mounted aspheric lens surfaces
- Publication number 20030179356
- Publication date Sep 25, 2003
- Karl-Heinz Schuster
- G02 - OPTICS
Information Patent Application
Catadioptric reduction lens
- Publication number 20030021040
- Publication date Jan 30, 2003
- CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG
- Alexander Epple
- G02 - OPTICS
Information Patent Application
Catadioptric optical system and exposure apparatus having the same
- Publication number 20020196533
- Publication date Dec 26, 2002
- David R. Shafer
- G02 - OPTICS
Information Patent Application
Projection exposure lens with aspheric elements
- Publication number 20020039175
- Publication date Apr 4, 2002
- David R. Shafer
- G02 - OPTICS

Helmut Beierl

Person

Patents Grantslast 30 patents

Projection lens system of a microlithographic projection exposure i...

Projection exposure system and projection exposure method

Microlithographic projection exposure apparatus

Projection objective for microlithography

Projection lens system of a microlithographic projection exposure i...

Microlithographic projection exposure apparatus

Projection lens system of a microlithographic projection exposure i...

Catadioptric projection objective with geometric beam splitting

Refractive projection objective for immersion lithography

Refractive projection objective for immersion lithography

Projection objective having adjacently mounted aspheric lens surfaces

Catadioptric reduction lens

Catadioptric reduction lens

Catadioptric projection objective with geometric beam splitting

Catadioptric optical system and exposure apparatus having the same

Projection objective having adjacently mounted aspheric lens surfaces

Projection exposure system

Catadioptric optical system and exposure apparatus having the same

Catadioptric reduction lens

Projection exposure lens with aspheric elements

Projection objective having adjacently mounted aspheric lens surfaces

Catadioptric optical system and exposure apparatus having the same

Catadioptric objective with physical beam splitter

Microlithographic reduction objective, projection exposure equipmen...

Patents Applicationslast 30 patents

Projection Exposure System and Projection Exposure Method

PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE I...

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

CATADIOPTRIC PROJECTION OBJECTIVE WITH GEOMETRIC BEAM SPLITTING

Projection Lens System of a Microlithographic Projection Exposure I...

Refractive projection objective for immersion lithography

Catadioptric projection objective with geometric beam splitting

Refractive projection objective for immersion lithography

Catadioptric projection objective with geometric beam splitting

Projection objective having adjacently mounted aspheric lens surfaces

Catadioptric projection objective with geometric beam splitting

Catadioptric reduction lens

Projection objective having adjacently mounted aspheric lens surfaces

Catadioptric optical system and exposure apparatus having the same

Catadioptric reduction lens

Projection exposure system

Projection objective having adjacently mounted aspheric lens surfaces

Catadioptric reduction lens

Catadioptric optical system and exposure apparatus having the same

Projection exposure lens with aspheric elements