Helmut Engelke

Person

Altdorf, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Fabrication of particle beam masks
- Patent number 5,166,888
- Issue date Nov 24, 1992
- International Business Machines Corporation
- Helmut Engelke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of transferring a pattern into a radiation-sensitive layer
- Patent number 4,591,540
- Issue date May 27, 1986
- International Business Machines Corporation
- Harald Bohlen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and system for mutually aligning objects in ray exposure systems
- Patent number 4,513,203
- Issue date Apr 23, 1985
- International Business Machines Corporation
- Harald Bohlen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of compensating the proximity effect in electron beam projec...
- Patent number 4,504,558
- Issue date Mar 12, 1985
- International Business Machines Corporation
- Harald Bohlen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of compensating the proximity effect in electron beam projec...
- Patent number 4,426,584
- Issue date Jan 17, 1984
- International Business Machines Corporation
- Harald Bohlen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of making mask for structuring surface areas
- Patent number 4,417,946
- Issue date Nov 29, 1983
- International Business Machines Corporation
- Harald Bohlen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for structuring surface areas, and method of making it
- Patent number 4,342,817
- Issue date Aug 3, 1982
- International Business Machines Corporation
- Harald Bohlen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of shadow printing exposure
- Patent number 4,334,156
- Issue date Jun 8, 1982
- International Business Machines Corporation
- Harald Bohlen
- H01 - BASIC ELECTRIC ELEMENTS

Helmut Engelke

Person

Patents Grantslast 30 patents

Fabrication of particle beam masks

Method of transferring a pattern into a radiation-sensitive layer

Mask and system for mutually aligning objects in ray exposure systems

Method of compensating the proximity effect in electron beam projec...

Method of compensating the proximity effect in electron beam projec...

Method of making mask for structuring surface areas

Mask for structuring surface areas, and method of making it

Method of shadow printing exposure