Hendrik Jan Hidde SMILDE

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 11,526,085
- Issue date Dec 13, 2022
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,428,521
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Method and metrology apparatus for determining estimated scattered...
- Patent number 11,392,043
- Issue date Jul 19, 2022
- ASML Netherlands B.V.
- Seyed Iman Mossavat
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,204,239
- Issue date Dec 21, 2021
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining a value of a parameter of interest of a patte...
- Patent number 11,181,828
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Patrick Warnaar
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 11,092,900
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 10,739,687
- Issue date Aug 11, 2020
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, lithographic system and device manu...
- Patent number 10,725,386
- Issue date Jul 28, 2020
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,718,604
- Issue date Jul 21, 2020
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 10,481,503
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,386,176
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, lithographic system and device manu...
- Patent number 10,331,041
- Issue date Jun 25, 2019
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of target arrangement and associated target
- Patent number 10,331,043
- Issue date Jun 25, 2019
- ASML Netherlands B.V.
- Henricus Wilhelmus Maria Van Buel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 10,162,271
- Issue date Dec 25, 2018
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, substrates for use in such methods,...
- Patent number 10,162,272
- Issue date Dec 25, 2018
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, lithographic system and device manu...
- Patent number 10,126,662
- Issue date Nov 13, 2018
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, apparatus and substrates for lithographic metrology
- Patent number 10,042,268
- Issue date Aug 7, 2018
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and inspection apparatus, lithographic system and...
- Patent number 9,946,167
- Issue date Apr 17, 2018
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, lithographic system and device manu...
- Patent number 9,910,366
- Issue date Mar 6, 2018
- ASML Netherlands B.V.
- Scott Anderson Middlebrooks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 9,879,988
- Issue date Jan 30, 2018
- ASML Netherlands B.V.
- Xing Lan Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 9,811,003
- Issue date Nov 7, 2017
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, lithographic system and device manu...
- Patent number 9,719,945
- Issue date Aug 1, 2017
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, and device manufacturing method
- Patent number 9,535,342
- Issue date Jan 3, 2017
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 9,535,338
- Issue date Jan 3, 2017
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate and patterning device for use in metrology, metrology met...
- Patent number 9,331,022
- Issue date May 3, 2016
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate, a method of measuring a property, an inspection apparatu...
- Patent number 9,255,892
- Issue date Feb 9, 2016
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G01 - MEASURING TESTING
Information Patent Grant
Inspection apparatus and method for measuring a property of a subst...
- Patent number 9,235,141
- Issue date Jan 12, 2016
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Substrate, a method of measuring a property, an inspection apparatu...
- Patent number 9,229,338
- Issue date Jan 5, 2016
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Metrology method and inspection apparatus, lithographic system and...
- Patent number 9,140,998
- Issue date Sep 22, 2015
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, lithographic system and device manu...
- Patent number 9,134,256
- Issue date Sep 15, 2015
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20230016664
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20220057192
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...
- Publication number 20200379359
- Publication date Dec 3, 2020
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20200348125
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A PATTE...
- Publication number 20200133140
- Publication date Apr 30, 2020
- ASML NETHERLANDS B.V.
- Patrick WARNAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Measuring a Parameter of a Lithographic Pr...
- Publication number 20200073254
- Publication date Mar 5, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
Method and Metrology Apparatus for Determining Estimated Scattered...
- Publication number 20200057386
- Publication date Feb 20, 2020
- ASML NETHERLANDS B.V.
- Seyed Iman MOSSAVAT
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20190346256
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus, Lithographic System and Device Manu...
- Publication number 20190278190
- Publication date Sep 12, 2019
- ASML NETHERLANDS B.V.
- Scott Anderson MIDDLEBROOKS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...
- Publication number 20190094712
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus, Lithographic System and Device Manu...
- Publication number 20190049860
- Publication date Feb 14, 2019
- ASML NETHERLANDS B.V.
- Scott Anderson MIDDLEBROOKS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus, Lithographic System and Device Manu...
- Publication number 20180196357
- Publication date Jul 12, 2018
- ASML NETHERLANDS B.V.
- Scott Anderson MIDDLEBROOKS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION OF TARGET ARRANGEMENT AND ASSOCIATED TARGET
- Publication number 20170176871
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Henricus Wilhelmus Maria VAN BUEL
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, Substrate, Lithographic System and...
- Publication number 20170068173
- Publication date Mar 9, 2017
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method And Apparatus for Measuring a Parameter of a Lithographic Pr...
- Publication number 20170059999
- Publication date Mar 2, 2017
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND APPARATUS, SUBSTRATES FOR USE IN SUCH METHODS,...
- Publication number 20170052454
- Publication date Feb 23, 2017
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...
- Publication number 20160334715
- Publication date Nov 17, 2016
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, Apparatus and Substrates for Lithographic Metrology
- Publication number 20160291481
- Publication date Oct 6, 2016
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus, Computer Program and Lithographic S...
- Publication number 20160223322
- Publication date Aug 4, 2016
- ASML Netherlands B.V.
- Xing Lan LIU
- G01 - MEASURING TESTING
Information Patent Application
Substrate and Patterning Device for Use in Metrology, Metrology Met...
- Publication number 20160179019
- Publication date Jun 23, 2016
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus, Lithographic System and Device Manu...
- Publication number 20160161864
- Publication date Jun 9, 2016
- ASML NETHERLANDS B.V.
- Scott Anderson MIDDLEBROOKS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20160061589
- Publication date Mar 3, 2016
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Inspection Apparatus, Lithographic System and...
- Publication number 20160033877
- Publication date Feb 4, 2016
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Substrate, a Method of Measuring a Property, an Inspection Apparat...
- Publication number 20150346113
- Publication date Dec 3, 2015
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G02 - OPTICS
Information Patent Application
Metrology Method and Apparatus, Lithographic System and Device Manu...
- Publication number 20150346116
- Publication date Dec 3, 2015
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, Substrate, Lithographic System and...
- Publication number 20150138523
- Publication date May 21, 2015
- ASML Netherland B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate and Patterning Device for Use in Metrology, Metrology Met...
- Publication number 20140233031
- Publication date Aug 21, 2014
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Method and Apparatus, and Device Manufacturing Method
- Publication number 20140204397
- Publication date Jul 24, 2014
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Scatterometers, Lithographic Systems, and Lithographic...
- Publication number 20140139814
- Publication date May 22, 2014
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, Lithographic System and Device Manu...
- Publication number 20130258310
- Publication date Oct 3, 2013
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde SMILDE
- G01 - MEASURING TESTING

Hendrik Jan Hidde SMILDE

Person

Patents Grantslast 30 patents

Metrology method and apparatus, substrate, lithographic system and...

Metrology method, target and substrate

Method and metrology apparatus for determining estimated scattered...

Metrology method, target and substrate

Method of determining a value of a parameter of interest of a patte...

Method and apparatus for measuring a parameter of a lithographic pr...

Metrology method and apparatus, substrate, lithographic system and...

Metrology method and apparatus, lithographic system and device manu...

Metrology method, target and substrate

Method and apparatus for measuring a parameter of a lithographic pr...

Metrology method, target and substrate

Metrology method and apparatus, lithographic system and device manu...

Optimization of target arrangement and associated target

Metrology method and apparatus, substrate, lithographic system and...

Metrology method and apparatus, substrates for use in such methods,...

Metrology method and apparatus, lithographic system and device manu...

Method, apparatus and substrates for lithographic metrology

Metrology method and inspection apparatus, lithographic system and...

Metrology method and apparatus, lithographic system and device manu...

Metrology method and apparatus, computer program and lithographic s...

Metrology method and apparatus, substrate, lithographic system and...

Metrology method and apparatus, lithographic system and device manu...

Metrology method and apparatus, and device manufacturing method

Metrology method and apparatus, substrate, lithographic system and...

Substrate and patterning device for use in metrology, metrology met...

Substrate, a method of measuring a property, an inspection apparatu...

Inspection apparatus and method for measuring a property of a subst...

Substrate, a method of measuring a property, an inspection apparatu...

Metrology method and inspection apparatus, lithographic system and...

Metrology method and apparatus, lithographic system and device manu...

Patents Applicationslast 30 patents

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...

METROLOGY METHOD, TARGET AND SUBSTRATE

METHOD OF DETERMINING A VALUE OF A PARAMETER OF INTEREST OF A PATTE...

Method and Apparatus for Measuring a Parameter of a Lithographic Pr...

Method and Metrology Apparatus for Determining Estimated Scattered...

METROLOGY METHOD, TARGET AND SUBSTRATE

Metrology Method and Apparatus, Lithographic System and Device Manu...

METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...

Metrology Method and Apparatus, Lithographic System and Device Manu...

Metrology Method and Apparatus, Lithographic System and Device Manu...

OPTIMIZATION OF TARGET ARRANGEMENT AND ASSOCIATED TARGET

Metrology Method and Apparatus, Substrate, Lithographic System and...

Method And Apparatus for Measuring a Parameter of a Lithographic Pr...

METROLOGY METHOD AND APPARATUS, SUBSTRATES FOR USE IN SUCH METHODS,...

METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND...

Method, Apparatus and Substrates for Lithographic Metrology

Metrology Method and Apparatus, Computer Program and Lithographic S...

Substrate and Patterning Device for Use in Metrology, Metrology Met...

Metrology Method and Apparatus, Lithographic System and Device Manu...

METROLOGY METHOD, TARGET AND SUBSTRATE

Metrology Method and Inspection Apparatus, Lithographic System and...

Substrate, a Method of Measuring a Property, an Inspection Apparat...

Metrology Method and Apparatus, Lithographic System and Device Manu...

Metrology Method and Apparatus, Substrate, Lithographic System and...

Substrate and Patterning Device for Use in Metrology, Metrology Met...

Metrology Method and Apparatus, and Device Manufacturing Method

Methods and Scatterometers, Lithographic Systems, and Lithographic...

Metrology Method and Apparatus, Lithographic System and Device Manu...