Hendrik Wagner

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Catadioptric projection lens and method for producing same
- Patent number 11,360,293
- Issue date Jun 14, 2022
- Carl Zeiss SMT GmbH
- Martin Rocktaeschel
- G02 - OPTICS
Information Patent Grant
Optical arrangement, in particular lithography system, with a trans...
- Patent number 10,761,436
- Issue date Sep 1, 2020
- Carl Zeiss SMT GmbH
- Ralf Zweering
- G02 - OPTICS
Information Patent Grant
Projection lens for EUV microlithography, film element and method f...
- Patent number 10,001,631
- Issue date Jun 19, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Optical assembly
- Patent number 9,939,730
- Issue date Apr 10, 2018
- Carl Zeiss SMT GmbH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror arrangement for an EUV projection exposure apparatus, method...
- Patent number 9,709,770
- Issue date Jul 18, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical element
- Patent number 9,470,872
- Issue date Oct 18, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G01 - MEASURING TESTING
Information Patent Grant
Microlithographic apparatus
- Patent number 9,348,234
- Issue date May 24, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR LITHOGRAPHY SYSTEM, WITH A TRANS...
- Publication number 20190339625
- Publication date Nov 7, 2019
- Carl Zeiss SMT GMBH
- Ralf Zweering
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION LENS AND METHOD FOR PRODUCING SAME
- Publication number 20190302434
- Publication date Oct 3, 2019
- Carl Zeiss SMT GMBH
- Martin Rocktaeschel
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20170261730
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...
- Publication number 20160161852
- Publication date Jun 9, 2016
- Carl Zeiss SMT GMBH
- Karl-Heinz SCHUSTER
- G02 - OPTICS
Information Patent Application
OPTICAL ASSEMBLY
- Publication number 20160091798
- Publication date Mar 31, 2016
- Carl Zeiss SMT GMBH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC APPARATUS
- Publication number 20160011521
- Publication date Jan 14, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD...
- Publication number 20150168674
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
Reflective Optical Element
- Publication number 20150116703
- Publication date Apr 30, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20140347721
- Publication date Nov 27, 2014
- Boris Bittner
- B82 - NANO-TECHNOLOGY

Hendrik Wagner

Person

Patents Grantslast 30 patents

Catadioptric projection lens and method for producing same

Optical arrangement, in particular lithography system, with a trans...

Projection lens for EUV microlithography, film element and method f...

Optical assembly

Mirror arrangement for an EUV projection exposure apparatus, method...

Reflective optical element

Microlithographic apparatus

Patents Applicationslast 30 patents

OPTICAL ARRANGEMENT, IN PARTICULAR LITHOGRAPHY SYSTEM, WITH A TRANS...

CATADIOPTRIC PROJECTION LENS AND METHOD FOR PRODUCING SAME

Projection Lens for EUV Microlithography, Film Element and Method f...

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...

OPTICAL ASSEMBLY

MICROLITHOGRAPHIC APPARATUS

MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD...

Reflective Optical Element

Projection Lens for EUV Microlithography, Film Element and Method f...