Hendrikus Robertus Marie Van Greevenbroek

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Laser beam monitoring system
- Patent number 11,366,399
- Issue date Jun 21, 2022
- ASML Netherlands B.V.
- Hendrikus Robertus Marie Van Greevenbroek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,222,703
- Issue date Mar 5, 2019
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 9,778,575
- Issue date Oct 3, 2017
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for generating radiation
- Patent number 9,442,380
- Issue date Sep 13, 2016
- ASML Netherlands B.V.
- Ramin Badie
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus and method for reducing stray radiation
- Patent number 9,188,881
- Issue date Nov 17, 2015
- ASML Netherlands B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a method for determining a polarization...
- Patent number 9,170,498
- Issue date Oct 27, 2015
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 8,937,706
- Issue date Jan 20, 2015
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method for illumination uniformity corre...
- Patent number 8,629,973
- Issue date Jan 14, 2014
- ASML Holding N.V.
- Richard Carl Zimmerman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 8,441,611
- Issue date May 14, 2013
- ASML Netherlands B.V.
- Hendrikus Robertus Marie Van Greevenbroek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating a lithographic apparatus, lithographic apparatu...
- Patent number 6,710,856
- Issue date Mar 23, 2004
- ASML Netherlands B.V.
- Hans Van Der Laan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Laser Beam Monitoring System
- Publication number 20200341386
- Publication date Oct 29, 2020
- ASML NETHERLANDS B.V.
- Hendrikus Robertus Marie VAN GREEVENBROEK
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20170315450
- Publication date Nov 2, 2017
- ASML NETHERLANDS B.V.
- Heine Melle MULDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20160116848
- Publication date Apr 28, 2016
- ASML NETHERLANDS B.V.
- Heine Melle MULDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Generating Radiation
- Publication number 20150268559
- Publication date Sep 24, 2015
- ASML NETHERLANDS B.V.
- Ramin Badie
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic Apparatus and a Method for Determining a Polarization...
- Publication number 20130176547
- Publication date Jul 11, 2013
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS TO CONTROL EUV EXPOSURE DOSE AND EUV LITHOGRAPHIC METHODS A...
- Publication number 20130077073
- Publication date Mar 28, 2013
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus VAN SCHOOT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070115449
- Publication date May 24, 2007
- ASML NETHERLANDS B.V.
- Marcel Mathijs Theodore Maria Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical element for use in lithography apparatus and method of cond...
- Publication number 20070058151
- Publication date Mar 15, 2007
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius Eurlings
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and a method for determining a polarization...
- Publication number 20060203221
- Publication date Sep 14, 2006
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20040227922
- Publication date Nov 18, 2004
- ASML NETHERLANDS B.V.
- Marcel Mathijs Theodore Marie Dierichs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Kit of parts for assembling an optical element, method of assemblin...
- Publication number 20040012764
- Publication date Jan 22, 2004
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hendrikus Robertus Marie Van Greevenbroek

Person

Patents Grantslast 30 patents

Laser beam monitoring system

Lithographic apparatus and method

Lithographic apparatus and method

Method and apparatus for generating radiation

Lithographic apparatus and method for reducing stray radiation

Lithographic apparatus and a method for determining a polarization...

Lithographic apparatus and method

Lithographic apparatus and method for illumination uniformity corre...

Lithographic apparatus and method

Method of operating a lithographic apparatus, lithographic apparatu...

Patents Applicationslast 30 patents

Laser Beam Monitoring System

LITHOGRAPHIC APPARATUS AND METHOD

LITHOGRAPHIC APPARATUS AND METHOD

Method and Apparatus for Generating Radiation

Lithographic Apparatus and a Method for Determining a Polarization...

METHODS TO CONTROL EUV EXPOSURE DOSE AND EUV LITHOGRAPHIC METHODS A...

Lithographic apparatus and device manufacturing method

Optical element for use in lithography apparatus and method of cond...

Lithographic apparatus and a method for determining a polarization...

Lithographic apparatus and device manufacturing method

Kit of parts for assembling an optical element, method of assemblin...