Hengpeng Wu

Person

Hillsborough, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist remover compositions
- Patent number 11,994,803
- Issue date May 28, 2024
- Merck Patent GmbH
- Hengpeng Wu
- B08 - CLEANING
Information Patent Grant
Polymer compositions for self-assembly applications
- Patent number 11,518,730
- Issue date Dec 6, 2022
- Merck Patent GmbH
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist remover compositions
- Patent number 11,365,379
- Issue date Jun 21, 2022
- Robert Arent
- B08 - CLEANING
Information Patent Grant
Photoresist remover compositions
- Patent number 11,366,392
- Issue date Jun 21, 2022
- Merck Patent GmbH
- Hengpeng Wu
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photoresist remover compositions
- Patent number 11,168,288
- Issue date Nov 9, 2021
- Merck Patent GmbH
- Hengpeng Wu
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Compositions and processes for self-assembly of block copolymers
- Patent number 11,067,893
- Issue date Jul 20, 2021
- Merck Patent GmbH
- Hengpeng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template for self assembly and method of making a self assembled pa...
- Patent number 10,457,088
- Issue date Oct 29, 2019
- Ridgefield Acquisition
- Jihoon Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Compositions and use thereof for modification of substrate surfaces
- Patent number 10,155,879
- Issue date Dec 18, 2018
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Guanyang Lin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Compositions and processes for self-assembly of block copolymers
- Patent number 9,574,104
- Issue date Feb 21, 2017
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- JiHoon Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon containing block copolymers for direct self-assembly applic...
- Patent number 9,505,945
- Issue date Nov 29, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Composition comprising a polymeric thermal acid generator and proce...
- Patent number 9,291,909
- Issue date Mar 22, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Underlayer composition for promoting self assembly and method of ma...
- Patent number 9,093,263
- Issue date Jul 28, 2015
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions of neutral layer for directed self assembly block copo...
- Patent number 9,052,598
- Issue date Jun 9, 2015
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods and materials for removing metals in block copolymers
- Patent number 9,040,659
- Issue date May 26, 2015
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Jian Yin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Composition for coating over a photoresist pattern
- Patent number 8,852,848
- Issue date Oct 7, 2014
- Z Electronic Materials USA Corp.
- Hengpeng Wu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Neutral layer polymer composition for directed self assembly and pr...
- Patent number 8,835,581
- Issue date Sep 16, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compositions of neutral layer for directed self assembly block copo...
- Patent number 8,691,925
- Issue date Apr 8, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Hengpeng Wu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Methods and materials for removing metals in block copolymers
- Patent number 8,686,109
- Issue date Apr 1, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Jian Yin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Antireflective coating compositions
- Patent number 8,329,387
- Issue date Dec 11, 2012
- AZ Electronic Materials USA Corp.
- Huirong Yao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antireflective coating compositions
- Patent number 8,221,965
- Issue date Jul 17, 2012
- AZ Electronic Materials USA Corp.
- Huirong Yao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 8,039,202
- Issue date Oct 18, 2011
- AZ Electronic Materials USA Corp.
- Yu Sui
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silicone coating composition
- Patent number 8,026,040
- Issue date Sep 27, 2011
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Solvent mixtures for antireflective coating compositions for photor...
- Patent number 7,824,844
- Issue date Nov 2, 2010
- AZ Electronic Materials USA Corp.
- Zhong Xiang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 7,824,837
- Issue date Nov 2, 2010
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective compositions for photoresists
- Patent number 7,691,556
- Issue date Apr 6, 2010
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating compositions
- Patent number 7,666,575
- Issue date Feb 23, 2010
- AZ Electronic Materials USA Corp.
- Woo-Kyu Kim
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective composition for photoresists
- Patent number 7,638,262
- Issue date Dec 29, 2009
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective compositions for photoresists
- Patent number 7,264,913
- Issue date Sep 4, 2007
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for making polyesters
- Patent number 7,081,511
- Issue date Jul 25, 2006
- AZ Electronic Materials USA Corp.
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Bottom antireflective coatings
- Patent number 7,030,201
- Issue date Apr 18, 2006
- AZ Electronic Materials USA Corp.
- Huirong Yao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE-WORKING PHOTORESIST COMPOSITION WITH IMPROVED PATTERN PROF...
- Publication number 20240045333
- Publication date Feb 8, 2024
- Merck Patent GmbH
- Hung-Yang CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST REMOVER COMPOSITIONS
- Publication number 20240004303
- Publication date Jan 4, 2024
- Merck Patent GmbH
- Hengpeng WU
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PHOTORESIST REMOVER COMPOSITIONS
- Publication number 20220276562
- Publication date Sep 1, 2022
- Merck Patent GmbH
- Hengpeng WU
- B08 - CLEANING
Information Patent Application
PHOTORESIST REMOVER COMPOSITIONS
- Publication number 20210115362
- Publication date Apr 22, 2021
- Merck Patent GmbH
- Robert ARENT
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PHOTORESIST REMOVER COMPOSITIONS
- Publication number 20210080833
- Publication date Mar 18, 2021
- Merck Patent GmbH
- Hengpeng WU
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PHOTORESIST REMOVER COMPOSITIONS
- Publication number 20210071120
- Publication date Mar 11, 2021
- Merck Patent GmbH
- Hengpeng WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL COMPOSITIONS AND PROCESSES FOR SELF-ASSEMBLY OF BLOCK COPOLYMERS
- Publication number 20200019062
- Publication date Jan 16, 2020
- RIDGEFIELD ACQUISITION
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER COMPOSITIONS FOR SELF-ASSEMBLY APPLICATIONS
- Publication number 20190161570
- Publication date May 30, 2019
- RIDGEFIELD ACQUISITION
- Hengpeng WU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL COMPOSITIONS AND USE THEREOF FOR MODIFICATION OF SUBSTRATE SU...
- Publication number 20170174931
- Publication date Jun 22, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Guanyang Lin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SILICON CONTAINING BLOCK COPOLYMERS FOR DIRECT SELF-ASSEMBLY APPLI...
- Publication number 20160122579
- Publication date May 5, 2016
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Hengpeng WU
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MA...
- Publication number 20150093912
- Publication date Apr 2, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Hengpeng WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION COMPRISING A POLYMERIC THERMAL ACID GENERATOR AND PROCE...
- Publication number 20140342290
- Publication date Nov 20, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Hengpeng WU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TEMPLATE FOR SELF ASSEMBLY AND METHOD OF MAKING A SELF ASSEMBLED PA...
- Publication number 20140335324
- Publication date Nov 13, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Jihoon KIM
- B44 - DECORATIVE ARTS
Information Patent Application
COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...
- Publication number 20140193754
- Publication date Jul 10, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Hengpeng WU
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS
- Publication number 20140151330
- Publication date Jun 5, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Jian YIN
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PR...
- Publication number 20130330668
- Publication date Dec 12, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Hengpeng WU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS
- Publication number 20130233827
- Publication date Sep 12, 2013
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Jian YIN
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...
- Publication number 20130078576
- Publication date Mar 28, 2013
- AZ Electronic Materials USA Corp.
- Hengpeng WU
- B82 - NANO-TECHNOLOGY
Information Patent Application
Composition for Coating over a Photoresist Pattern
- Publication number 20120028195
- Publication date Feb 2, 2012
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Coating Compositions
- Publication number 20100009293
- Publication date Jan 14, 2010
- Huirong Yao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Coating Compositions
- Publication number 20100009297
- Publication date Jan 14, 2010
- Huirong Yao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Underlayer Coating Composition Based on a Crosslinkable Polymer
- Publication number 20090035704
- Publication date Feb 5, 2009
- Hong Zhuang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Antireflective Coating Compositions
- Publication number 20080286689
- Publication date Nov 20, 2008
- Hong Zhuang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICONE COATING COMPOSITION
- Publication number 20080196626
- Publication date Aug 21, 2008
- Hengpeng Wu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Solvent Mixtures for Antireflective Coating Compositions for Photor...
- Publication number 20080176165
- Publication date Jul 24, 2008
- Zhong Xiang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Antireflective Coating Compositions
- Publication number 20080096125
- Publication date Apr 24, 2008
- Woo-Kyu Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive -Working Photoimageable Bottom Antireflective Coating
- Publication number 20080090184
- Publication date Apr 17, 2008
- Yu Sui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-Working Photoimageable Bottom Antireflective Coating
- Publication number 20080038666
- Publication date Feb 14, 2008
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective composition for photoresists
- Publication number 20080038659
- Publication date Feb 14, 2008
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective compositions for photoresists
- Publication number 20060057501
- Publication date Mar 16, 2006
- Hengpeng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hengpeng Wu

Person

Patents Grantslast 30 patents

Photoresist remover compositions

Polymer compositions for self-assembly applications

Photoresist remover compositions

Photoresist remover compositions

Photoresist remover compositions

Compositions and processes for self-assembly of block copolymers

Template for self assembly and method of making a self assembled pa...

Compositions and use thereof for modification of substrate surfaces

Compositions and processes for self-assembly of block copolymers

Silicon containing block copolymers for direct self-assembly applic...

Composition comprising a polymeric thermal acid generator and proce...

Underlayer composition for promoting self assembly and method of ma...

Compositions of neutral layer for directed self assembly block copo...

Methods and materials for removing metals in block copolymers

Composition for coating over a photoresist pattern

Neutral layer polymer composition for directed self assembly and pr...

Compositions of neutral layer for directed self assembly block copo...

Methods and materials for removing metals in block copolymers

Antireflective coating compositions

Antireflective coating compositions

Positive-working photoimageable bottom antireflective coating

Silicone coating composition

Solvent mixtures for antireflective coating compositions for photor...

Positive-working photoimageable bottom antireflective coating

Antireflective compositions for photoresists

Antireflective coating compositions

Antireflective composition for photoresists

Antireflective compositions for photoresists

Process for making polyesters

Bottom antireflective coatings

Patents Applicationslast 30 patents

POSITIVE-WORKING PHOTORESIST COMPOSITION WITH IMPROVED PATTERN PROF...

PHOTORESIST REMOVER COMPOSITIONS

PHOTORESIST REMOVER COMPOSITIONS

PHOTORESIST REMOVER COMPOSITIONS

PHOTORESIST REMOVER COMPOSITIONS

PHOTORESIST REMOVER COMPOSITIONS

NOVEL COMPOSITIONS AND PROCESSES FOR SELF-ASSEMBLY OF BLOCK COPOLYMERS

POLYMER COMPOSITIONS FOR SELF-ASSEMBLY APPLICATIONS

NOVEL COMPOSITIONS AND USE THEREOF FOR MODIFICATION OF SUBSTRATE SU...

SILICON CONTAINING BLOCK COPOLYMERS FOR DIRECT SELF-ASSEMBLY APPLI...

UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MA...

COMPOSITION COMPRISING A POLYMERIC THERMAL ACID GENERATOR AND PROCE...

TEMPLATE FOR SELF ASSEMBLY AND METHOD OF MAKING A SELF ASSEMBLED PA...

COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...

METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS

NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PR...

METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS

COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPO...

Composition for Coating over a Photoresist Pattern

Antireflective Coating Compositions

Antireflective Coating Compositions

Underlayer Coating Composition Based on a Crosslinkable Polymer

Antireflective Coating Compositions

SILICONE COATING COMPOSITION

Solvent Mixtures for Antireflective Coating Compositions for Photor...

Antireflective Coating Compositions

Positive -Working Photoimageable Bottom Antireflective Coating

Positive-Working Photoimageable Bottom Antireflective Coating

Antireflective composition for photoresists

Antireflective compositions for photoresists