Henning Haffner

Person

Fishkill, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated circuits and methods of design and manufacture thereof
- Patent number 10,089,430
- Issue date Oct 2, 2018
- Infineon Technologies AG
- Henning Haffner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Integrated circuits and methods of design and manufacture thereof
- Patent number 9,767,244
- Issue date Sep 19, 2017
- Infineon Technologies AG
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuits and methods of design and manufacture thereof
- Patent number 9,324,707
- Issue date Apr 26, 2016
- Infineon Technologies AG
- Henning Haffner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for defining a separating structure within a semiconductor d...
- Patent number 9,202,710
- Issue date Dec 1, 2015
- Infineon Technologies AG
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask layout formation
- Patent number 8,875,063
- Issue date Oct 28, 2014
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicided semiconductor structure and method of forming the same
- Patent number 8,865,592
- Issue date Oct 21, 2014
- Infineon Technologies AG
- Jiang Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuits and methods of design and manufacture thereof
- Patent number 8,809,958
- Issue date Aug 19, 2014
- Infineon Technologies AG
- Henning Haffner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography systems and methods of manufacturing using thereof
- Patent number 8,715,909
- Issue date May 6, 2014
- Infineon Technologies AG
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
L-shaped feature, method of making an L-shaped feature and method o...
- Patent number 8,426,114
- Issue date Apr 23, 2013
- Infineon Technologies AG
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Generating cut mask for double-patterning process
- Patent number 8,365,108
- Issue date Jan 29, 2013
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for defining a separating structure within a semiconductor d...
- Patent number 8,298,953
- Issue date Oct 30, 2012
- Infineon Technologies AG
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration and verification structures for use in optical proximit...
- Patent number 8,161,421
- Issue date Apr 17, 2012
- International Business Machines Corporation
- Ramya Viswanathan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methodology of placing printing assist feature for random mask layout
- Patent number 8,099,684
- Issue date Jan 17, 2012
- International Business Machines Corporation
- Jason E Meiring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method for patterning a semiconductor wafer
- Patent number 8,092,958
- Issue date Jan 10, 2012
- Infineon Technologies AG
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuits and methods of design and manufacture thereof
- Patent number 8,078,998
- Issue date Dec 13, 2011
- Infineon Technologies AG
- Henning Haffner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography masks and methods of manufacture thereof
- Patent number 8,071,261
- Issue date Dec 6, 2011
- Infineon Technologies AG
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated circuits and methods of design and manufacture thereof
- Patent number 8,039,203
- Issue date Oct 18, 2011
- Infineon Technologies AG
- Helen Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
MEEF reduction by elongation of square shapes
- Patent number 7,975,246
- Issue date Jul 5, 2011
- International Business Machines Corporation
- Derren Neylon Dunn
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Lithography masks and methods of manufacture thereof
- Patent number 7,947,431
- Issue date May 24, 2011
- Infineon Technologies AG
- Chandrasekhar Sarma
- G02 - OPTICS
Information Patent Grant
Mask and method for patterning a semiconductor wafer
- Patent number 7,945,869
- Issue date May 17, 2011
- Infineon Technologies AG
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography masks and methods of manufacture thereof
- Patent number 7,799,486
- Issue date Sep 21, 2010
- Infineon Technologies AG
- Chandrasekhar Sarma
- G02 - OPTICS
Information Patent Grant
Integrated circuits and methods of design and manufacture thereof
- Patent number 7,785,946
- Issue date Aug 31, 2010
- Infineon Technologies AG
- Henning Haffner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor mask and method of making same
- Patent number 7,669,173
- Issue date Feb 23, 2010
- Infineon Technologies AG
- Henning Haffner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for semiconductor device fabrication using modeling
- Patent number 7,669,176
- Issue date Feb 23, 2010
- Infineon Technologies AG
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test pattern and method of evaluating the transfer properties of a...
- Patent number 7,354,684
- Issue date Apr 8, 2008
- Advanced Mask Technology Center GmbH & Co. KG
- Uwe Dersch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for dynamically monitoring a reticle
- Patent number 7,304,721
- Issue date Dec 4, 2007
- Infineon Technologies AG
- Henning Haffner
- G01 - MEASURING TESTING
Information Patent Grant
Dummy feature reduction using optical proximity effect correction
- Patent number 6,426,269
- Issue date Jul 30, 2002
- International Business Machines Corporation
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device fabrication using a photomask with assist feat...
- Patent number 6,421,820
- Issue date Jul 16, 2002
- Infineon Technologies AG
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized decoupling capacitor using lithographic dummy filler
- Patent number 6,353,248
- Issue date Mar 5, 2002
- Infineon Technologies AG
- Armin M Reith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimized decoupling capacitor using lithographic dummy filler
- Patent number 6,232,154
- Issue date May 15, 2001
- Infineon Technologies North America Corp.
- Armin M. Reith
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Integrated Circuits and Methods of Design and Manufacture Thereof
- Publication number 20170344690
- Publication date Nov 30, 2017
- INFINEON TECHNOLOGIES AG
- Henning Haffner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Integrated Circuits and Methods of Design and Manufacture Thereof
- Publication number 20160283635
- Publication date Sep 29, 2016
- INFINEON TECHNOLOGIES AG
- Henning Haffner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Integrated Circuits and Methods of Design and Manufacture Thereof
- Publication number 20140353757
- Publication date Dec 4, 2014
- Henning Haffner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DEFINING A SEPARATING STRUCTURE WITHIN A SEMICONDUCTOR D...
- Publication number 20130302986
- Publication date Nov 14, 2013
- INFINEON TECHNOLOGIES AG
- Henning Haffner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
L-shaped Feature, Method of Making an L-shaped Feature and Method o...
- Publication number 20120196209
- Publication date Aug 2, 2012
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING CUT MASK FOR DOUBLE-PATTERNING PROCESS
- Publication number 20120180006
- Publication date Jul 12, 2012
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DEFINING A SEPARATING STRUCTURE WITHIN A SEMICONDUCTOR D...
- Publication number 20120156881
- Publication date Jun 21, 2012
- INFINEON TECHNOLOGIES NORTH AMERICA CORP.
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK LAYOUT FORMATION
- Publication number 20120089953
- Publication date Apr 12, 2012
- INFINEON TECHNOLOGIES NORTH AMERICA CORPORATION
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated Circuits and Methods of Design and Manufacture Thereof
- Publication number 20120074499
- Publication date Mar 29, 2012
- INFINEON TECHNOLOGIES AG
- Henning Haffner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithography Masks and Methods of Manufacture Thereof
- Publication number 20100297398
- Publication date Nov 25, 2010
- Chandrasekhar Sarma
- G02 - OPTICS
Information Patent Application
Integrated Circuits and Methods of Design and Manufacture Thereof
- Publication number 20100276759
- Publication date Nov 4, 2010
- Henning Haffner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODOLOGY OF PLACING PRINTING ASSIST FEATURE FOR RANDOM MASK LAYOUT
- Publication number 20100175040
- Publication date Jul 8, 2010
- International Business Machines Corporation
- Jason E. Meiring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEEF REDUCTION BY ELONGATION OF SQUARE SHAPES
- Publication number 20100042967
- Publication date Feb 18, 2010
- International Business Machines Corporation
- Derren N. Dunn
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CALIBRATION AND VERIFICATAION STRUCTURES FOR USE IN OPTICAL PROXIMI...
- Publication number 20100005440
- Publication date Jan 7, 2010
- International Business Machines Corporation
- Ramya Viswanathan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolutio...
- Publication number 20090191468
- Publication date Jul 30, 2009
- International Business Machines Corporation
- Michael M. Crouse
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Systems and Methods of Manufacturing Using Thereof
- Publication number 20090092926
- Publication date Apr 9, 2009
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Systems and Methods of Manufacturing Using Thereof
- Publication number 20090091729
- Publication date Apr 9, 2009
- Sajan Marokkey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated Circuits and Methods of Design and Manufacture Thereof
- Publication number 20090079005
- Publication date Mar 26, 2009
- Henning Haffner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Integrated Circuits and Methods of Design and Manufacture Thereof
- Publication number 20090081563
- Publication date Mar 26, 2009
- Helen Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Semiconductor Device Fabrication Using Modeling
- Publication number 20090077525
- Publication date Mar 19, 2009
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask and Method for Patterning a Semiconductor Wafer
- Publication number 20090053654
- Publication date Feb 26, 2009
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Masks and Methods of Manufacture Thereof
- Publication number 20090023078
- Publication date Jan 22, 2009
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor mask and method of making same
- Publication number 20080141212
- Publication date Jun 12, 2008
- Henning Haffner
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography masks and methods of manufacture thereof
- Publication number 20080119048
- Publication date May 22, 2008
- Chandrasekhar Sarma
- G02 - OPTICS
Information Patent Application
Mask and method for patterning a semiconductor wafer
- Publication number 20080076036
- Publication date Mar 27, 2008
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for semiconductor device fabrication using modeling
- Publication number 20070226674
- Publication date Sep 27, 2007
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Test pattern and method of evaluating the transfer properties of a...
- Publication number 20070207394
- Publication date Sep 6, 2007
- Advantage Mask Technology Center GmbH & Co. KG
- Uwe Dersch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for alleviating tolerance restrictions for feature sizes dur...
- Publication number 20050214658
- Publication date Sep 29, 2005
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for dynamically monitoring a reticle
- Publication number 20050125164
- Publication date Jun 9, 2005
- Henning Haffner
- G01 - MEASURING TESTING

Henning Haffner

Person

Patents Grantslast 30 patents

Integrated circuits and methods of design and manufacture thereof

Integrated circuits and methods of design and manufacture thereof

Integrated circuits and methods of design and manufacture thereof

Method for defining a separating structure within a semiconductor d...

Mask layout formation

Silicided semiconductor structure and method of forming the same

Integrated circuits and methods of design and manufacture thereof

Lithography systems and methods of manufacturing using thereof

L-shaped feature, method of making an L-shaped feature and method o...

Generating cut mask for double-patterning process

Method for defining a separating structure within a semiconductor d...

Calibration and verification structures for use in optical proximit...

Methodology of placing printing assist feature for random mask layout

Mask and method for patterning a semiconductor wafer

Integrated circuits and methods of design and manufacture thereof

Lithography masks and methods of manufacture thereof

Integrated circuits and methods of design and manufacture thereof

MEEF reduction by elongation of square shapes

Lithography masks and methods of manufacture thereof

Mask and method for patterning a semiconductor wafer

Lithography masks and methods of manufacture thereof

Integrated circuits and methods of design and manufacture thereof

Semiconductor mask and method of making same

System and method for semiconductor device fabrication using modeling

Test pattern and method of evaluating the transfer properties of a...

Method for dynamically monitoring a reticle

Dummy feature reduction using optical proximity effect correction

Semiconductor device fabrication using a photomask with assist feat...

Optimized decoupling capacitor using lithographic dummy filler

Optimized decoupling capacitor using lithographic dummy filler

Patents Applicationslast 30 patents

Integrated Circuits and Methods of Design and Manufacture Thereof

Integrated Circuits and Methods of Design and Manufacture Thereof

Integrated Circuits and Methods of Design and Manufacture Thereof

METHOD FOR DEFINING A SEPARATING STRUCTURE WITHIN A SEMICONDUCTOR D...

L-shaped Feature, Method of Making an L-shaped Feature and Method o...

GENERATING CUT MASK FOR DOUBLE-PATTERNING PROCESS

METHOD FOR DEFINING A SEPARATING STRUCTURE WITHIN A SEMICONDUCTOR D...

MASK LAYOUT FORMATION

Integrated Circuits and Methods of Design and Manufacture Thereof

Lithography Masks and Methods of Manufacture Thereof

Integrated Circuits and Methods of Design and Manufacture Thereof

METHODOLOGY OF PLACING PRINTING ASSIST FEATURE FOR RANDOM MASK LAYOUT

MEEF REDUCTION BY ELONGATION OF SQUARE SHAPES

CALIBRATION AND VERIFICATAION STRUCTURES FOR USE IN OPTICAL PROXIMI...

Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolutio...

Lithography Systems and Methods of Manufacturing Using Thereof

Lithography Systems and Methods of Manufacturing Using Thereof

Integrated Circuits and Methods of Design and Manufacture Thereof

Integrated Circuits and Methods of Design and Manufacture Thereof

System and Method for Semiconductor Device Fabrication Using Modeling

Mask and Method for Patterning a Semiconductor Wafer

Lithography Masks and Methods of Manufacture Thereof

Semiconductor mask and method of making same

Lithography masks and methods of manufacture thereof

Mask and method for patterning a semiconductor wafer

System and method for semiconductor device fabrication using modeling

Test pattern and method of evaluating the transfer properties of a...

Method for alleviating tolerance restrictions for feature sizes dur...

Method for dynamically monitoring a reticle