Henricus Wilhelmus Maria VAN BUEL

Person

's-Hertogenbosch, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate comprising a target arrangement, and associated at least...
- Patent number 12,276,921
- Issue date Apr 15, 2025
- ASML Netherlands B.V.
- Olger Victor Zwier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,428,521
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,204,239
- Issue date Dec 21, 2021
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for and a method of removing contaminant particles from a...
- Patent number 11,123,773
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Tim Peter Johan Gerard Maas
- B08 - CLEANING
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,718,604
- Issue date Jul 21, 2020
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,386,176
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of target arrangement and associated target
- Patent number 10,331,043
- Issue date Jun 25, 2019
- ASML Netherlands B.V.
- Henricus Wilhelmus Maria Van Buel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, substrates for use in such methods,...
- Patent number 10,162,272
- Issue date Dec 25, 2018
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus for measuring properties of a target structure...
- Patent number 10,101,677
- Issue date Oct 16, 2018
- ASML Netherlands B.V.
- Kim Gerard Feijen
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and method
- Patent number 8,576,374
- Issue date Nov 5, 2013
- ASML Netherlands B.V.
- Keith Frank Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensor, a table and lithographic apparatus
- Patent number 8,395,772
- Issue date Mar 12, 2013
- ASML Netherlands B.V.
- Henricus Wilhelmus Maria Van Buel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 7,084,955
- Issue date Aug 1, 2006
- ASML Netherlands B.V.
- Cheng-Qun Gui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 6,768,539
- Issue date Jul 27, 2004
- ASML Netherlands B.V.
- Cheng-Qun Gui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical exposure method, device manufacturing method and lithograph...
- Patent number 6,618,118
- Issue date Sep 9, 2003
- ASML Netherlands B.V.
- Arthur Winfried Eduardus Minnaert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...
- Publication number 20230176491
- Publication date Jun 8, 2023
- ASML NETHERLANDS B.V.
- Olger Victor ZWIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20230016664
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20220057192
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20200348125
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20190346256
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for and a Method of Removing Contaminant Particles from a...
- Publication number 20190201943
- Publication date Jul 4, 2019
- ASML NETHERLANDS B.V.
- Tim Peter Johan Gerard MAAS
- B08 - CLEANING
Information Patent Application
OPTIMIZATION OF TARGET ARRANGEMENT AND ASSOCIATED TARGET
- Publication number 20170176871
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Henricus Wilhelmus Maria VAN BUEL
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND APPARATUS, SUBSTRATES FOR USE IN SUCH METHODS,...
- Publication number 20170052454
- Publication date Feb 23, 2017
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Apparatus for Measuring Properties of a Target Structure...
- Publication number 20160291479
- Publication date Oct 6, 2016
- ASML NETHERLANDS B.V.
- Kim Gerard FEIJEN
- G02 - OPTICS
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20160061589
- Publication date Mar 3, 2016
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
Substrate table, method of measuring a position of a substrate and...
- Publication number 20070153253
- Publication date Jul 5, 2007
- ASML NETHERLANDS B.V.
- Henricus Wilhelmus Maria Van Buel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate table, method of measuring a position of a substrate and...
- Publication number 20060114442
- Publication date Jun 1, 2006
- ASML NETHERLANDS B.V.
- Henricus Wilhelmus Maria Van Buel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus for imaging a front side or a back side of a...
- Publication number 20050248740
- Publication date Nov 10, 2005
- ASML NETHERLANDS B.V.
- Michael Van Der Veen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050200819
- Publication date Sep 15, 2005
- ASML Netherlands B.V.
- Henricus Wilhelmus Maria Van Buel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration method for a lithographic apparatus and device manufact...
- Publication number 20050024643
- Publication date Feb 3, 2005
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of calibrating a lithographic apparatus, alignment method, c...
- Publication number 20050018159
- Publication date Jan 27, 2005
- ASML NETHERLANDS B.V.
- Henricus Wilhelmus Maria Van Buel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus
- Publication number 20040201833
- Publication date Oct 14, 2004
- ASML NETHERLANDS B.V.
- Cheng-Qun Gui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus
- Publication number 20040174511
- Publication date Sep 9, 2004
- ASML NETHERLANDS B.V.
- Cheng-Qun Gui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of aligning a substrate, computer program, device manufactur...
- Publication number 20040124375
- Publication date Jul 1, 2004
- ASML NETHERLANDS B.V.
- Keith Frank Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment tool, a lithographic apparatus, an alignment method, a de...
- Publication number 20040108466
- Publication date Jun 10, 2004
- ASML NETHERLANDS B.V.
- Joeri Lof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, alignment method and device manufacturing m...
- Publication number 20030227604
- Publication date Dec 11, 2003
- ASML NETHERLANDS, B.V.
- Keith Frank Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration methods, calibration substrates, lithographic apparatus...
- Publication number 20030224262
- Publication date Dec 4, 2003
- ASML NETHERLANDS, B.V.
- Joeri Lof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical exposure method, device manufacturing method and lithograph...
- Publication number 20020171818
- Publication date Nov 21, 2002
- Arthur Winfried Eduardus Minnaert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus
- Publication number 20020109825
- Publication date Aug 15, 2002
- ASML NETHERLANDS B.V.
- Cheng-Qun Gui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Henricus Wilhelmus Maria VAN BUEL

Person

Patents Grantslast 30 patents

Substrate comprising a target arrangement, and associated at least...

Metrology method, target and substrate

Metrology method, target and substrate

Apparatus for and a method of removing contaminant particles from a...

Metrology method, target and substrate

Metrology method, target and substrate

Optimization of target arrangement and associated target

Metrology method and apparatus, substrates for use in such methods,...

Inspection apparatus for measuring properties of a target structure...

Lithographic apparatus and method

Sensor, a table and lithographic apparatus

Lithographic apparatus

Lithographic apparatus

Optical exposure method, device manufacturing method and lithograph...

Patents Applicationslast 30 patents

A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, TARGET AND SUBSTRATE

METROLOGY METHOD, TARGET AND SUBSTRATE

Apparatus for and a Method of Removing Contaminant Particles from a...

OPTIMIZATION OF TARGET ARRANGEMENT AND ASSOCIATED TARGET

METROLOGY METHOD AND APPARATUS, SUBSTRATES FOR USE IN SUCH METHODS,...

Inspection Apparatus for Measuring Properties of a Target Structure...

METROLOGY METHOD, TARGET AND SUBSTRATE

Substrate table, method of measuring a position of a substrate and...

Substrate table, method of measuring a position of a substrate and...

Lithographic apparatus for imaging a front side or a back side of a...

Lithographic apparatus and device manufacturing method

Calibration method for a lithographic apparatus and device manufact...

Method of calibrating a lithographic apparatus, alignment method, c...

Lithographic apparatus

Lithographic apparatus

Method of aligning a substrate, computer program, device manufactur...

Alignment tool, a lithographic apparatus, an alignment method, a de...

Lithographic apparatus, alignment method and device manufacturing m...

Calibration methods, calibration substrates, lithographic apparatus...

Optical exposure method, device manufacturing method and lithograph...

Lithographic apparatus