Henry Megens

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 8,139,217
- Issue date Mar 20, 2012
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,880,880
- Issue date Feb 1, 2011
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Marker structure for optical alignment of a substrate, a substrate...
- Patent number 7,619,738
- Issue date Nov 17, 2009
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Marker for alignment of non-transparent gate layer, method for manu...
- Patent number 7,453,161
- Issue date Nov 18, 2008
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,439,531
- Issue date Oct 21, 2008
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,332,732
- Issue date Feb 19, 2008
- ASML Netherlands, B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,329,888
- Issue date Feb 12, 2008
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Marker structure for optical alignment of a substrate, a substrate...
- Patent number 7,330,261
- Issue date Feb 12, 2008
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment systems and methods for lithographic systems
- Patent number 7,297,971
- Issue date Nov 20, 2007
- ASML Netherlands B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Marker for alignment of non-transparent gate layer, method for manu...
- Patent number 7,271,073
- Issue date Sep 18, 2007
- ASML Nertherlands B.V.
- Richard Johannes Franciscus Van Haren
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS
- Publication number 20110128520
- Publication date Jun 2, 2011
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Marker structure for optical alignment of a substrate, a substrate...
- Publication number 20080180668
- Publication date Jul 31, 2008
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Marker for alignment of non-transparent gate layer, method for manu...
- Publication number 20070284697
- Publication date Dec 13, 2007
- ASML NETHERLANDS B.V.
- Richard Johannes Francisc Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20070176128
- Publication date Aug 2, 2007
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060091330
- Publication date May 4, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060086910
- Publication date Apr 27, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060081791
- Publication date Apr 20, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060081792
- Publication date Apr 20, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20060081790
- Publication date Apr 20, 2006
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Marker for alignment of non-transparent gate layer, method for manu...
- Publication number 20060003540
- Publication date Jan 5, 2006
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment systems and methods for lithographic systems
- Publication number 20050189502
- Publication date Sep 1, 2005
- ASML NETHERLANDS B.V.
- Franciscus Bernardus Maria Van Bilsen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Marker structure for optical alignment of a substrate, a substrate...
- Publication number 20040114143
- Publication date Jun 17, 2004
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Henry Megens

Person

Patents Grantslast 30 patents

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Marker structure for optical alignment of a substrate, a substrate...

Marker for alignment of non-transparent gate layer, method for manu...

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Marker structure for optical alignment of a substrate, a substrate...

Alignment systems and methods for lithographic systems

Marker for alignment of non-transparent gate layer, method for manu...

Patents Applicationslast 30 patents

ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS

Marker structure for optical alignment of a substrate, a substrate...

Marker for alignment of non-transparent gate layer, method for manu...

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Alignment systems and methods for lithographic systems

Marker for alignment of non-transparent gate layer, method for manu...

Alignment systems and methods for lithographic systems

Marker structure for optical alignment of a substrate, a substrate...