Henry Povolny

Person

Newark, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Ceramic layer for electrostatic chuck including embedded faraday ca...
- Patent number 11,101,107
- Issue date Aug 24, 2021
- Lam Research Corporation
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge seal configurations for a lower electrode assembly
- Patent number 10,892,197
- Issue date Jan 12, 2021
- Lam Research Corporation
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck including clamp electrode assembly forming port...
- Patent number 10,892,179
- Issue date Jan 12, 2021
- Lam Research Corporation
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlled substrate support assembly
- Patent number 10,879,053
- Issue date Dec 29, 2020
- Lam Research Corporation
- Anthony Ricci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Feedback control system for iterative etch process
- Patent number 10,832,979
- Issue date Nov 10, 2020
- Lam Research Corporation
- Arthur M. Howald
- G01 - MEASURING TESTING
Information Patent Grant
Ceramic layer for electrostatic chuck including embedded faraday ca...
- Patent number 10,475,623
- Issue date Nov 12, 2019
- Lam Research Corporation
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic electrostatic chuck including embedded faraday cage for RF...
- Patent number 10,192,767
- Issue date Jan 29, 2019
- Lam Research Corporation
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and apparatus for refining radio frequency transmiss...
- Patent number 10,102,321
- Issue date Oct 16, 2018
- Lam Research Corporation
- Henry S. Povolny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Edge seal for lower electrode assembly
- Patent number 10,090,211
- Issue date Oct 2, 2018
- Lam Research Corporation
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic electrostatic chuck including embedded Faraday cage for RF...
- Patent number 10,079,168
- Issue date Sep 18, 2018
- Lam Research Corporation
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck including embedded faraday cage for RF delivery...
- Patent number 10,014,161
- Issue date Jul 3, 2018
- Lam Research Corporation
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangement for plasma processing system control based on RF voltage
- Patent number 9,911,577
- Issue date Mar 6, 2018
- Lam Research Corporation
- John C. Valcore
- G05 - CONTROLLING REGULATING
Information Patent Grant
Electrostatic chuck including embedded faraday cage for RF delivery...
- Patent number 9,673,025
- Issue date Jun 6, 2017
- Lam Research Corporation
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and apparatus for improving accuracy of RF transmiss...
- Patent number 9,652,567
- Issue date May 16, 2017
- Lam Research Corporation
- John C. Valcore
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System, method and apparatus for RF power compensation in a plasma...
- Patent number 9,508,529
- Issue date Nov 29, 2016
- Lam Research Corporation
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch rate modeling and use thereof with multiple parameters for in-...
- Patent number 9,502,221
- Issue date Nov 22, 2016
- Lam Research Corporation
- John C. Valcore
- G05 - CONTROLLING REGULATING
Information Patent Grant
Arrangement for plasma processing system control based on RF voltage
- Patent number 9,455,126
- Issue date Sep 27, 2016
- Lam Research Corporation
- John C. Valcore
- G05 - CONTROLLING REGULATING
Information Patent Grant
System and method for heating plasma exposed surfaces
- Patent number 9,224,583
- Issue date Dec 29, 2015
- Lam Research Corporation
- Henry Povolny
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Arrangement for plasma processing system control based on RF voltage
- Patent number 9,128,473
- Issue date Sep 8, 2015
- Lam Research Corporation
- John C. Valcore
- G05 - CONTROLLING REGULATING
Information Patent Grant
Etch rate modeling and use thereof for in-chamber and chamber-to-ch...
- Patent number 9,082,594
- Issue date Jul 14, 2015
- Lam Research Corporation
- John C. Valcore
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods of dechucking and system thereof
- Patent number 8,832,916
- Issue date Sep 16, 2014
- Lam Research Corporation
- Henry S. Povolny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system control based on RF voltage
- Patent number 8,501,631
- Issue date Aug 6, 2013
- Lam Research Corporation
- John C. Valcore
- G05 - CONTROLLING REGULATING
Information Patent Grant
Adjustable thermal contact between an electrostatic chuck and a hot...
- Patent number 8,454,027
- Issue date Jun 4, 2013
- Lam Research Corporation
- Henry S. Povolny
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Temperature control module using gas pressure to control thermal co...
- Patent number 8,216,486
- Issue date Jul 10, 2012
- Lam Research Corporation
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature control module using gas pressure to control thermal co...
- Patent number 8,083,855
- Issue date Dec 27, 2011
- Lam Research Corporation
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
GAS DISTRIBUTION FACEPLATE WITH OBLIQUE FLOW PATHS
- Publication number 20230057217
- Publication date Feb 23, 2023
- LAM RESEARCH CORPORATION
- Henry Stephen Povolny
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Ceramic Layer for Electrostatic Chuck Including Embedded Faraday Ca...
- Publication number 20200035455
- Publication date Jan 30, 2020
- LAM RESEARCH CORPORATION
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Feedback Control System for Iterative Etch Process
- Publication number 20190259674
- Publication date Aug 22, 2019
- LAM RESEARCH CORPORATION
- Arthur M. Howald
- G01 - MEASURING TESTING
Information Patent Application
Edge Seal Configurations For A Lower Electrode Assembly
- Publication number 20180366379
- Publication date Dec 20, 2018
- LAM RESEARCH CORPORATION
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ceramic Electrostatic Chuck Including Embedded Faraday Cage for RF...
- Publication number 20180358254
- Publication date Dec 13, 2018
- LAM RESEARCH CORPORATION
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck Including Clamp Electrode Assembly Forming Port...
- Publication number 20180130689
- Publication date May 10, 2018
- LAM RESEARCH CORPORATION
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ceramic Electrostatic Chuck Including Embedded Faraday Cage for RF...
- Publication number 20180130690
- Publication date May 10, 2018
- LAM RESEARCH CORPORATION
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ceramic Layer for Electrostatic Chuck Including Embedded Faraday Ca...
- Publication number 20170287680
- Publication date Oct 5, 2017
- LAM RESEARCH CORPORATION
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck Including Embedded Faraday Cage for RF Delivery...
- Publication number 20170263418
- Publication date Sep 14, 2017
- LAM RESEARCH CORPORATION
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20170110298
- Publication date Apr 20, 2017
- LAM RESEARCH CORPORATION
- Anthony RICCI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck Including Embedded Faraday Cage for RF Delivery...
- Publication number 20170032935
- Publication date Feb 2, 2017
- LAM RESEARCH CORPORATION
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Arrangement For Plasma Processing System Control Based On RF Voltage
- Publication number 20160351375
- Publication date Dec 1, 2016
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System, Method and Apparatus for Refining RF Transmission System Mo...
- Publication number 20160117425
- Publication date Apr 28, 2016
- LAM RESEARCH CORPORATION
- Henry S. Povolny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System, Method and Apparatus for RF Power Compensation in a Plasma...
- Publication number 20160118227
- Publication date Apr 28, 2016
- LAM RESEARCH CORPORATION
- John C. Valcore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System, Method and Apparatus for Improving Accuracy of RF Transmiss...
- Publication number 20160109863
- Publication date Apr 21, 2016
- LAM RESEARCH CORPORATION
- John C. Valcore
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Arrangement For Plasma Processing System Control Based On RF Voltage
- Publication number 20150332894
- Publication date Nov 19, 2015
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY
- Publication number 20150187614
- Publication date Jul 2, 2015
- LAM RESEARCH CORPORATION
- Keith William Gaff
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch Rate Modeling and Use Thereof for In-Chamber and Chamber-to-Ch...
- Publication number 20150028744
- Publication date Jan 29, 2015
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch Rate Modeling and Use Thereof with Multiple Parameters for In-...
- Publication number 20150032245
- Publication date Jan 29, 2015
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY
- Publication number 20140356985
- Publication date Dec 4, 2014
- LAM RESEARCH CORPORATION
- Anthony Ricci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and Method for Heating Plasma Exposed Surfaces
- Publication number 20140263177
- Publication date Sep 18, 2014
- LAM RESEARCH CORPORATION
- Henry Povolny
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ARRANGEMENT FOR PLASMA PROCESSING SYSTEM CONTROL BASED ON RF VOLTAGE
- Publication number 20130345847
- Publication date Dec 26, 2013
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF DECHUCKING AND SYSTEM THEREOF
- Publication number 20130014371
- Publication date Jan 17, 2013
- Henry S. Povolny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL MODULE USING GAS PRESSURE TO CONTROL THERMAL CO...
- Publication number 20120070914
- Publication date Mar 22, 2012
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING SYSTEM CONTROL BASED ON RF VOLTAGE
- Publication number 20110137446
- Publication date Jun 9, 2011
- John C. Valcore, JR.
- G05 - CONTROLLING REGULATING
Information Patent Application
ADJUSTABLE THERMAL CONTACT BETWEEN AN ELECTROSTATIC CHUCK AND A HOT...
- Publication number 20100078899
- Publication date Apr 1, 2010
- LAM RESEARCH CORPORATION
- Henry S. Povolny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature control module using gas pressure to control thermal co...
- Publication number 20090111276
- Publication date Apr 30, 2009
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Henry Povolny

Person

Patents Grantslast 30 patents

Ceramic layer for electrostatic chuck including embedded faraday ca...

Edge seal configurations for a lower electrode assembly

Electrostatic chuck including clamp electrode assembly forming port...

Temperature controlled substrate support assembly

Feedback control system for iterative etch process

Ceramic layer for electrostatic chuck including embedded faraday ca...

Ceramic electrostatic chuck including embedded faraday cage for RF...

System, method and apparatus for refining radio frequency transmiss...

Edge seal for lower electrode assembly

Ceramic electrostatic chuck including embedded Faraday cage for RF...

Electrostatic chuck including embedded faraday cage for RF delivery...

Arrangement for plasma processing system control based on RF voltage

Electrostatic chuck including embedded faraday cage for RF delivery...

System, method and apparatus for improving accuracy of RF transmiss...

System, method and apparatus for RF power compensation in a plasma...

Etch rate modeling and use thereof with multiple parameters for in-...

Arrangement for plasma processing system control based on RF voltage

System and method for heating plasma exposed surfaces

Arrangement for plasma processing system control based on RF voltage

Etch rate modeling and use thereof for in-chamber and chamber-to-ch...

Methods of dechucking and system thereof

Plasma processing system control based on RF voltage

Adjustable thermal contact between an electrostatic chuck and a hot...

Temperature control module using gas pressure to control thermal co...

Temperature control module using gas pressure to control thermal co...

Patents Applicationslast 30 patents

GAS DISTRIBUTION FACEPLATE WITH OBLIQUE FLOW PATHS

Ceramic Layer for Electrostatic Chuck Including Embedded Faraday Ca...

Feedback Control System for Iterative Etch Process

Edge Seal Configurations For A Lower Electrode Assembly

Ceramic Electrostatic Chuck Including Embedded Faraday Cage for RF...

Electrostatic Chuck Including Clamp Electrode Assembly Forming Port...

Ceramic Electrostatic Chuck Including Embedded Faraday Cage for RF...

Ceramic Layer for Electrostatic Chuck Including Embedded Faraday Ca...

Electrostatic Chuck Including Embedded Faraday Cage for RF Delivery...

TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY

Electrostatic Chuck Including Embedded Faraday Cage for RF Delivery...

Arrangement For Plasma Processing System Control Based On RF Voltage

System, Method and Apparatus for Refining RF Transmission System Mo...

System, Method and Apparatus for RF Power Compensation in a Plasma...

System, Method and Apparatus for Improving Accuracy of RF Transmiss...

Arrangement For Plasma Processing System Control Based On RF Voltage

EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY

Etch Rate Modeling and Use Thereof for In-Chamber and Chamber-to-Ch...

Etch Rate Modeling and Use Thereof with Multiple Parameters for In-...

TEMPERATURE CONTROLLED SUBSTRATE SUPPORT ASSEMBLY

System and Method for Heating Plasma Exposed Surfaces

ARRANGEMENT FOR PLASMA PROCESSING SYSTEM CONTROL BASED ON RF VOLTAGE

METHODS OF DECHUCKING AND SYSTEM THEREOF

TEMPERATURE CONTROL MODULE USING GAS PRESSURE TO CONTROL THERMAL CO...

PLASMA PROCESSING SYSTEM CONTROL BASED ON RF VOLTAGE

ADJUSTABLE THERMAL CONTACT BETWEEN AN ELECTROSTATIC CHUCK AND A HOT...

Temperature control module using gas pressure to control thermal co...