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Henry Sanford-Crane

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  • Elkton, MD, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    Low-defect-porous polishing pad
    • Patent number 10,688,621
    • Issue date Jun 23, 2020
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • Henry Sanford-Crane
    • B24 - GRINDING POLISHING
  • Information Patent Grant

    Tapering method for poromeric polishing pad
    • Patent number 10,259,099
    • Issue date Apr 16, 2019
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • Koichi Yoshida
    • B24 - GRINDING POLISHING
  • Information Patent Grant

    Thermoplastic poromeric polishing pad
    • Patent number 10,106,662
    • Issue date Oct 23, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • Shuiyuan Luo
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Tapered poromeric polishing pad
    • Patent number 9,925,637
    • Issue date Mar 27, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • Koichi Yoshida
    • B24 - GRINDING POLISHING
  • Information Patent Grant

    Dual-pore structure polishing pad
    • Patent number 8,408,977
    • Issue date Apr 2, 2013
    • Rohm and Haas Electronic Materials CMP Inc.
    • David B. James
    • B24 - GRINDING POLISHING
  • Information Patent Grant

    Dual-pore structure polishing pad
    • Patent number 8,162,728
    • Issue date Apr 24, 2012
    • Rohm and Haas Electronic Materials CMP Holdings, Inc.
    • David B. James
    • B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

  • Information Patent Application

    TAPERING METHOD FOR POROMERIC POLISHING PAD
    • Publication number 20180036860
    • Publication date Feb 8, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Koichi Yoshida
    • B24 - GRINDING POLISHING
  • Information Patent Application

    TAPERED POROMERIC POLISHING PAD
    • Publication number 20180036862
    • Publication date Feb 8, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Koichi Yoshida
    • B24 - GRINDING POLISHING
  • Information Patent Application

    LOW-DEFECT-POROUS POLISHING PAD
    • Publication number 20180036863
    • Publication date Feb 8, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Henry Sanford-Crane
    • B24 - GRINDING POLISHING
  • Information Patent Application

    THERMOPLASTIC POROMERIC POLISHING PAD
    • Publication number 20180037706
    • Publication date Feb 8, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Shuiyuan Luo
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Dual-Pore Structure Polishing Pad
    • Publication number 20120171940
    • Publication date Jul 5, 2012
    • Rohm and Haas Electronic Materials CMP Holdings Inc.
    • David B. James
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Dual-pore structure polishing pad
    • Publication number 20110076928
    • Publication date Mar 31, 2011
    • David B. James
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...