Herbert Buschbeck

Person

Vienna, AT

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle system
- Patent number 8,049,189
- Issue date Nov 1, 2011
- Carl Zeiss SMS GmbH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern lock system for particle-beam exposure apparatus
- Patent number 7,772,574
- Issue date Aug 10, 2010
- IMS Nanofabrication AG
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensation of magnetic fields
- Patent number 7,436,120
- Issue date Oct 14, 2008
- IMS Nanofabrication GmbH
- Herbert Buschbeck
- G05 - CONTROLLING REGULATING
Information Patent Grant
Particle-optical projection system
- Patent number 7,388,217
- Issue date Jun 17, 2008
- IMS Nanofabrication GmbH
- Herbert Buschbeck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optic electrostatic lens
- Patent number 7,199,373
- Issue date Apr 3, 2007
- IMS Nanofabrication GmbH
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maskless particle-beam system for exposing a pattern on a substrate
- Patent number 6,768,125
- Issue date Jul 27, 2004
- IMS Nanofabrication, GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-optical imaging system for lithography purposes
- Patent number 6,326,632
- Issue date Dec 4, 2001
- IMS-Ionen Mikrofabrikations Systeme GmbH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Arrangement for shadow-casting lithography
- Patent number 5,874,739
- Issue date Feb 23, 1999
- Ims-Ionen Mikrofabrikations Systems BMGH
- Herbert Buschbeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Wavelength Supplemented Light Bulbs and Lighting Fixtures
- Publication number 20230077872
- Publication date Mar 16, 2023
- University of Cincinnati
- Elke Buschbeck
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Pattern Lock System for Particle-Beam Exposure Apparatus
- Publication number 20090146082
- Publication date Jun 11, 2009
- IMS Nanofabrication AG
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged Particle System
- Publication number 20080210887
- Publication date Sep 4, 2008
- CARL ZEISS SMS GMBH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Application
Particle-optical projection system
- Publication number 20070125956
- Publication date Jun 7, 2007
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Application
Particle-optical projection system
- Publication number 20050201246
- Publication date Sep 15, 2005
- IMS Nanofabrication GmbH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Application
Compensation of magnetic fields
- Publication number 20050195551
- Publication date Sep 8, 2005
- IMS Nanofabrication GmbH
- Herbert Buschbeck
- G05 - CONTROLLING REGULATING
Information Patent Application
Particle-optic electrostatic lens
- Publication number 20050072933
- Publication date Apr 7, 2005
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Application
Maskless particle-beam system for exposing a pattern on a substrate
- Publication number 20030155534
- Publication date Aug 21, 2003
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic imaging of a structure pattern onto one or more fields...
- Publication number 20010036588
- Publication date Nov 1, 2001
- IMS-Ionen Mikrofabrikations Systeme GmbH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY

Herbert Buschbeck

Person

Patents Grantslast 30 patents

Charged particle system

Pattern lock system for particle-beam exposure apparatus

Compensation of magnetic fields

Particle-optical projection system

Particle-optic electrostatic lens

Maskless particle-beam system for exposing a pattern on a substrate

Particle-optical imaging system for lithography purposes

Arrangement for shadow-casting lithography

Patents Applicationslast 30 patents

Wavelength Supplemented Light Bulbs and Lighting Fixtures

Pattern Lock System for Particle-Beam Exposure Apparatus

Charged Particle System

Particle-optical projection system

Particle-optical projection system

Compensation of magnetic fields

Particle-optic electrostatic lens

Maskless particle-beam system for exposing a pattern on a substrate

Lithographic imaging of a structure pattern onto one or more fields...