Herbert Struyf

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Kontich, BE

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Patents Grantslast 30 patents

Information Patent Grant
High aspect ratio via etch
- Patent number 7,807,583
- Issue date Oct 5, 2010
- IMEC
- Joke Van Aelst
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Dual damascene patterning method
- Patent number 7,611,986
- Issue date Nov 3, 2009
- IMEC
- Jan Van Olmen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anisotropic etching of organic-containing insulating layers
- Patent number 6,844,266
- Issue date Jan 18, 2005
- Interuniversitair Microelektronica Centrum
- Karen Maex
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for stripping ion implanted photoresist layer
- Patent number 6,352,936
- Issue date Mar 5, 2002
- Imec VZW
- Christian Jehoul
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
HIGH ASPECT RATIO VIA ETCH
- Publication number 20080050919
- Publication date Feb 28, 2008
- Interuniversitair Microelektronica Centrum (IMEC)
- Joke Van Aelst
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Dual damascene patterning method
- Publication number 20060264033
- Publication date Nov 23, 2006
- Jan Van Olmen
- H01 - BASIC ELECTRIC ELEMENTS