Herbert Vonach

Person

Klosterneuburg, AT

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle system
- Patent number 8,049,189
- Issue date Nov 1, 2011
- Carl Zeiss SMS GmbH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Particle multibeam lithography
- Patent number 6,989,546
- Issue date Jan 24, 2006
- IMS-Innenmikrofabrikations Systeme GmbH
- Hans Loschner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Maskless particle-beam system for exposing a pattern on a substrate
- Patent number 6,768,125
- Issue date Jul 27, 2004
- IMS Nanofabrication, GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing a structured mask
- Patent number 5,876,880
- Issue date Mar 2, 1999
- IMS Ionen Mikrofabrikations Systeme Gellschaft M.B.H.
- Herbert Vonach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement for shadow-casting lithography
- Patent number 5,874,739
- Issue date Feb 23, 1999
- Ims-Ionen Mikrofabrikations Systems BMGH
- Herbert Buschbeck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle beam, in particular ionic optic imaging system
- Patent number 5,801,388
- Issue date Sep 1, 1998
- IMS-Ionen Mikropfabrikations Systeme GmbH
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangement for masked beam lithography by means of electrically ch...
- Patent number 5,742,062
- Issue date Apr 21, 1998
- IMS Mikrofabrikations Systeme GmbH
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection system for charged particles
- Patent number 5,693,950
- Issue date Dec 2, 1997
- IMS Ionen Mikrofabrikations Systeme GmbH
- Gerhard Stengl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion-optical imaging system
- Patent number 5,436,460
- Issue date Jul 25, 1995
- IMS Ionen Mikrofabrikations Systeme Gesellschaft mbH
- Gerhard Stengl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle-beam imaging system
- Patent number 5,378,917
- Issue date Jan 3, 1995
- IMS Ionen Mikrofabrations Systeme Gesellschaft m.b.H.
- Alfred Chalupka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Charged Particle System
- Publication number 20080210887
- Publication date Sep 4, 2008
- CARL ZEISS SMS GMBH
- Herbert Buschbeck
- B82 - NANO-TECHNOLOGY
Information Patent Application
PARTICLE MULTIBEAM LITHOGRAPHY
- Publication number 20030209676
- Publication date Nov 13, 2003
- HANS LOSCHNER
- B82 - NANO-TECHNOLOGY
Information Patent Application
Maskless particle-beam system for exposing a pattern on a substrate
- Publication number 20030155534
- Publication date Aug 21, 2003
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY

Herbert Vonach

Person

Patents Grantslast 30 patents

Charged particle system

Particle multibeam lithography

Maskless particle-beam system for exposing a pattern on a substrate

Process for producing a structured mask

Arrangement for shadow-casting lithography

Particle beam, in particular ionic optic imaging system

Arrangement for masked beam lithography by means of electrically ch...

Projection system for charged particles

Ion-optical imaging system

Particle-beam imaging system

Patents Applicationslast 30 patents

Charged Particle System

PARTICLE MULTIBEAM LITHOGRAPHY

Maskless particle-beam system for exposing a pattern on a substrate