Herng Yau Yoong

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Patents Grantslast 30 patents

Information Patent Grant
Multilayer extreme ultraviolet reflectors
- Patent number 11,782,337
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer extreme ultraviolet reflectors
- Patent number 11,762,278
- Issue date Sep 19, 2023
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to anneal EUV mask blank
- Patent number 11,480,866
- Issue date Oct 25, 2022
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of measuring refractive index of EUV mask absorber
- Patent number 11,467,499
- Issue date Oct 11, 2022
- Applied Materials, Inc.
- Wen Xiao
- G01 - MEASURING TESTING
Information Patent Grant
System and method to measure refractive index at specific wavelengths
- Patent number 11,366,059
- Issue date Jun 21, 2022
- Applied Materials Inc.
- Wen Xiao
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
MULTILAYER EXTREME ULTRAVIOLET REFLECTORS
- Publication number 20230075471
- Publication date Mar 9, 2023
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER EXTREME ULTRAVIOLET REFLECTORS
- Publication number 20220404692
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO ANNEAL EUV MASK BLANK
- Publication number 20220187697
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method of Measuring Refractive Index of EUV Mask Absorber
- Publication number 20210382398
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method to Measure Refractive Index at Specific Wavelengths
- Publication number 20210381967
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Wen Xiao
- G01 - MEASURING TESTING
Information Patent Application
EXTREME ULTRAVIOLET MASK BLANK DEFECT REDUCTION METHODS
- Publication number 20210124253
- Publication date Apr 29, 2021
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY