Hidefumi Yabara

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
D/A converter and electron beam exposure apparatus
- Patent number 8,223,045
- Issue date Jul 17, 2012
- Advantest Corp.
- Hidefumi Yabara
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Charged-particle beam lithography apparatus and system capable of r...
- Patent number 6,399,954
- Issue date Jun 4, 2002
- Advantest Corporation
- Isamu Seto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 6,242,751
- Issue date Jun 5, 2001
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and method capable of high-sp...
- Patent number 6,072,185
- Issue date Jun 6, 2000
- Fujitsu Limited
- Soichiro Arai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,969,365
- Issue date Oct 19, 1999
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of providing changed particle beam exposure in which represe...
- Patent number 5,965,895
- Issue date Oct 12, 1999
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for changed particle beam exposure
- Patent number 5,910,658
- Issue date Jun 8, 1999
- Fujitsu Limited
- Soichiro Arai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure method and charged particle beam exp...
- Patent number 5,808,313
- Issue date Sep 15, 1998
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,757,015
- Issue date May 26, 1998
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,721,432
- Issue date Feb 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,719,402
- Issue date Feb 17, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,546,319
- Issue date Aug 13, 1996
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Digital-to-analog converter having a circuit for compensating for v...
- Patent number 5,134,398
- Issue date Jul 28, 1992
- Fujitsu Limited
- Nobuyuki Yasutake
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
D/A Converter and electron beam exposure apparatus
- Publication number 20100314560
- Publication date Dec 16, 2010
- Hidefumi Yabara
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Multi-column type electron beam exposure apparatus
- Publication number 20080049204
- Publication date Feb 28, 2008
- Hidefumi Yabara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle-beam exposure device and charged-particle-beam exp...
- Publication number 20010013581
- Publication date Aug 16, 2001
- Akio Takemoto
- B82 - NANO-TECHNOLOGY

Hidefumi Yabara

Person

Patents Grantslast 30 patents

D/A converter and electron beam exposure apparatus

Charged-particle beam lithography apparatus and system capable of r...

Charged-particle-beam exposure device and charged-particle-beam exp...

Charged-particle-beam exposure device and method capable of high-sp...

Charged-particle-beam exposure device and charged-particle-beam exp...

Method of providing changed particle beam exposure in which represe...

Method and system for changed particle beam exposure

Charged particle beam exposure method and charged particle beam exp...

Charged-particle-beam exposure device and charged-particle-beam exp...

Method of and system for charged particle beam exposure

Method of and system for charged particle beam exposure

Method of and system for charged particle beam exposure

Digital-to-analog converter having a circuit for compensating for v...

Patents Applicationslast 30 patents

D/A Converter and electron beam exposure apparatus

Multi-column type electron beam exposure apparatus

Charged-particle-beam exposure device and charged-particle-beam exp...