Hidekatsu Kohara

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Phenol novolak resin, production process thereof, and positive phot...
- Patent number 6,939,926
- Issue date Sep 6, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer, photoresist composition, and process for forming resist...
- Patent number 6,884,566
- Issue date Apr 26, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist composition and process for synthesizing polyp...
- Patent number 6,620,978
- Issue date Sep 16, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Shimatani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition, substrate with a photosensitive f...
- Patent number 6,566,031
- Issue date May 20, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer, photoresist composition, and process for forming resist...
- Patent number 6,517,993
- Issue date Feb 11, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition and process and synthesizing polyp...
- Patent number 6,492,085
- Issue date Dec 10, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Shimatani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition comprising a phenolic compound hav...
- Patent number 6,475,694
- Issue date Nov 5, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Kousuke Doi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novolak resin precursor, novolak resin and positive photoresist com...
- Patent number 6,417,317
- Issue date Jul 9, 2002
- Togyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for forming resist pat...
- Patent number 6,406,827
- Issue date Jun 18, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for forming resist pat...
- Patent number 6,379,859
- Issue date Apr 30, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 6,312,863
- Issue date Nov 6, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Shinichi Hidesaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for forming resist pat...
- Patent number 6,300,033
- Issue date Oct 9, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for forming contact hole
- Patent number 6,296,992
- Issue date Oct 2, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masaki Kurihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for forming contact hole
- Patent number 6,207,340
- Issue date Mar 27, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masaki Kurihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novolak resin precursor, novolak resin and positive photoresist com...
- Patent number 6,207,788
- Issue date Mar 27, 2001
- Tokyo Ohka Kogya Co., Ltd.
- Ken Miyagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist compositions and multilayer resist materials u...
- Patent number 6,187,500
- Issue date Feb 13, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist composition and process for forming contact hole
- Patent number 6,177,226
- Issue date Jan 23, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masaki Kurihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist compositions and multilayer resist materials u...
- Patent number 6,127,087
- Issue date Oct 3, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Miki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyphenol compound, quinonediazide ester and positive photoresist...
- Patent number 6,120,969
- Issue date Sep 19, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuo Hagihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Production process of polyphenol diesters, and positive photosensit...
- Patent number 6,106,994
- Issue date Aug 22, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Niikura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photoresist compositions and a process for producing the same
- Patent number 6,083,657
- Issue date Jul 4, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Shinichi Kono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition
- Patent number 6,030,741
- Issue date Feb 29, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Kousuke Doi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist compositions and multilayer resist materials u...
- Patent number 5,853,948
- Issue date Dec 29, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Atsushi Sawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 5,738,968
- Issue date Apr 14, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroshi Hosoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist compositions and multilayer resist materials u...
- Patent number 5,728,504
- Issue date Mar 17, 1998
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroshi Hosoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist coating solution comprising a mixed solvent of...
- Patent number 5,702,862
- Issue date Dec 30, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Hayato Ohno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 5,702,861
- Issue date Dec 30, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Niikura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition comprising a novolac resin...
- Patent number 5,604,077
- Issue date Feb 18, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Shinichi Kono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High-sensitivity positive-working photoresist composition
- Patent number 5,601,961
- Issue date Feb 11, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuhiko Nakayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method with selective silylation utilizing lithogra...
- Patent number 5,599,653
- Issue date Feb 4, 1997
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Nakao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Phenol novolak resin, production process thereof, and positive phot...
- Publication number 20040167312
- Publication date Aug 26, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel copolymer, photoresist composition, and process for forming r...
- Publication number 20040096772
- Publication date May 20, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel copolymer, photoresist composition, and process for forming r...
- Publication number 20030186171
- Publication date Oct 2, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive photoresist composition and process for synthesizing polyp...
- Publication number 20030054283
- Publication date Mar 20, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Shimatani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition and process for forming resist pat...
- Publication number 20020119390
- Publication date Aug 29, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel copolymer, photoresist composition, and process for forming r...
- Publication number 20020031719
- Publication date Mar 14, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Novel copolymer, photoresist composition , and process for forming...
- Publication number 20020031720
- Publication date Mar 14, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE PHOTORESIST COMPOSITION AND PROCESS FOR FORMING RESIST PAT...
- Publication number 20020012865
- Publication date Jan 31, 2002
- TAKAKO SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition
- Publication number 20020001769
- Publication date Jan 3, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Kousuke Doi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTORESIST COMPOSITION AND PROCESS FOR FORMING RESIST PAT...
- Publication number 20010053493
- Publication date Dec 20, 2001
- TAKAKO SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phenol novolak resin, production process thereof, and positive phot...
- Publication number 20010024762
- Publication date Sep 27, 2001
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hidekatsu Kohara

Person

Patents Grantslast 30 patents

Phenol novolak resin, production process thereof, and positive phot...

Copolymer, photoresist composition, and process for forming resist...

Positive photoresist composition and process for synthesizing polyp...

Positive photoresist composition, substrate with a photosensitive f...

Copolymer, photoresist composition, and process for forming resist...

Positive photoresist composition and process and synthesizing polyp...

Positive photoresist composition comprising a phenolic compound hav...

Novolak resin precursor, novolak resin and positive photoresist com...

Positive photoresist composition and process for forming resist pat...

Positive photoresist composition and process for forming resist pat...

Positive photoresist composition

Positive photoresist composition and process for forming resist pat...

Positive photoresist composition and process for forming contact hole

Positive photoresist composition and process for forming contact hole

Novolak resin precursor, novolak resin and positive photoresist com...

Positive photoresist compositions and multilayer resist materials u...

Positive photoresist composition and process for forming contact hole

Positive photoresist compositions and multilayer resist materials u...

Polyphenol compound, quinonediazide ester and positive photoresist...

Production process of polyphenol diesters, and positive photosensit...

Positive photoresist compositions and a process for producing the same

Positive resist composition

Positive photoresist compositions and multilayer resist materials u...

Positive photoresist composition

Positive photoresist compositions and multilayer resist materials u...

Positive photoresist coating solution comprising a mixed solvent of...

Positive photoresist composition

Positive-working photoresist composition comprising a novolac resin...

High-sensitivity positive-working photoresist composition

Pattern forming method with selective silylation utilizing lithogra...

Patents Applicationslast 30 patents

Phenol novolak resin, production process thereof, and positive phot...

Novel copolymer, photoresist composition, and process for forming r...

Novel copolymer, photoresist composition, and process for forming r...

Positive photoresist composition and process for synthesizing polyp...

Positive photoresist composition and process for forming resist pat...

Novel copolymer, photoresist composition, and process for forming r...

Novel copolymer, photoresist composition , and process for forming...

POSITIVE PHOTORESIST COMPOSITION AND PROCESS FOR FORMING RESIST PAT...

Positive photoresist composition

POSITIVE PHOTORESIST COMPOSITION AND PROCESS FOR FORMING RESIST PAT...

Phenol novolak resin, production process thereof, and positive phot...