Hideki KANAI

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 9,607,887
- Issue date Mar 28, 2017
- Kabushiki Kaisha Toshiba
- Hideki Kanai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method
- Patent number 9,023,222
- Issue date May 5, 2015
- Kabushiki Kaisha Toshiba
- Ayako Kawanishi
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Generating image inspection data from subtracted corner-processed d...
- Patent number 8,233,695
- Issue date Jul 31, 2012
- Kabushiki Kaisha Toshiba
- Satoshi Usui
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Reticle, apparatus for monitoring optical system, method for monito...
- Patent number 7,812,972
- Issue date Oct 12, 2010
- Kabushiki Kaisha Toshiba
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask correcting method and manufacturing method of semiconduct...
- Patent number 7,670,755
- Issue date Mar 2, 2010
- Kabushiki Kaisha Toshiba
- Hideki Kanai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of correcting mask data, method of manufacturing a mask and...
- Patent number 7,638,244
- Issue date Dec 29, 2009
- Kabushiki Kaisha Toshiba
- Hideki Kanai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, manufacturing method for mask, and manufacturing method for s...
- Patent number 7,541,136
- Issue date Jun 2, 2009
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle, apparatus for monitoring optical system, method for monito...
- Patent number 7,432,021
- Issue date Oct 7, 2008
- Kabushiki Kaisha Toshiba
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask correcting method and manufacturing method of semiconduct...
- Patent number 7,399,557
- Issue date Jul 15, 2008
- Kabushiki Kaisha Toshiba
- Hideki Kanai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, manufacturing method for mask, and manufacturing method for s...
- Patent number 7,094,504
- Issue date Aug 22, 2006
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a semiconductor device and an exposure mas...
- Patent number 6,165,692
- Issue date Dec 26, 2000
- Kabushiki Kaisha Toshiba
- Hideki Kanai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 6,165,907
- Issue date Dec 26, 2000
- Kabushiki Kaisha Toshiba
- Ikuo Yoneda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and method of manufacturing thereof, and pattern data...
- Patent number 6,159,642
- Issue date Dec 12, 2000
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 5,792,376
- Issue date Aug 11, 1998
- Kabushiki Kaisha Toshiba
- Hideki Kanai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PATTERN FORMING METHOD
- Publication number 20170076940
- Publication date Mar 16, 2017
- Kabushiki Kaisha Toshiba
- Yusuke KASAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20170069531
- Publication date Mar 9, 2017
- Kabushiki Kaisha Toshiba
- Hideki KANAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20140295669
- Publication date Oct 2, 2014
- Kabushiki Kaisha Toshiba
- Ayako KAWANISHI
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Reticle, apparatus for monitoring optical system, method for monito...
- Publication number 20090009775
- Publication date Jan 8, 2009
- Kabushiki Kaisha Toshiba
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask correcting method and manufacturing method of semiconduct...
- Publication number 20080292992
- Publication date Nov 27, 2008
- Kabushiki Kaisha Toshiba
- Hideki Kanai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF GENERATING INSPECTION DATA, INSPECTION METHOD, AND COMPUT...
- Publication number 20080144920
- Publication date Jun 19, 2008
- Kabushiki Kaisha Toshiba
- Satoshi USUI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask, manufacturing method for mask, and manufacturing method for s...
- Publication number 20060240341
- Publication date Oct 26, 2006
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of correcting mask data, method of manufacturing a mask and...
- Publication number 20060083995
- Publication date Apr 20, 2006
- Hideki Kanai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle, apparatus for monitoring optical system, method for monito...
- Publication number 20050048378
- Publication date Mar 3, 2005
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask correcting method and manufacturing method of semiconduct...
- Publication number 20040253525
- Publication date Dec 16, 2004
- Hideki Kanai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask, manufacturing method for mask, and manufacturing method for s...
- Publication number 20040131951
- Publication date Jul 8, 2004
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hideki KANAI

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor device

Pattern forming method

Generating image inspection data from subtracted corner-processed d...

Reticle, apparatus for monitoring optical system, method for monito...

Photomask correcting method and manufacturing method of semiconduct...

Method of correcting mask data, method of manufacturing a mask and...

Mask, manufacturing method for mask, and manufacturing method for s...

Reticle, apparatus for monitoring optical system, method for monito...

Photomask correcting method and manufacturing method of semiconduct...

Mask, manufacturing method for mask, and manufacturing method for s...

Method for manufacturing a semiconductor device and an exposure mas...

Plasma etching method and plasma etching apparatus

Exposure mask and method of manufacturing thereof, and pattern data...

Plasma processing apparatus and plasma processing method

Patents Applicationslast 30 patents

PATTERN FORMING METHOD

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

PATTERN FORMING METHOD

Reticle, apparatus for monitoring optical system, method for monito...

Photomask correcting method and manufacturing method of semiconduct...

METHOD OF GENERATING INSPECTION DATA, INSPECTION METHOD, AND COMPUT...

Mask, manufacturing method for mask, and manufacturing method for s...

Method of correcting mask data, method of manufacturing a mask and...

Reticle, apparatus for monitoring optical system, method for monito...

Photomask correcting method and manufacturing method of semiconduct...

Mask, manufacturing method for mask, and manufacturing method for s...