Hideki Kihara

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,482,435
- Issue date Oct 25, 2022
- HITACHI HIGH-TECH CORPORATION
- Masatoshi Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical fiber cable, harness, and method of manufacturing optical f...
- Patent number 11,346,999
- Issue date May 31, 2022
- Mitsubishi Chemical Corporation
- Takeshi Morinaka
- G02 - OPTICS
Information Patent Grant
Plastic optical fiber, plastic optical fiber cable, wire harness an...
- Patent number 10,962,685
- Issue date Mar 30, 2021
- Mitsubishi Chemical Corporation
- Hideki Kihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Optical fiber, method for manufacturing optical fiber, optical fibe...
- Patent number 10,830,947
- Issue date Nov 10, 2020
- Mitsubishi Chemical Corporation
- Hideki Kihara
- G01 - MEASURING TESTING
Information Patent Grant
Optical fiber, optical fiber cable and communication equipment
- Patent number 9,798,043
- Issue date Oct 24, 2017
- Mitsubishi Chemical Corporation
- Hideki Kihara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Multicore optical fiber and multicore optical fiber cable
- Patent number 9,448,358
- Issue date Sep 20, 2016
- Mitsubishi Rayon Co., Ltd.
- Yoshihiro Tsukamoto
- G02 - OPTICS
Information Patent Grant
Wafer processing based on sensor detection and system learning
- Patent number 8,897,906
- Issue date Nov 25, 2014
- Hitachi High-Technologies Corporation
- Tomohiro Ohashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,795,467
- Issue date Aug 5, 2014
- Hitachi High-Technologies Corporation
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 8,460,467
- Issue date Jun 11, 2013
- Hitachi High-Technologies Corporation
- Akitaka Makino
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method for operating the same
- Patent number 8,197,704
- Issue date Jun 12, 2012
- Hitachi High-Technologies Corporation
- Takahisa Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,062,473
- Issue date Nov 22, 2011
- Hitachi High-Technologies Corporation
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 7,976,632
- Issue date Jul 12, 2011
- Hitachi High-Technologies Corporation
- Akitaka Makino
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Vacuum processing apparatus and vacuum processing method of sample
- Patent number 7,947,189
- Issue date May 24, 2011
- Hitachi High-Technologies Corporation
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 7,833,382
- Issue date Nov 16, 2010
- Hitachi High-Technologies Corporation
- Akitaka Makino
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing method
- Patent number 7,833,429
- Issue date Nov 16, 2010
- Hitachi High-Technologies Corporation
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 7,828,928
- Issue date Nov 9, 2010
- Hitachi High-Technologies Corporation
- Akitaka Makino
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,740,739
- Issue date Jun 22, 2010
- Hitachi High-Technologies Corporation
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,674,351
- Issue date Mar 9, 2010
- Hitachi High-Technologies Corporation
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,416,633
- Issue date Aug 26, 2008
- Hitachi High-Technologies Corporation
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing method and vacuum processing apparatus
- Patent number 7,353,076
- Issue date Apr 1, 2008
- Hitachi High-Technologies Corporation
- Nobuo Nagayasu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 7,335,277
- Issue date Feb 26, 2008
- Hitachi High-Technologies Corporation
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 7,296,783
- Issue date Nov 20, 2007
- Hitachi High-Technologies Corporation
- Hideki Kihara
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Vacuum processing apparatus
- Patent number 7,247,207
- Issue date Jul 24, 2007
- Hitachi High-Technologies Corporation
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number D546354
- Issue date Jul 10, 2007
- Hitachi High-Technologies Corporation
- Hideki Kihara
- D15 - Machines not elsewhere specified
Information Patent Grant
Method for operating a semiconductor processing apparatus
- Patent number 7,183,715
- Issue date Feb 27, 2007
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method
- Patent number 7,138,606
- Issue date Nov 21, 2006
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer stage for wafer processing apparatus
- Patent number 6,895,179
- Issue date May 17, 2005
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus
- Patent number 6,825,617
- Issue date Nov 30, 2004
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer stage for wafer processing apparatus and wafer processing method
- Patent number 6,646,233
- Issue date Nov 11, 2003
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus and method
- Patent number 5,861,601
- Issue date Jan 19, 1999
- Hitachi, Ltd.
- Yoshiaki Sato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL FIBER CABLE, HARNESS, AND METHOD OF MANUFACTURING OPTICAL F...
- Publication number 20200408987
- Publication date Dec 31, 2020
- MITSUBISHI CHEMICAL CORPORATION
- Takeshi Morinaka
- G02 - OPTICS
Information Patent Application
PLASTIC OPTICAL FIBER, PLASTIC OPTICAL FIBER CABLE, WIRE HARNESS AN...
- Publication number 20200003932
- Publication date Jan 2, 2020
- MITSUBISHI CHEMICAL CORPORATION
- Hideki Kihara
- G02 - OPTICS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190393058
- Publication date Dec 26, 2019
- Hitachi High-Technologies Corporation
- Masatoshi Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Fiber, Method for Manufacturing Optical Fiber, Optical Fibe...
- Publication number 20170322372
- Publication date Nov 9, 2017
- MITSUBISHI CHEMICAL CORPORATION
- Hideki Kihara
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING
Information Patent Application
Optical Fiber, Optical Fiber Cable and Communication Equipment
- Publication number 20160334548
- Publication date Nov 17, 2016
- Mitsubishi Rayon Co., Ltd.
- Hideki Kihara
- G02 - OPTICS
Information Patent Application
Plastic Optical Fiber and Its Manufacturing Method, Sensor, and Bob...
- Publication number 20160075094
- Publication date Mar 17, 2016
- Mitsubishi Rayon Co., Ltd.
- Hideki Kihara
- G02 - OPTICS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160027618
- Publication date Jan 28, 2016
- Hitachi High-Technologies Corporation
- Masatoshi Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTICORE OPTICAL FIBER AND MULTICORE OPTICAL FIBER CABLE
- Publication number 20160011366
- Publication date Jan 14, 2016
- MITSUBISHI RAYON CO., LTD.
- Yoshihiro TSUKAMOTO
- G02 - OPTICS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150214083
- Publication date Jul 30, 2015
- Hitachi High-Technologies Corporation
- Masatoshi Kawakami
- G01 - MEASURING TESTING
Information Patent Application
VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD
- Publication number 20130053997
- Publication date Feb 28, 2013
- Tomohiro Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120012252
- Publication date Jan 19, 2012
- Hironori Kusumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum Processing Apparatus
- Publication number 20110259522
- Publication date Oct 27, 2011
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR OPERATING THE SAME
- Publication number 20100206845
- Publication date Aug 19, 2010
- Takahisa Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Method
- Publication number 20100018649
- Publication date Jan 28, 2010
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus And Method
- Publication number 20090078375
- Publication date Mar 26, 2009
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing apparatus
- Publication number 20090000739
- Publication date Jan 1, 2009
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum prcessing apparatus and vacuum processing method of sample
- Publication number 20090000741
- Publication date Jan 1, 2009
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum Processing Apparatus
- Publication number 20080317581
- Publication date Dec 25, 2008
- Akitaka MAKINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum Processing Apparatus
- Publication number 20080145193
- Publication date Jun 19, 2008
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Method
- Publication number 20080011425
- Publication date Jan 17, 2008
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus And Method
- Publication number 20080011716
- Publication date Jan 17, 2008
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum Processing Apparatus And Vacuum Processing Method Of Sample
- Publication number 20070170149
- Publication date Jul 26, 2007
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing method and vacuum processing apparatus
- Publication number 20070100488
- Publication date May 3, 2007
- Nobuo Nagayasu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing system
- Publication number 20070044916
- Publication date Mar 1, 2007
- Masakazu Isozaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing apparatus and vacuum processing method of sample
- Publication number 20060237391
- Publication date Oct 26, 2006
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing apparatus
- Publication number 20060169939
- Publication date Aug 3, 2006
- Hideki Kihara
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
Plasma processing apparatus
- Publication number 20060054278
- Publication date Mar 16, 2006
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050194093
- Publication date Sep 8, 2005
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050193953
- Publication date Sep 8, 2005
- Akitaka Makino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for operating a semiconductor processing apparatus
- Publication number 20050089625
- Publication date Apr 28, 2005
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS

Hideki Kihara

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Optical fiber cable, harness, and method of manufacturing optical f...

Plastic optical fiber, plastic optical fiber cable, wire harness an...

Optical fiber, method for manufacturing optical fiber, optical fibe...

Optical fiber, optical fiber cable and communication equipment

Multicore optical fiber and multicore optical fiber cable

Wafer processing based on sensor detection and system learning

Plasma processing apparatus and method

Vacuum processing apparatus

Plasma processing apparatus and method for operating the same

Plasma processing apparatus and method

Vacuum processing apparatus

Vacuum processing apparatus and vacuum processing method of sample

Vacuum processing apparatus

Plasma processing method

Vacuum processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus

Plasma processing apparatus

Vacuum processing method and vacuum processing apparatus

Vacuum processing apparatus

Vacuum processing apparatus

Vacuum processing apparatus

Semiconductor manufacturing apparatus

Method for operating a semiconductor processing apparatus

Wafer processing method

Wafer stage for wafer processing apparatus

Semiconductor processing apparatus

Wafer stage for wafer processing apparatus and wafer processing method

Microwave plasma processing apparatus and method

Patents Applicationslast 30 patents

OPTICAL FIBER CABLE, HARNESS, AND METHOD OF MANUFACTURING OPTICAL F...

PLASTIC OPTICAL FIBER, PLASTIC OPTICAL FIBER CABLE, WIRE HARNESS AN...

PLASMA PROCESSING APPARATUS

Optical Fiber, Method for Manufacturing Optical Fiber, Optical Fibe...

Optical Fiber, Optical Fiber Cable and Communication Equipment

Plastic Optical Fiber and Its Manufacturing Method, Sensor, and Bob...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MULTICORE OPTICAL FIBER AND MULTICORE OPTICAL FIBER CABLE

PLASMA PROCESSING APPARATUS

VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD

PLASMA PROCESSING APPARATUS

Vacuum Processing Apparatus

PLASMA PROCESSING APPARATUS AND METHOD FOR OPERATING THE SAME

Plasma Processing Apparatus And Method

Plasma Processing Apparatus And Method

Vacuum processing apparatus

Vacuum prcessing apparatus and vacuum processing method of sample

Vacuum Processing Apparatus

Vacuum Processing Apparatus

Plasma Processing Apparatus And Method

Plasma Processing Apparatus And Method

Vacuum Processing Apparatus And Vacuum Processing Method Of Sample

Vacuum processing method and vacuum processing apparatus

Vacuum processing system

Vacuum processing apparatus and vacuum processing method of sample

Vacuum processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Method for operating a semiconductor processing apparatus