Hideki Nagaoka

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Microwave plasma processing device and gate valve for microwave pla...
- Patent number 8,293,067
- Issue date Oct 23, 2012
- Tokyo Electron Limited
- Sunao Muraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow rate control system and shower plate used for partial pressure...
- Patent number 8,109,288
- Issue date Feb 7, 2012
- Tokyo Electron Limited
- Hideki Nagaoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Gas supply unit and gas supply system
- Patent number 8,104,516
- Issue date Jan 31, 2012
- CKD Corporation
- Shuji Moriya
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Grant
Microwave plasma processing device and gate valve for microwave pla...
- Patent number 7,993,488
- Issue date Aug 9, 2011
- Tokyo Electron Limited
- Sunao Muraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Partial pressure control system, flow rate control system and showe...
- Patent number 7,481,240
- Issue date Jan 27, 2009
- Tokyo Electron Limited
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Relative pressure control system and relative flow control system
- Patent number 7,353,841
- Issue date Apr 8, 2008
- CKD Corporation
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING
Information Patent Grant
Parallel divided flow-type fluid supply apparatus, and fluid-switch...
- Patent number 6,848,470
- Issue date Feb 1, 2005
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Parallel divided flow-type fluid supply apparatus, and fluid-switch...
- Patent number 6,820,632
- Issue date Nov 23, 2004
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Structure or construction for mounting a pressure detector
- Patent number 6,606,912
- Issue date Aug 19, 2003
- Fujikin Incorporated
- Tadahiro Ohmi
- G01 - MEASURING TESTING
Information Patent Grant
Method of detecting abnormalities in flow rate in pressure-type flo...
- Patent number 6,450,190
- Issue date Sep 17, 2002
- Tokyo Electron Ltd.
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Parallel divided flow-type fluid supply apparatus, and fluid-switch...
- Patent number 6,422,264
- Issue date Jul 23, 2002
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
MICROWAVE PLASMA PROCESSING DEVICE AND GATE VALVE FOR MICROWAVE PLA...
- Publication number 20110265952
- Publication date Nov 3, 2011
- TOKYO ELECTRON LIMITED
- Sunao MURAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas Supply Unit and Gas Supply System
- Publication number 20090165872
- Publication date Jul 2, 2009
- CKD CORPORATION
- Shuji Moriya
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Application
Flow rate control system and shower plate used for partial pressure...
- Publication number 20080300728
- Publication date Dec 4, 2008
- TOKYO ELECTRON LIMITED
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA PROCESSING DEVICE AND GATE VALVE FOR MICROWAVE PLA...
- Publication number 20080006371
- Publication date Jan 10, 2008
- TOKYO ELECTRON LIMITED
- Sunao MURAOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Relative pressure control system and relative flow control system
- Publication number 20060097644
- Publication date May 11, 2006
- CKD CORPORATION
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING
Information Patent Application
Semiconductor processing system
- Publication number 20050064609
- Publication date Mar 24, 2005
- TOKYO ELECTRON LIMITED
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Partial pressure control system, flow rate control system and showe...
- Publication number 20050029369
- Publication date Feb 10, 2005
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Parallel divided flow-type fluid supply apparatus, and fluid-switch...
- Publication number 20040154664
- Publication date Aug 12, 2004
- FUJIKIN INCORPORATED
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Application
Parallel divided flow-type fluid supply apparatus, and fluid-switch...
- Publication number 20020179149
- Publication date Dec 5, 2002
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Application
Method of detecting abnormalities in flow rate in pressure-type flo...
- Publication number 20020005785
- Publication date Jan 17, 2002
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Application
Structure or construction for mounting a pressure detector
- Publication number 20010035052
- Publication date Nov 1, 2001
- Tadahiro Ohmi
- G01 - MEASURING TESTING
Information Patent Application
Parallel divided flow-type fluid supply apparatus, and fluid-switch...
- Publication number 20010004903
- Publication date Jun 28, 2001
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING

Hideki Nagaoka

Person

Patents Grantslast 30 patents

Microwave plasma processing device and gate valve for microwave pla...

Flow rate control system and shower plate used for partial pressure...

Gas supply unit and gas supply system

Microwave plasma processing device and gate valve for microwave pla...

Partial pressure control system, flow rate control system and showe...

Relative pressure control system and relative flow control system

Parallel divided flow-type fluid supply apparatus, and fluid-switch...

Parallel divided flow-type fluid supply apparatus, and fluid-switch...

Structure or construction for mounting a pressure detector

Method of detecting abnormalities in flow rate in pressure-type flo...

Parallel divided flow-type fluid supply apparatus, and fluid-switch...

Patents Applicationslast 30 patents

MICROWAVE PLASMA PROCESSING DEVICE AND GATE VALVE FOR MICROWAVE PLA...

Gas Supply Unit and Gas Supply System

Flow rate control system and shower plate used for partial pressure...

MICROWAVE PLASMA PROCESSING DEVICE AND GATE VALVE FOR MICROWAVE PLA...

Relative pressure control system and relative flow control system

Semiconductor processing system

Partial pressure control system, flow rate control system and showe...

Parallel divided flow-type fluid supply apparatus, and fluid-switch...

Parallel divided flow-type fluid supply apparatus, and fluid-switch...

Method of detecting abnormalities in flow rate in pressure-type flo...

Structure or construction for mounting a pressure detector

Parallel divided flow-type fluid supply apparatus, and fluid-switch...