Hideki Tanaka

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and analysis method therefor
- Patent number 7,637,143
- Issue date Dec 29, 2009
- Tokyo Electron Limited
- Hideki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Prediction method and apparatus for substrate processing apparatus
- Patent number 7,630,064
- Issue date Dec 8, 2009
- Tokyo Electron Limited
- Hideki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for generating multivariate analysis model expression for pr...
- Patent number 7,505,879
- Issue date Mar 17, 2009
- Tokyo Electron Limited
- Masayuki Tomoyasu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for deciding cause of abnormality in plasma pr...
- Patent number 7,389,203
- Issue date Jun 17, 2008
- Tokyo Electron Limited
- Hideki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining an operation status of a plasm...
- Patent number 7,341,954
- Issue date Mar 11, 2008
- Tokyo Electron Limited
- Yoshihiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of resetting substrate processing apparatus, storage medium...
- Patent number 7,231,321
- Issue date Jun 12, 2007
- Tokyo Electron Limited
- Hajime Furuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma leak monitoring method, plasma processing apparatus and plas...
- Patent number 7,217,942
- Issue date May 15, 2007
- Tokyo Electron Limited
- Hideki Tanaka
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ANALYSIS METHOD THEREFOR
- Publication number 20080110233
- Publication date May 15, 2008
- TOKYO ELECTRON LIMITED
- Hideki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREDICTION METHOD AND APPARATUS FOR SUBSTRATE PROCESSING APPARATUS
- Publication number 20070215574
- Publication date Sep 20, 2007
- TOKYO ELECTRON LIMITED
- Hideki TANAKA
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and apparatus for determining an operation status of a plasm...
- Publication number 20070050076
- Publication date Mar 1, 2007
- TOKYO ELECTRON LIMITED
- Yoshihiro Yamazaki
- G05 - CONTROLLING REGULATING
Information Patent Application
Method of resetting substrate processing apparatus, storage medium...
- Publication number 20060100825
- Publication date May 11, 2006
- TOKYO ELECTRON LIMITED
- Hajime Furuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma leak monitoring method, plasma processing apparatus and plas...
- Publication number 20050277209
- Publication date Dec 15, 2005
- Hideki Tanaka
- G01 - MEASURING TESTING
Information Patent Application
Method for generating multivariate analysis model expression for pr...
- Publication number 20050143952
- Publication date Jun 30, 2005
- Masayuki Tomoyasu
- H01 - BASIC ELECTRIC ELEMENTS

Hideki Tanaka

Person

Patents Grantslast 30 patents

Substrate processing apparatus and analysis method therefor

Prediction method and apparatus for substrate processing apparatus

Method for generating multivariate analysis model expression for pr...

Method and apparatus for deciding cause of abnormality in plasma pr...

Method and apparatus for determining an operation status of a plasm...

Method of resetting substrate processing apparatus, storage medium...

Plasma leak monitoring method, plasma processing apparatus and plas...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND ANALYSIS METHOD THEREFOR

PREDICTION METHOD AND APPARATUS FOR SUBSTRATE PROCESSING APPARATUS

Method and apparatus for determining an operation status of a plasm...

Method of resetting substrate processing apparatus, storage medium...

Plasma leak monitoring method, plasma processing apparatus and plas...

Method for generating multivariate analysis model expression for pr...