Hideki Tateishi

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Yokohama, JP

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Patents Grantslast 30 patents

Information Patent Grant
Sputtering process and an apparatus for carrying out the same
- Patent number 4,853,102
- Issue date Aug 1, 1989
- Hitachi, Ltd.
- Hideki Tateishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Continuous sputtering apparatus
- Patent number 4,675,096
- Issue date Jun 23, 1987
- Hitachi, Ltd.
- Hideki Tateishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for sputtering
- Patent number 4,610,770
- Issue date Sep 9, 1986
- Hitachi, Ltd.
- Hiroshi Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for performing continuous treatment in vacuum
- Patent number 4,405,435
- Issue date Sep 20, 1983
- Hitachi, Ltd.
- Hideki Tateishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering cathode structure for sputtering apparatuses, method of...
- Patent number 4,401,539
- Issue date Aug 30, 1983
- Hitachi, Ltd.
- Katsuo Abe
- H01 - BASIC ELECTRIC ELEMENTS