Hidemi Kawai

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Cleanup method for optics in immersion lithography using object on...
- Patent number 9,958,786
- Issue date May 1, 2018
- Nikon Corporation
- Hidemi Kawai
- B08 - CLEANING
Information Patent Grant
Scanning exposure method
- Patent number RE38176
- Issue date Jul 8, 2003
- Nikon Corporation
- Shinji Wakamoto
- 355 - Photocopying
Information Patent Grant
Scanning type exposure method
- Patent number 6,195,155
- Issue date Feb 27, 2001
- Nikon Corporation
- Hidemi Kawai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method and method of manufacturing a projection...
- Patent number 6,175,405
- Issue date Jan 16, 2001
- Nikon Corporation
- Hidemi Kawai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure method in which mask patterns are imaged on pho...
- Patent number 5,912,727
- Issue date Jun 15, 1999
- Nikon Corporation
- Hidemi Kawai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment method
- Patent number 5,671,057
- Issue date Sep 23, 1997
- Nikon Corporation
- Hidemi Kawai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning exposure method
- Patent number 5,617,182
- Issue date Apr 1, 1997
- Nikon Corporation
- Shinji Wakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for detecting alignment marks having alignment...
- Patent number 5,220,176
- Issue date Jun 15, 1993
- Nikon Corporation
- Hidemi Kawai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus
- Patent number 5,117,255
- Issue date May 26, 1992
- Nikon Corporation
- Naomasa Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for detecting position of reference pattern
- Patent number 4,860,374
- Issue date Aug 22, 1989
- Nikon Corporation
- Seiro Murakami
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Projection exposure apparatus
- Patent number 4,780,747
- Issue date Oct 25, 1988
- Nippon Kogaku K.K.
- Kazuaki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical apparatus for mask to substrate alignment
- Patent number 4,780,616
- Issue date Oct 25, 1988
- Nippon Kogaku K.K.
- Kenji Nishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical apparatus
- Patent number 4,704,020
- Issue date Nov 3, 1987
- Nippon Kogaku K.K.
- Masaichi Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of aligning a semiconductor substrate and a photomask
- Patent number 4,679,942
- Issue date Jul 14, 1987
- Nippon Kogaku K.K.
- Kyoichi Suwa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING SYSTEM AND PROCESSING METHOD
- Publication number 20220152751
- Publication date May 19, 2022
- Nikon Corporation
- Hidemi KAWAI
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
PROCESSING SYSTEM, PROCESSING METHOD, COMPUTER PROGRAM, RECORDING M...
- Publication number 20210001403
- Publication date Jan 7, 2021
- Nikon Corporation
- Hidemi KAWAI
- B22 - CASTING POWDER METALLURGY
Information Patent Application
CLEANUP METHOD FOR OPTICS IN IMMERSION LITHOGRAPHY
- Publication number 20180203366
- Publication date Jul 19, 2018
- Nikon Corporation
- Hidemi KAWAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANUP METHOD FOR OPTICS IN IMMERSION LITHOGRAPHY
- Publication number 20140132939
- Publication date May 15, 2014
- Nikon Corporation
- Hidemi KAWAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hidemi Kawai

Person

Patents Grantslast 30 patents

Cleanup method for optics in immersion lithography using object on...

Scanning exposure method

Scanning type exposure method

Projection exposure method and method of manufacturing a projection...

Projection exposure method in which mask patterns are imaged on pho...

Alignment method

Scanning exposure method

Apparatus and method for detecting alignment marks having alignment...

Projection exposure apparatus

Apparatus for detecting position of reference pattern

Projection exposure apparatus

Projection optical apparatus for mask to substrate alignment

Projection optical apparatus

Method of aligning a semiconductor substrate and a photomask

Patents Applicationslast 30 patents

PROCESSING SYSTEM AND PROCESSING METHOD

PROCESSING SYSTEM, PROCESSING METHOD, COMPUTER PROGRAM, RECORDING M...

CLEANUP METHOD FOR OPTICS IN IMMERSION LITHOGRAPHY

CLEANUP METHOD FOR OPTICS IN IMMERSION LITHOGRAPHY