Hidenobu Miyamoto

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 7,615,498
- Issue date Nov 10, 2009
- NEC Electronics Corporation
- Yoichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing same
- Patent number 7,341,937
- Issue date Mar 11, 2008
- NEC Electronics Corporation
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing a semiconductor de...
- Patent number 7,180,191
- Issue date Feb 20, 2007
- NEC Electronics Corporation
- Yoichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing same
- Patent number 6,927,495
- Issue date Aug 9, 2005
- NEC Electronics Corporation
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device with via holes reachin...
- Patent number 6,319,844
- Issue date Nov 20, 2001
- NEC Corporation
- Tatsuya Usami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor apparatus and fabrication method thereof
- Patent number 5,937,300
- Issue date Aug 10, 1999
- NEC Corporation
- Makoto Sekine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 5,846,331
- Issue date Dec 8, 1998
- NEC Corporation
- Hidenobu Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus used for fabrication of semiconductor d...
- Patent number 5,810,932
- Issue date Sep 22, 1998
- NEC Corporation
- Yasuhiko Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively etching polycide layer
- Patent number 5,792,710
- Issue date Aug 11, 1998
- NEC Corporation
- Kazuyoshi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus for manufacture of semiconductor devices
- Patent number 5,690,781
- Issue date Nov 25, 1997
- NEC Corporation
- Kazuyoshi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method for etching a semiconductor substrate having a silic...
- Patent number 5,645,683
- Issue date Jul 8, 1997
- NEC Corporation
- Hidenobu Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing fine-structured stacked connection layer
- Patent number 5,407,862
- Issue date Apr 18, 1995
- NEC Corporation
- Hidenobu Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device having groove-structu...
- Patent number 5,340,769
- Issue date Aug 23, 1994
- NEC Corporation
- Hidenobu Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing corrosion of aluminum alloys
- Patent number 5,246,888
- Issue date Sep 21, 1993
- NEC Corporation
- Hidenobu Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20070117405
- Publication date May 24, 2007
- NEC ELECTRONICS CORPORATION
- Yoichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing same
- Publication number 20050245075
- Publication date Nov 3, 2005
- NEC Electronics Corporation
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing a semiconductor de...
- Publication number 20050170633
- Publication date Aug 4, 2005
- NEC Electronics Corporation
- Yoichi Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing same
- Publication number 20040036076
- Publication date Feb 26, 2004
- NEC Electronics Corporation
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS

Hidenobu Miyamoto

Person

Patents Grantslast 30 patents

Method of manufacturing a semiconductor device

Semiconductor device and method of manufacturing same

Semiconductor device and method of manufacturing a semiconductor de...

Semiconductor device and method of manufacturing same

Method of manufacturing semiconductor device with via holes reachin...

Semiconductor apparatus and fabrication method thereof

Plasma processing apparatus

Plasma generating apparatus used for fabrication of semiconductor d...

Method for selectively etching polycide layer

Plasma processing apparatus for manufacture of semiconductor devices

Etching method for etching a semiconductor substrate having a silic...

Method for manufacturing fine-structured stacked connection layer

Method for manufacturing semiconductor device having groove-structu...

Method of preventing corrosion of aluminum alloys

Patents Applicationslast 30 patents

Method of manufacturing a semiconductor device

Semiconductor device and method of manufacturing same

Semiconductor device and method of manufacturing a semiconductor de...

Semiconductor device and method of manufacturing same