Hidenori Miyoshi

Person

Hosaka-cho Nirasaki-shi Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Black powder, and method for producing same
- Patent number 12,162,770
- Issue date Dec 10, 2024
- UBE EXSYMO CO., LTD.
- Hidenori Miyoshi
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Black powder, and method for producing same
- Patent number 11,679,985
- Issue date Jun 20, 2023
- UBE EXSYMO CO., LTD.
- Hidenori Miyoshi
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Etching method and etching apparatus
- Patent number 11,024,514
- Issue date Jun 1, 2021
- Tokyo Electron Limited
- Takuya Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching copper layer
- Patent number 10,825,688
- Issue date Nov 3, 2020
- Tokyo Electron Limited
- Shigeru Tahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming barrier film on wiring line
- Patent number 9,293,417
- Issue date Mar 22, 2016
- Tokyo Electron Limited
- Hidenori Miyoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 8,999,102
- Issue date Apr 7, 2015
- Tokyo Electron Limited
- Hidenori Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method, pretreatment device, and processing system
- Patent number 8,865,590
- Issue date Oct 21, 2014
- Tokyo Electron Limited
- Kenji Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method, semiconductor device, manufacturing method the...
- Patent number 8,785,311
- Issue date Jul 22, 2014
- Tokyo Electron Limited
- Hidenori Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 8,765,221
- Issue date Jul 1, 2014
- Tokyo Electron Limited
- Hidenori Miyoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a film
- Patent number 8,709,541
- Issue date Apr 29, 2014
- Tokyo Electron Limited
- Kenji Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Barrier layer, film forming method, and processing system
- Patent number 8,653,665
- Issue date Feb 18, 2014
- Tokyo Electron Limited
- Hidenori Miyoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating apparatus, plasma processing apparatus and plasma...
- Patent number 8,610,353
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Hitoshi Itoh
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 8,551,565
- Issue date Oct 8, 2013
- Tokyo Electron Limited
- Isao Gunji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process device and plasma process method
- Patent number 8,394,231
- Issue date Mar 12, 2013
- Tokyo Electron Limited
- Koichi Takatsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide film formation method and apparatus
- Patent number 8,354,337
- Issue date Jan 15, 2013
- Tokyo Electron Limited
- Kenji Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method and target substrate proc...
- Patent number 8,310,054
- Issue date Nov 13, 2012
- Tokyo Electron Limited
- Hidenori Miyoshi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of substrate treatment, process for producing semiconductor...
- Patent number 8,138,095
- Issue date Mar 20, 2012
- Tokyo Electron Limited
- Hidenori Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment method, heat treatment apparatus and substrate proce...
- Patent number 8,114,786
- Issue date Feb 14, 2012
- Tokyo Electron Limited
- Hidenori Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation method and apparatus
- Patent number 8,029,856
- Issue date Oct 4, 2011
- Tokyo Electron Limited
- Hidenori Miyoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method and target substrate proc...
- Patent number 8,003,535
- Issue date Aug 23, 2011
- Tokyo Electron Limited
- Hidenori Miyoshi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Insulation film forming method, insulation film forming system, and...
- Patent number 7,772,130
- Issue date Aug 10, 2010
- Tokyo Electron Limited
- Hidenori Miyoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and apparatus fabrication process of a...
- Patent number 7,709,394
- Issue date May 4, 2010
- Tokyo Electron Limited
- Hidenori Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing apparatus and operating method t...
- Patent number 7,556,711
- Issue date Jul 7, 2009
- Tokyo Electron Limited
- Hidenori Miyoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Material and method for forming low-dielectric-constant film
- Patent number 7,279,434
- Issue date Oct 9, 2007
- National Institute of Advanced Industrial Science and Technology
- Nobuhiro Hata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
HOLLOW INORGANIC PARTICLE AND METHOD FOR PRODUCING SAID HOLLOW INOR...
- Publication number 20230312355
- Publication date Oct 5, 2023
- UBE EXSYMO CO., LTD.
- Hidenori MIYOSHI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
BLACK POWDER, AND METHOD FOR PRODUCING SAME
- Publication number 20230271841
- Publication date Aug 31, 2023
- UBE EXSYMO CO., LTD.
- Hidenori MIYOSHI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220108913
- Publication date Apr 7, 2022
- TOKYO ELECTRON LIMITED
- Hajime NAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLACK POWDER, AND METHOD FOR PRODUCING SAME
- Publication number 20200180970
- Publication date Jun 11, 2020
- UBE EXSYMO CO., LTD.
- Hidenori MIYOSHI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20200035504
- Publication date Jan 30, 2020
- TOKYO ELECTRON LIMITED
- Takuya ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING COPPER LAYER
- Publication number 20190272997
- Publication date Sep 5, 2019
- TOKYO ELECTRON LIMITED
- Shigeru TAHARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
- Publication number 20160351398
- Publication date Dec 1, 2016
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING CONDUCTIVE FILM
- Publication number 20150056381
- Publication date Feb 26, 2015
- NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
- Masaru Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20140290857
- Publication date Oct 2, 2014
- TOKYO ELECTRON LIMITED
- Hidenori MIYOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD FOR FORMING FILM
- Publication number 20140190409
- Publication date Jul 10, 2014
- TOKYO ELECTRON LIMITED
- Kenji MATSUMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING SYSTEM FOR FORMING FILM ON TARGET OBJECT
- Publication number 20140117551
- Publication date May 1, 2014
- TOKYO ELECTRON LIMITED
- Hidenori Miyoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA GENERATION DEVICE, PLASMA PROCESSING APPARATUS AND PLASMA PR...
- Publication number 20140008326
- Publication date Jan 9, 2014
- National University Corporation Nagoya University
- Hirotaka TOYODA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PROCESSING APPARATUS AND METHOD FOR PROCESSING METAL FILM
- Publication number 20130306597
- Publication date Nov 21, 2013
- TOKYO ELECTRON LIMITED
- Isao Gunji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20130017328
- Publication date Jan 17, 2013
- TOKYO ELECTRON LIMITED
- Hidenori MIYOSHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEVICE AND METHOD FOR FORMING FILM
- Publication number 20120251721
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Kenji Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD, PRETREATMENT DEVICE, AND PROCESSING SYSTEM
- Publication number 20120135612
- Publication date May 31, 2012
- NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- Kenji Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD
- Publication number 20120114869
- Publication date May 10, 2012
- TOKYO ELECTRON LIMITED
- Hidenori MIYOSHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BARRIER LAYER, FILM FORMING METHOD, AND PROCESSING SYSTEM
- Publication number 20120091588
- Publication date Apr 19, 2012
- TOKYO ELECTRON LIMITED
- Hidenori Miyoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA...
- Publication number 20120068603
- Publication date Mar 22, 2012
- National University Corporation Nagoya University
- Hitoshi ITOH
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
FILM FORMING METHOD, SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THE...
- Publication number 20120064708
- Publication date Mar 15, 2012
- TOKYO ELECTRON LIMITED
- Hidenori MIYOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20120006782
- Publication date Jan 12, 2012
- TOKYO ELECTRON LIMITED
- Hidenori MIYOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND TARGET SUBSTRATE PROC...
- Publication number 20110265950
- Publication date Nov 3, 2011
- TOKYO ELECTRON LIMITED
- Hidenori Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE FILM FORMATION METHOD AND APPARATUS
- Publication number 20100323512
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- Kenji Matsumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20100316799
- Publication date Dec 16, 2010
- TOKYO ELECTRON LIMITED
- Isao Gunji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE MOUNTING TABLE, SUBSTRATE PROCESSING APPARATUS AND METHOD...
- Publication number 20100108108
- Publication date May 6, 2010
- TOKYO ELECTRON LIMITED
- Kazuichi Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND STORAGE MEDIUM
- Publication number 20100029086
- Publication date Feb 4, 2010
- TOKYO ELECTON LIMITED
- Hidenori Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CVD FILM FORMING METHOD AND CVD FILM FORMING APPARATUS
- Publication number 20090324827
- Publication date Dec 31, 2009
- TOKYO ELECTRON LIMITED
- Hidenori Miyoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS
- Publication number 20090325393
- Publication date Dec 31, 2009
- TOKYO ELECTRON LIMITED
- Hidenori Miyoshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Preparing Modified Porous Silica Films, Modified Porous...
- Publication number 20090206453
- Publication date Aug 20, 2009
- Ulvac, Inc.
- Nobutoshi Fujii
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS, METHOD FOR MANUFACTURING...
- Publication number 20090204252
- Publication date Aug 13, 2009
- TOKYO ELECTRON LIMITED
- Hidenori MIYOSHI
- H01 - BASIC ELECTRIC ELEMENTS

Hidenori Miyoshi

Person

Patents Grantslast 30 patents

Black powder, and method for producing same

Black powder, and method for producing same

Etching method and etching apparatus

Method for etching copper layer

Method for forming barrier film on wiring line

Substrate processing apparatus

Film forming method, pretreatment device, and processing system

Film forming method, semiconductor device, manufacturing method the...

Film forming method and film forming apparatus

Method for forming a film

Barrier layer, film forming method, and processing system

Plasma generating apparatus, plasma processing apparatus and plasma...

Film forming method and film forming apparatus

Plasma process device and plasma process method

Metal oxide film formation method and apparatus

Semiconductor device manufacturing method and target substrate proc...

Method of substrate treatment, process for producing semiconductor...

Heat treatment method, heat treatment apparatus and substrate proce...

Film formation method and apparatus

Semiconductor device manufacturing method and target substrate proc...

Insulation film forming method, insulation film forming system, and...

Substrate processing method and apparatus fabrication process of a...

Semiconductor device manufacturing apparatus and operating method t...

Material and method for forming low-dielectric-constant film

Patents Applicationslast 30 patents

HOLLOW INORGANIC PARTICLE AND METHOD FOR PRODUCING SAID HOLLOW INOR...

BLACK POWDER, AND METHOD FOR PRODUCING SAME

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

BLACK POWDER, AND METHOD FOR PRODUCING SAME

ETCHING METHOD AND ETCHING APPARATUS

METHOD FOR ETCHING COPPER LAYER

SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

METHOD FOR FORMING CONDUCTIVE FILM

SUBSTRATE PROCESSING APPARATUS

DEVICE AND METHOD FOR FORMING FILM

PROCESSING SYSTEM FOR FORMING FILM ON TARGET OBJECT

PLASMA GENERATION DEVICE, PLASMA PROCESSING APPARATUS AND PLASMA PR...

PROCESSING APPARATUS AND METHOD FOR PROCESSING METAL FILM

FILM FORMING METHOD AND FILM FORMING APPARATUS

DEVICE AND METHOD FOR FORMING FILM

FILM FORMING METHOD, PRETREATMENT DEVICE, AND PROCESSING SYSTEM

FILM FORMING METHOD

BARRIER LAYER, FILM FORMING METHOD, AND PROCESSING SYSTEM

PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA...

FILM FORMING METHOD, SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THE...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND TARGET SUBSTRATE PROC...

METAL OXIDE FILM FORMATION METHOD AND APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

SUBSTRATE MOUNTING TABLE, SUBSTRATE PROCESSING APPARATUS AND METHOD...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND STORAGE MEDIUM

CVD FILM FORMING METHOD AND CVD FILM FORMING APPARATUS

HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS

Method for Preparing Modified Porous Silica Films, Modified Porous...

SUBSTRATE PROCESSING METHOD AND APPARATUS, METHOD FOR MANUFACTURING...