Hideo Hada

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,040,220
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,034,556
- Issue date May 19, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 9,012,129
- Issue date Apr 21, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,808,959
- Issue date Aug 19, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,415,085
- Issue date Apr 9, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, positive resist composition and resist pattern forming me...
- Patent number 8,389,197
- Issue date Mar 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Hirosaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 8,367,299
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,338,076
- Issue date Dec 25, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, dissolution inhibitor, positive type resist composition,...
- Patent number 8,304,163
- Issue date Nov 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,293,449
- Issue date Oct 23, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, positive resist composition and method for formation of r...
- Patent number 8,257,903
- Issue date Sep 4, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, acid generator, resist composition, and method of forming...
- Patent number 8,227,169
- Issue date Jul 24, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 8,206,890
- Issue date Jun 26, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition
- Patent number 8,198,004
- Issue date Jun 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,187,789
- Issue date May 29, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Koji Yonemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,124,313
- Issue date Feb 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Film-forming material and method of forming pattern
- Patent number 8,101,013
- Issue date Jan 24, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo MatsuMaru
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Material for formation of protective film, method for formation of...
- Patent number 8,097,397
- Issue date Jan 17, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Takayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a structure
- Patent number 8,025,923
- Issue date Sep 27, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Shigenori Fujikawa
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Compound, positive resist composition and method for forming resist...
- Patent number 8,017,300
- Issue date Sep 13, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,012,669
- Issue date Sep 6, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a nano-structure and the nano-structure
- Patent number 7,993,706
- Issue date Aug 9, 2011
- Riken
- Shigenori Fujikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Compound, method for producing same, positive resist composition an...
- Patent number 7,960,089
- Issue date Jun 14, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, dissolution inhibitor, positive type resist composition,...
- Patent number 7,943,284
- Issue date May 17, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern coating material and pattern forming method
- Patent number 7,932,013
- Issue date Apr 26, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 7,927,780
- Issue date Apr 19, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Materials for photoresist, photoresist composition and method of fo...
- Patent number 7,910,284
- Issue date Mar 22, 2011
- Hitachi, Ltd.
- Kyoko Kojima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and process for formation of resist patterns
- Patent number 7,901,865
- Issue date Mar 8, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,897,319
- Issue date Mar 1, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for electron beam or EUV
- Patent number 7,879,528
- Issue date Feb 1, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Takeo Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20140120472
- Publication date May 1, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20120264061
- Publication date Oct 18, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...
- Publication number 20120164580
- Publication date Jun 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20120009521
- Publication date Jan 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...
- Publication number 20110091810
- Publication date Apr 21, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110008728
- Publication date Jan 13, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi NAKAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, METHOD FOR PRODUCING SAME, POSITIVE RESIST COMPOSITION AN...
- Publication number 20100183974
- Publication date Jul 22, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER C...
- Publication number 20100151383
- Publication date Jun 17, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition, method of forming resist pattern, novel compoun...
- Publication number 20100136478
- Publication date Jun 3, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20100121077
- Publication date May 13, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition, method of forming resist pattern, novel compoun...
- Publication number 20100119974
- Publication date May 13, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING...
- Publication number 20100104973
- Publication date Apr 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF...
- Publication number 20100086879
- Publication date Apr 8, 2010
- Toshikazu Takayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20100015552
- Publication date Jan 21, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100015548
- Publication date Jan 21, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST...
- Publication number 20100009284
- Publication date Jan 14, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMATION OF MOLD
- Publication number 20090286936
- Publication date Nov 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMATION OF R...
- Publication number 20090269698
- Publication date Oct 29, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090269700
- Publication date Oct 29, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Koji Yonemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090226842
- Publication date Sep 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20090202939
- Publication date Aug 13, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD AND COMPOUND
- Publication number 20090162781
- Publication date Jun 25, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND RESIST PATTERN FO...
- Publication number 20090162784
- Publication date Jun 25, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...
- Publication number 20090162788
- Publication date Jun 25, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, POSITIVE RESIST COMPOSITION FOR THERMA...
- Publication number 20090142696
- Publication date Jun 4, 2009
- Tokyo Ohika Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN FOR PHOTORESIST COMPOSITION, PHOTORESIST COMPOSITION AND METH...
- Publication number 20090142700
- Publication date Jun 4, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING MATERIAL AND METHOD OF FORMING PATTERN
- Publication number 20090134119
- Publication date May 28, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo Matsumaru
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20090130597
- Publication date May 21, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION
- Publication number 20090130605
- Publication date May 21, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING ME...
- Publication number 20090117488
- Publication date May 7, 2009
- TOKYO CHKA KOGYO CO., LTD
- Takako Hirosaki
- C07 - ORGANIC CHEMISTRY

Person

Patents Grantslast 30 patents

Compound and method of producing the same, acid generator, resist c...

Compound and method of producing the same, acid generator, resist c...

Resist composition, method of forming resist pattern, novel compoun...

Resist composition, method of forming resist pattern, novel compoun...

Resist composition, method of forming resist pattern, novel compoun...

Compound, positive resist composition and resist pattern forming me...

Resist composition, method of forming resist pattern, compound and...

Resist composition, method of forming resist pattern, novel compoun...

Compound, dissolution inhibitor, positive type resist composition,...

Positive resist composition and method of forming resist pattern

Compound, positive resist composition and method for formation of r...

Compound, acid generator, resist composition, and method of forming...

Resist composition, method of forming resist pattern, compound and...

Resist composition

Positive resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, novel compoun...

Film-forming material and method of forming pattern

Material for formation of protective film, method for formation of...

Method for manufacturing a structure

Compound, positive resist composition and method for forming resist...

Resist composition and method of forming resist pattern

Method of forming a nano-structure and the nano-structure

Compound, method for producing same, positive resist composition an...

Compound, dissolution inhibitor, positive type resist composition,...

Pattern coating material and pattern forming method

Resist composition, method of forming resist pattern, novel compoun...

Materials for photoresist, photoresist composition and method of fo...

Resist composition and process for formation of resist patterns

Positive resist composition and method of forming resist pattern

Resist composition for electron beam or EUV

Patents Applicationslast 30 patents

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

COMPOUND, METHOD FOR PRODUCING SAME, POSITIVE RESIST COMPOSITION AN...

POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER C...

Resist composition, method of forming resist pattern, novel compoun...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

Resist composition, method of forming resist pattern, novel compoun...

COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING...

MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST...

COMPOSITION FOR FORMATION OF MOLD

COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMATION OF R...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD AND COMPOUND

POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND RESIST PATTERN FO...

NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...

POSITIVE RESIST COMPOSITION, POSITIVE RESIST COMPOSITION FOR THERMA...

RESIN FOR PHOTORESIST COMPOSITION, PHOTORESIST COMPOSITION AND METH...

FILM-FORMING MATERIAL AND METHOD OF FORMING PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

RESIST COMPOSITION

COMPOUND, POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING ME...