Hideo Haraguchi

Person

Toyonaka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and apparatus
- Patent number 7,513,214
- Issue date Apr 7, 2009
- Matsushita Electric Industrial Co., Ltd.
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,808,759
- Issue date Oct 26, 2004
- Matsushita Electric Industrial Co., Ltd.
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for plasma processing
- Patent number 6,648,976
- Issue date Nov 18, 2003
- Matsushita Electric Industrial Co., Ltd.
- Izuru Matsuda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Substrate detecting method and device
- Patent number 6,642,533
- Issue date Nov 4, 2003
- Matsushita Electric Industrial Co., Ltd.
- Hideo Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate dechucking device and substrate dechucking method
- Patent number 6,447,613
- Issue date Sep 10, 2002
- Matsushita Electric Industrial Co., Ltd.
- Hideo Haraguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for positioning a disk-shaped object
- Patent number 6,340,281
- Issue date Jan 22, 2002
- Matsushita Electric Industrial Co., Ltd.
- Hideo Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer handling apparatus
- Patent number 6,276,892
- Issue date Aug 21, 2001
- Matsushita Electric Industrial Co., Ltd.
- Hideo Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate temperature control method and device
- Patent number 6,254,683
- Issue date Jul 3, 2001
- Matsushita Electric Industrial Co., Ltd.
- Izuru Matsuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate handling method and apparatus, and attractive force inspe...
- Patent number 6,255,223
- Issue date Jul 3, 2001
- Matsushita Electric Industrial Co., Ltd.
- Izuru Matsuda
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method and device for plasma treatment
- Patent number 6,177,646
- Issue date Jan 23, 2001
- Matsushita Electric Industrial Co, Ltd.
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 5,922,223
- Issue date Jul 13, 1999
- Matsushita Electric Industrial Co., Ltd.
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and method
- Patent number 5,851,296
- Issue date Dec 22, 1998
- Matsushita Electric Industrial Co., Ltd.
- Hideo Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of handling wafers in a vacuum processing apparatus
- Patent number 5,636,963
- Issue date Jun 10, 1997
- Matsushita Electric Industrial Co., Ltd.
- Hideo Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma processing method and apparatus
- Publication number 20050011453
- Publication date Jan 20, 2005
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20040139917
- Publication date Jul 22, 2004
- Naoshi Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate detecting method and device
- Publication number 20010009641
- Publication date Jul 26, 2001
- Matsushita Electric Industrial Co. Ltd.
- Hideo Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS

Hideo Haraguchi

Person

Patents Grantslast 30 patents

Plasma processing method and apparatus

Plasma processing method and apparatus

Apparatus and method for plasma processing

Substrate detecting method and device

Substrate dechucking device and substrate dechucking method

Method and apparatus for positioning a disk-shaped object

Wafer handling apparatus

Substrate temperature control method and device

Substrate handling method and apparatus, and attractive force inspe...

Method and device for plasma treatment

Plasma processing method and apparatus

Vacuum processing apparatus and method

Method of handling wafers in a vacuum processing apparatus

Patents Applicationslast 30 patents

Plasma processing method and apparatus

Plasma processing apparatus

Substrate detecting method and device