Hideo Kaneko

Person

Niigata-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,181,790
- Issue date Dec 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Shohei Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflection film for EUV mask blank, manuf...
- Patent number 11,860,529
- Issue date Jan 2, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflection film for EUV mask blank, manuf...
- Patent number 11,835,851
- Issue date Dec 5, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, and manufacturing method thereof
- Patent number 11,774,845
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate defect inspection method and substrate defect inspection...
- Patent number 11,624,712
- Issue date Apr 11, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G01 - MEASURING TESTING
Information Patent Grant
Method of manufacturing reflective mask blank, reflective mask blan...
- Patent number 11,415,874
- Issue date Aug 16, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for preparing photomask
- Patent number 11,327,393
- Issue date May 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask blank, photomask blank making method, and photomask makin...
- Patent number 11,073,756
- Issue date Jul 27, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,989,999
- Issue date Apr 27, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank, making method, and halftone p...
- Patent number 10,859,904
- Issue date Dec 8, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank and method for preparing photomask
- Patent number 10,678,125
- Issue date Jun 9, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank, making method, and halftone p...
- Patent number 10,670,957
- Issue date Jun 2, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank, method for manufacturing photomask, and mask patte...
- Patent number 10,585,345
- Issue date Mar 10, 2020
- Shin-Etsu Chemical Co., Ltd.
- Shigeo Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank and making method
- Patent number 10,488,750
- Issue date Nov 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,466,583
- Issue date Nov 5, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank and making method
- Patent number 10,459,333
- Issue date Oct 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,372,030
- Issue date Aug 6, 2019
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank and making method
- Patent number 10,146,122
- Issue date Dec 4, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon target for sputtering film formation and method for forming...
- Patent number 9,812,300
- Issue date Nov 7, 2017
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Designing of photomask blank and photomask blank
- Patent number 9,798,229
- Issue date Oct 24, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for manufacturing photomask blank
- Patent number 9,709,885
- Issue date Jul 18, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank and making method
- Patent number 9,645,485
- Issue date May 9, 2017
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank
- Patent number 9,541,823
- Issue date Jan 10, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for manufacturing photomask blank
- Patent number 9,488,906
- Issue date Nov 8, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing photomask blank
- Patent number 9,400,422
- Issue date Jul 26, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takashi Yoshii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank, halftone phase shift photomas...
- Patent number 9,366,951
- Issue date Jun 14, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask making method, photomask blank and dry etching method
- Patent number 9,164,374
- Issue date Oct 20, 2015
- Shin-Etsu Chemical Co., Ltd.
- Shinichi Igarashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Evaluation of etching conditions for pattern-forming film
- Patent number 8,992,788
- Issue date Mar 31, 2015
- Shin-Etsu Chemical Co., Ltd.
- Shinichi Igarashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Binary photomask blank and binary photomask making method
- Patent number 8,980,503
- Issue date Mar 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching method and photomask blank processing method
- Patent number 8,920,666
- Issue date Dec 30, 2014
- Shin-Etsu Chemical Co., Ltd.
- Shinichi Igarashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20250060658
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20250060659
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate with Film for Reflective Mask Blank, and Reflective Mask...
- Publication number 20240248388
- Publication date Jul 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK
- Publication number 20220404694
- Publication date Dec 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING THEREOF
- Publication number 20220283491
- Publication date Sep 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20220283492
- Publication date Sep 8, 2022
- Shin-Etsu Chemical Co., Ltd.
- Shohei MIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...
- Publication number 20220075254
- Publication date Mar 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...
- Publication number 20220075255
- Publication date Mar 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE DEFECT INSPECTION METHOD AND SUBSTRATE DEFECT INSPECTION...
- Publication number 20220065797
- Publication date Mar 3, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G01 - MEASURING TESTING
Information Patent Application
PHOTOMASK BLANK, AND MANUFACTURING METHOD THEREOF
- Publication number 20210405520
- Publication date Dec 30, 2021
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate with Film for Reflective Mask Blank, and Reflective Mask...
- Publication number 20210333702
- Publication date Oct 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...
- Publication number 20210080819
- Publication date Mar 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK
- Publication number 20200264502
- Publication date Aug 20, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK, MAKING METHOD, AND HALFTONE P...
- Publication number 20200249561
- Publication date Aug 6, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK
- Publication number 20200026181
- Publication date Jan 23, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD
- Publication number 20190064650
- Publication date Feb 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK BLANK MAKING METHOD, AND PHOTOMASK MAKIN...
- Publication number 20190033703
- Publication date Jan 31, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND MASK PATTE...
- Publication number 20180267398
- Publication date Sep 20, 2018
- Shin-Etsu Chemical Co., Ltd.
- Shigeo IRIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK
- Publication number 20180088457
- Publication date Mar 29, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK, MAKING METHOD, AND HALFTONE P...
- Publication number 20180088456
- Publication date Mar 29, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK
- Publication number 20170255095
- Publication date Sep 7, 2017
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD
- Publication number 20170212417
- Publication date Jul 27, 2017
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK BLANK
- Publication number 20170023855
- Publication date Jan 26, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK
- Publication number 20160291452
- Publication date Oct 6, 2016
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK AND MAKING METHOD
- Publication number 20160266485
- Publication date Sep 15, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD
- Publication number 20160033858
- Publication date Feb 4, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DESIGNING OF PHOTOMASK BLANK AND PHOTOMASK BLANK
- Publication number 20160033859
- Publication date Feb 4, 2016
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK
- Publication number 20150160549
- Publication date Jun 11, 2015
- Shin-Etsu Chemical Co., Ltd.
- Kouhei SASAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK, HALFTONE PHASE SHIFT PHOTOMAS...
- Publication number 20150125785
- Publication date May 7, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK BLANK
- Publication number 20150086908
- Publication date Mar 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hideo Kaneko

Person

Patents Grantslast 30 patents

Reflective mask blank and reflective mask

Substrate with multilayer reflection film for EUV mask blank, manuf...

Substrate with multilayer reflection film for EUV mask blank, manuf...

Photomask blank, and manufacturing method thereof

Substrate defect inspection method and substrate defect inspection...

Method of manufacturing reflective mask blank, reflective mask blan...

Photomask blank and method for preparing photomask

Photomask blank, photomask blank making method, and photomask makin...

Halftone phase shift mask blank and halftone phase shift mask

Halftone phase shift photomask blank, making method, and halftone p...

Photomask blank and method for preparing photomask

Halftone phase shift photomask blank, making method, and halftone p...

Photomask blank, method for manufacturing photomask, and mask patte...

Mask blank and making method

Halftone phase shift mask blank and halftone phase shift mask

Halftone phase shift photomask blank and making method

Halftone phase shift mask blank and halftone phase shift mask

Halftone phase shift photomask blank and making method

Silicon target for sputtering film formation and method for forming...

Designing of photomask blank and photomask blank

Photomask blank and method for manufacturing photomask blank

Halftone phase shift photomask blank and making method

Photomask blank

Photomask blank and method for manufacturing photomask blank

Method for manufacturing photomask blank

Halftone phase shift photomask blank, halftone phase shift photomas...

Photomask making method, photomask blank and dry etching method

Evaluation of etching conditions for pattern-forming film

Binary photomask blank and binary photomask making method

Etching method and photomask blank processing method

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK

Substrate with Film for Reflective Mask Blank, and Reflective Mask...

REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK

REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING THEREOF

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...

SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...

SUBSTRATE DEFECT INSPECTION METHOD AND SUBSTRATE DEFECT INSPECTION...

PHOTOMASK BLANK, AND MANUFACTURING METHOD THEREOF

Substrate with Film for Reflective Mask Blank, and Reflective Mask...

METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...

PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK

HALFTONE PHASE SHIFT PHOTOMASK BLANK, MAKING METHOD, AND HALFTONE P...

HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK

HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD

PHOTOMASK BLANK, PHOTOMASK BLANK MAKING METHOD, AND PHOTOMASK MAKIN...

PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND MASK PATTE...

HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK

HALFTONE PHASE SHIFT PHOTOMASK BLANK, MAKING METHOD, AND HALFTONE P...

PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK

HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD

PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK BLANK

HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK

MASK BLANK AND MAKING METHOD

HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD

DESIGNING OF PHOTOMASK BLANK AND PHOTOMASK BLANK

PHOTOMASK BLANK

HALFTONE PHASE SHIFT PHOTOMASK BLANK, HALFTONE PHASE SHIFT PHOTOMAS...

PHOTOMASK BLANK AND METHOD FOR MANUFACTURING PHOTOMASK BLANK