Hideo Kobinata

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Drawing pattern verifying method
- Patent number 6,741,733
- Issue date May 25, 2004
- NEC Electronics Corporation
- Hideo Kobinata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for designing EB mask
- Patent number 6,638,665
- Issue date Oct 28, 2003
- NEC Electronics Corporation
- Hideo Kobinata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of electron-beam exposure and mask and electron-beam exposur...
- Patent number 6,597,001
- Issue date Jul 22, 2003
- NEC Electronics Corporation
- Hiroshi Yamashita
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam exposure mask and method for manufacturing electron b...
- Patent number 6,492,070
- Issue date Dec 10, 2002
- NEC Corporation
- Hideo Kobinata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask inspecting apparatus and mask inspecting method which can insp...
- Patent number 6,462,346
- Issue date Oct 8, 2002
- NEC Corporation
- Hideo Kobinata
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method of and apparatus for designing EB mask
- Publication number 20020037459
- Publication date Mar 28, 2002
- NEC Corporation
- Hideo Kobinata
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam mask, production method thereof, and exposure method
- Publication number 20010016292
- Publication date Aug 23, 2001
- Hideo Kobinata
- H01 - BASIC ELECTRIC ELEMENTS